Characterization of plasma fluorinated zirconia for dental applications by X-ray photoelectron spectroscopy |
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Authors: | SD WolterJR Piascik BR Stoner |
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Institution: | a Department of Electrical and Computer Engineering, Duke University, Durham, NC 27708, USA b RTI International, Center for Materials & Electronic Technologies, Research Triangle Park, NC 27709, USA |
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Abstract: | This paper discusses fluorination of biomedical-grade yttria-stabilized zirconia (YSZ) by sulfur hexafluoride plasma treatment and characterization of near-surface chemistry products by X-ray photoelectron spectroscopy (XPS). Deconvolution of the Zr 3d and Y 3d XPS core level spectra revealed formation of both ZrF4 and YF3. In addition, seven-coordinate ZrO2F5 and/or ZrO3F4 phases were deconvolved, retaining similar atomic coordination as the parent oxide and believed to have formed by substitutional displacement of oxygen by fluorine. No additional components attributed to yttria oxyfluoride were deconvolved. Argon ion sputter depth profiling determined the overlayer to be ∼4.0 nm in thickness, and angle resolved XPS showed no angle dependence on component percentages likely due to fluorination extending into the grain boundaries of the polycrystalline substrates. Importantly, the conversion layer did not induce any apparent change in zirconia crystallinity by inspection of Zr-O 3d5/2,3/2 peak positions and full-width-at-half-maximum values, important for retaining its desirable mechanical properties. |
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Keywords: | Surface modification Zirconia YSZ Adhesion XPS |
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