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Large-area metallic photonic crystal fabrication with interference lithography and dry etching |
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| Authors: | H C Guo D Nau A Radke X P Zhang J Stodolka X L Yang S G Tikhodeev N A Gippius H Giessen |
| Institution: | (1) Institute of Applied Physics, University of Bonn, Wegelerstrasse 8, 53115 Bonn, Germany;(2) Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge, CB3 0HE, UK;(3) Stiftung Caesar, Ludwig-Erhard-Allee 2, 53175 Bonn, Germany;(4) A.M. Prokhorov General Physics Institute RAS, Moscow, 119991, Russia;(5) 4th Physics Institute, University of Stuttgart, 70569 Stuttgart, Germany |
| Abstract: | Large-area one-dimensional periodic metallic structures were fabricated on a waveguide layer with interference lithography and dry etching. As narrow as 115-nm gold nanowires were obtained with a period of 395 nm, covering a homogeneous area as large as 5 × 5 mm2. Extinction measurements demonstrate the strong coupling between waveguide mode and gold-particle plasmon resonance. We demonstrate good agreement with a scattering-matrix theory. The dispersion of the metallic photonic crystals was obtained by angle-resolved measurements. This method represents a simple and low-cost way to fabricate large-area metallic photonic crystals. |
| Keywords: | 42 25 Hz 42 70 Qs 85 40 Hp 81 65 Cf |
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