Isoelectric point-controlled preferential photodeposition of platinum on Cu2O-TiO2 composite surfaces |
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| Authors: | Mei Wang Yuanxu Liu Dan Li Junwang Tang Weixin Huang |
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| Institution: | 1. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan;2. Faculty of Chemistry, VNU University of Science, Hanoi 10000, Vietnam;1. State Key Laboratory of Coal Combustion, School of Energy and Power Engineering, Huazhong University of Science & Technology, 1037 Luoyu Road, Wuhan 430074, China;2. Department of Chemical Engineering, National Taiwan University, No. 1, Section 4, Roosevelt Road, Taipei 10617, Taiwan |
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| Abstract: | Photodeposition emerges as a convenient method to synthesize metal particles on semiconductor supports. In this work, we study the photodeposition of Pt on Cu2O-TiO2 composite surfaces employing H2PtCl6 aqueous solution as the precursor and reveal a key role of isoelectric point of oxide surfaces on the Pt photodeposition process. Under the photodeposition conditions, Pt metal particles are facilely photodeposited on TiO2 support; on Cu2O-TiO2 composite supports, the Cu2O surface is positively charged and enriched with photo-excited holes while the TiO2 surface is negatively charged and enriched with photo-excited electrons. This lead to the preferential adsorption of PtCl62- anion precursor on the Cu2O surface of Cu2O-TiO2 composite and the dominant formation of Pt oxide particles on Cu2O surface but few Pt metal particles on TiO2 surface. Consequently, the activity of resulting Pt/Cu2O-TiO2 composite photocatalysts in photocatalytic water reduction decreases as the Cu2O content increases. These results deepen the understanding of photodeposition processes on oxide composite surfaces. |
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| Keywords: | Photocatalysts Photocatalytic water reduction Selective adsorption Oxide composite Co-catalyst |
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