| 退火对TiO2薄膜形貌、结构及光学特性影响 |
| |
| 引用本文： | 邢杰,卫会云,张笑妍,巩毛毛,周惟公,吴秀文,赵长春.退火对TiO2薄膜形貌、结构及光学特性影响[J].物理实验,2011,31(5). |
| |
| 作者姓名： | 邢杰 卫会云 张笑妍 巩毛毛 周惟公 吴秀文 赵长春 |
| |
| 作者单位： | 1. 中国地质大学(北京)矿物岩石材料开发应用国家专业实验室;材料科学与工程学院,北京,100083
2. 中国地质大学(北京)材料科学与工程学院,北京,100083 |
| |
| 基金项目： | 中国地质大学(北京)矿物岩石材料开发应用国家专业实验室开放课题，中国地质大学(北京)大学生创新实验项目 |
| |
| 摘 要： | 利用射频磁控溅射技术在熔融石英基片上制备TiO<,2>薄膜,采用X射线衍射、扫描电子显微镜(SEM)、拉曼光谱以及透过谱研究了退火温度和退火气氛对TiO<,2>薄膜的结构、形貌和光学特性的影响.实验结果表明:在大气环境下退火,退火温度越.高,薄膜晶化越好,晶粒明显长大,温度高于700℃退火的薄膜,金红石相已明显形成.实验还发现,退火气氛对金红石相的形成是非常重要的,拉曼光谱反应出Ar气氛退火,抑制了金红石晶相的发育,薄膜仍以锐钛矿相为主.Ar气氛退火的薄膜在可见光范围内的透过率比大气退火的要低,并且由透过率曲线推知:金红石的光学带隙约为2.8 eV,比锐钛矿的光学带隙小0.2 eV.
|
| 关 键 词： | TiO2薄膜 金红石 锐钛矿 射频磁控溅射 退火 |
Effect of annealing on the morphology, structure and optical properties of TiO2 thin films |
| |
| XING Jie,WEI Hui-yun,ZHANG Xiao-yan,GONG Mao-mao,ZHOU Wei-gong,WU Xiu-wen,ZHAO Chang-chun.Effect of annealing on the morphology, structure and optical properties of TiO2 thin films[J].Physics Experimentation,2011,31(5). |
| |
| Authors: | XING Jie WEI Hui-yun ZHANG Xiao-yan GONG Mao-mao ZHOU Wei-gong WU Xiu-wen ZHAO Chang-chun |
| |
| Institution: | XING Jiea,b,WEI Hui-yunb,ZHANG Xiao-yanb,GONG Mao-maob,ZHOU Wei-gongb,WU Xiu-wenb,ZHAO Chang-chunb(a.National Laboratory of Mineral Materials,b.School of Materials Science and Technology,China University of Geosciences,Beijing 100083,China) |
| |
| Abstract: | TiO2 thin films were deposited by rf magnetron sputtering on fused-quartz substrates.The effect of annealing temperature and annealing ambience on the structure,morphology and optical properties of TiO2 films were studied experimentally by X-ray diffraction,scanning electronic microscopy,Raman spectroscopy and transmission measurements.It was found that with the increase of annealing temperature in air ambience,the crystalline grains grew evidently and crystallization improved much.When the annealing temper... |
| |
| Keywords: | TiO2 thin film rutile anatase rf magnetron sputtering annealing |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
