Ion-induced secondary electron emission from ZnS thin films deposited by closed-spaced sublimation |
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Authors: | M AshrafS Ullah S HussainAH Dogar A Qayyum |
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Institution: | a Department of Metallurgy and Materials Engineering, Pakistan Institute of Engineering and Applied Sciences, Islamabad, Pakistan b Physics Division, Pakistan Institute of Nuclear Science and Technology, P.O. Nilore, Islamabad, Pakistan |
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Abstract: | ZnS thin films were deposited on soda lime glass and aluminum substrates by close-spaced sublimation technique. The change in composition, structural and optical properties of the films was investigated as a function of the substrate temperature. The deposited films were stoichiometric and crystalline in nature having cubic structure oriented only along (1 1 1) plane. The energy band gap of the films deposited at the substrate temperature of 150, 250 and 350 °C was 3.52, 3.58 and 3.63 eV respectively. These films were then bombarded with 2-10 keV energy pulsed Ar+ beam and their electron yield was determined from impinging ion and emitted electron currents. The electron yield of ZnS films was much high as compared to the metals. The electron yield of ZnS films increased with energy of the incident ion and got saturated at about 8 keV. The most important result of this study was that the electron yield of ZnS films having same composition was different. Monte Carlo simulations performed to interpret these experimental findings showed that the dissimilar electron yields of ZnS films is due to the combined effect of energy band gap, surface barrier potential and density of the films. |
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Keywords: | 78 20 Ci 78 66 &minus w 78 66 Hf 79 20 Rf 79 20 Ap |
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