| LaB6场发射阵列牺牲层制备工艺 |
| |
| 引用本文： | 代令,祁康成,林祖伦,陈文彬,李东方.LaB6场发射阵列牺牲层制备工艺[J].强激光与粒子束,2009,21(6). |
| |
| 作者姓名： | 代令 祁康成 林祖伦 陈文彬 李东方 |
| |
| 作者单位： | 电子科技大学 光电信息学院， 成都 610054 |
| |
| 基金项目： | 国防科技基础研究基金 |
| |
| 摘 要： | 分析了传统牺牲层材料铝在制备LaB6场发射阵列时存在的问题，利用溅射及热蒸发工艺依次制备铝膜和氧化锌膜，制备出了一种新型的牺牲层——ZnO-Al复合牺牲层，并对所制备的阵列进行了测试。实验结果表明：ZnO-Al复合牺牲层能够有效地解决电化学腐蚀的问题，所制备出的LaB6场发射阵列尖锥保持了完好的形貌，其发射特性也达到了最初制备场发射阵列的要求，说明ZnO-Al复合牺牲层是作为LaB6场发射阵列牺牲层的理想材料。
|
| 关 键 词： | 六硼化镧 场发射 牺牲层 溅射 ZnO-Al |
| 收稿时间： | 1900-01-01; |
Fabrication technology of sacrificial layer in LaB6 field emission arrays |
| |
| Dai Ling,Qi Kangcheng,Lin Zulun,Chen Wenbin,Li Dongfang.Fabrication technology of sacrificial layer in LaB6 field emission arrays[J].High Power Laser and Particle Beams,2009,21(6). |
| |
| Authors: | Dai Ling Qi Kangcheng Lin Zulun Chen Wenbin Li Dongfang |
| |
| Institution: | School of Opto-Electronic Information, University of Electronic Science andTechnology of China, Chengdu 610054, China |
| |
| Abstract: | This paper analyzes the localization of traditional sacrificial layer material aluminum and brings forward a new sacrificial layer—ZnO-Al complex sacrificial layer. By means of sputtering to prepare aluminum film and evaporating to prepare zinc-oxide film, field emission arrays are fabricated and then tested. The result indicates that ZnO-Al complex sacrificial layer can solve the problem of electrochemistry, the LaB6 field emission array tips with ZnO-Al layer are in good condition and the array maintains field emission characteristics. |
| |
| Keywords: | ZnO-Al |
| 本文献已被 维普 万方数据 等数据库收录！ |
| 点击此处可从《强激光与粒子束》浏览原始摘要信息 |
| 点击此处可从《强激光与粒子束》下载免费的PDF全文 |
|
