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Photolysis of (Me2Si)6 in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)6 |
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| Authors: | Matthew J Almond J Pat Cannady Tracey A Darling J Steven Ogden Robin Walsh |
| Institution: | a Department of Chemistry, University of Reading, Whiteknights, Reading RG6 6AD, UK b Dow-Corning Corporation, Mail 128, PO Box 995, Midland, MI 48686-0995, USA c Department of Chemistry, University of Southampton, Highfield, Southampton SO17 1BJ, UK |
| Abstract: | Irradiation using a low pressure mercury lamp (λ=ca. 250 nm) of argon matrices containing ca. 1% (Me2Si)6 and ca. 20% ethylene oxide (C2H4O) or nitrous oxide (N2O) for a period of ca. 20 h leads to the formation of the cyclic compound (Me2SiO)6. This has a 12-membered ring with alternating Si and O atoms. It is identified by comparison of its infrared spectrum with a spectrum of an authentic sample. The reaction appears to proceed by stepwise insertion of O atoms into Si---Si bonds. |
| Keywords: | Photolysis Matrix isolation (Me2Si)6 Oxidation |
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