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Adhesion and stress of magnesium oxide thin films: Effect of thickness, oxidation temperature and duration
Authors:Sikandar H Tamboli  RK Puri
Institution:a Vacuum Techniques & Thin Film Lab., USIC, Shivaji University, Kolhapur 416004, India
b Department of Physics, Shivaji University, Kolhapur 416004, India
Abstract:Nanoscale magnesium oxide thin films have been deposited on glass substrate by thermal oxidation (in air) of vacuum evaporated magnesium films. X-ray diffraction (XRD) showed orientation along (2 0 0) and (2 2 0) directions. The mechanical properties of the MgO thin films were found to be the function of thickness (300, 450 and 600 nm), oxidation temperature (573, 623 and 673 K) and oxidation duration (90 and 180 min). As oxidation temperature and oxidation duration increases, adhesion and intrinsic stress were found to increase. Intrinsic stress decreased whereas adhesion increased due to increase in thin film thickness. The value of intrinsic stress was in range 28.902-73.212 (×107 N/m2) and that of adhesion was 12.1-27.4 (×104 N/m2) for the thin film of thickness 300 nm.
Keywords:Thin films  Oxide materials  Vapour deposition  Adhesion  Intrinsic stress
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