首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Indium tin oxide as an optical memory material
Authors:M C de Andrade  S Moehlecke
Institution:(1) Instituto de Física ldquoGleb Wataghinrdquo, Universidade Estadual de Campinas, UNICAMP, 13083-970 Campinas, São Paulo, Brazil;(2) Institute for Pure and Applied Physical Sciences, University of California, 92093 San Diego, La Jolla, CA, USA
Abstract:Indium Tin Oxide (ITO) films prepared by reactive rf sputtering show excellent properties for optical recording applications in a very narrow range of oxygen partial pressure (around 4×10–5 Torr). This narrow range is at the edge of a plateau in the electrical conductivity of the films. A small increase in the oxygen partial pressure (P(O2)ap5×10–5 Torr) causes a large and abrupt change in the electrical conductivity as well as in the structural and optical properties of these films. In addition, irradiating films at the edge of the plateau (P(O2)ap4×10–5) with a low-power pulsed laser (le25 mW) yields transparent films. These results suggest that the same mechanism may be responsible for the opaque to transparent transformations observed in these experiments.
Keywords:42  79  Vb  42  70  Ln
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号