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SOI部分耗尽SiGe HBT集电结空间电荷区模型
引用本文:徐小波,张鹤鸣,胡辉勇,许立军,马建立.SOI部分耗尽SiGe HBT集电结空间电荷区模型[J].物理学报,2011,60(7):78502-078502.
作者姓名:徐小波  张鹤鸣  胡辉勇  许立军  马建立
作者单位:西安电子科技大学微电子学院,宽禁带半导体材料与器件重点实验室,西安 710071
基金项目:国家部委资助项目(批准号:51308040203, 6139801),中央高校基本科研业务费(批准号:72105499, 72104089)和陕西省自然科学基础研究计划(批准号:2010JQ8008)资助的课题.
摘    要:SOI上的薄膜异质SiGe晶体管通过采用"折叠"集电极,已成功实现SOI上CMOS与HBT的兼容.本文结合SOI薄膜上的纵向SiGe HBT结构模型,提出了包含纵向、横向欧姆电阻和耗尽电容的"部分耗尽 (partially depleted) 晶体管"集电区简化电路模型.基于器件物理及实际考虑,系统建立了外延集电层电场、电势、耗尽宽度模型,并根据该模型对不同器件结构参数进行分析.结果表明,空间电荷区表现为本征集电结耗尽与MOS电容耗尽,空间电荷区宽度随集电结掺杂浓度减小而增大,随集电结反偏电压提高而增大, 关键词: SOI SiGe HBT 集电区 空间电荷区模型

关 键 词:SOI  SiGe  HBT  集电区  空间电荷区模型
收稿时间:2010-06-21

A collector space charge region model for SiGe HBT on thin-film SOI
Xu Xiao-Bo,Zhang He-Ming,Hu Hui-Yong,Xu Li-Jun and Ma Jian-Li.A collector space charge region model for SiGe HBT on thin-film SOI[J].Acta Physica Sinica,2011,60(7):78502-078502.
Authors:Xu Xiao-Bo  Zhang He-Ming  Hu Hui-Yong  Xu Li-Jun and Ma Jian-Li
Institution:Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
Abstract:SiGe heterojunction bipolar transistor (HBT) on thin film SOI has been successfully integrated with SOI CMOS by "folded collector". This paper deals with the collector of "partially depleted transistor" according to the thin film vertical SiGe HBT structure. A simplified circuit model including vertical and horizontal resistors and depletion capacitance is presented for the first time, and the model of the collector for field, voltage, and depletion width is systematically established. The model is analyzed with reasonable parameters. The results indicate that the space charge region consists of intrinsic junction depletion and MOS capacitance depletion, that the width of the space charge region increases with doping concentration of the collector, larger reverse junction voltage, and smaller substrate voltage, and that the region features a vertical expansion followed by a lateral expansion. This space charge region model of collector provides a valuable reference to the SiGe mm-wave BiCMOS circuit design and simulation on thin film SOI.
Keywords:SOI  SiGe HBT  collector  space charge region model
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