Structural characterization of Ni and Ni/Ti ohmic contact on n-type 4H-SiC |
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| Authors: | M Siad M AbdesselamN Souami AC Chami |
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| Institution: | a Centre de Recherche Nucléaire d’Alger, 02 Bd Frantz Fanon, Alger, Algeria
b USTHB, Faculté de Physique, BP 32, El Alia, Bab Ezzouar, Alger, Algeria |
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| Abstract: | In this study, we report on the structural characterization of Ni layer and Ni/Ti bilayer contacts on n-type 4H-SiC. The resulting Ni-silicides and the redistribution of carbon, after annealing at 950 °C, in the Ni/SiC and the Ni/Ti/SiC contacts are particularly studied by Rutherford Backscattering Spectrometry (RBS) at Eα = 3.2 MeV, nuclear reaction analysis (NRA) at Ed = 1 MeV, scanning electron microscopy (SEM) and Energy Dispersive X-ray Spectrometry (EDS) techniques. |
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| Keywords: | SiC Ohmic contact Nickel Titanium RBS NRA SEM/EDS |
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