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分子束外延GaN薄膜的X射线光电子能谱和俄歇电子能谱研究
引用本文:苑进社,陈光德,齐鸣,李爱珍,徐卓.分子束外延GaN薄膜的X射线光电子能谱和俄歇电子能谱研究[J].物理学报,2001,50(12):2429-2433.
作者姓名:苑进社  陈光德  齐鸣  李爱珍  徐卓
作者单位:(1)西安交通大学电子材料研究所,西安710049; (2)西安交通大学应用物理系,西安710049; (3)西安交通大学应用物理系,西安710049,西安理工大学应用物理系,西安710048; (4)中国科学院上海冶金研究所,上海200050
基金项目:国家自然科学基金(批准号:19874049)资助的课题.
摘    要:用XPS和AES电子能谱的方法对等离子体辅助分子束外延(MBE)生长的GaN薄膜进行了表面分析和深度剖析.发现红外分子束外延(RFMBE)生长的富镓GaN薄膜实际表面存在O和C吸附层,C主要为物理吸附,而O在GaN表面形成局域化学键产生氧络合物覆盖层,并形成一定的深度分布.杂质O在GaN带隙中导带底形成杂质带同时引入深受主能级,使得带隙变窄室温光吸收谱向低能方向移动,光致发光谱出现宽带发光峰.从而影响GaN薄膜的电学和光学性质 关键词: GaN薄膜 X射线光电子能谱 俄歇电子能谱 表面分析

关 键 词:GaN薄膜  X射线光电子能谱  俄歇电子能谱  表面分析
文章编号:1000-3290/2001/50(12)2429-05
收稿时间:2001-02-25
修稿时间:2001年2月25日

XPS AND AES INVESTIGATION OF GaN FILMS GROWN BY MBE
YUAN JIN-SHE,CHEN GUANG-DE,QI MING,LI AI-ZHEN and XU ZHUO.XPS AND AES INVESTIGATION OF GaN FILMS GROWN BY MBE[J].Acta Physica Sinica,2001,50(12):2429-2433.
Authors:YUAN JIN-SHE  CHEN GUANG-DE  QI MING  LI AI-ZHEN and XU ZHUO
Abstract:The surface composition of GaN grown by plasma-assisted MBE was investigated using X-ray photoelectron spectroscopy and Auger election emission spectroscopy(AES), while the depth profile was analyzed by AES with Ar iron sputtering. The experimental results indicated that unintentional doped semi-in salating films formed by plasma-assisted MBE had a rich-gallium surface. It was found that the impurity carbon was chiefly adsorbed onto the surface while oxygen diffused into the bulk to distribute in a certain depth. Consequently, the oxygen-related impurity band and an acceptor level could be simultaneously formed in the layer. This influenced the optical and electrical properties of the films.
Keywords:GaN film  XPS  AES  surface analysis
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