Ti/TiN multilayer thin films deposited by pulse biased arc ion plating |
| |
| Authors: | Yanhui Zhao Guoqiang LinJinquan Xiao Hao DuChuang Dong Lijun Gao |
| |
| Institution: | a Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, China
b Key Laboratory for Materials Modification by Laser, Ion and Electron beams (Dalian University of Technology), Ministry of Education, Dalian 116024, China |
| |
| Abstract: | In this work, the effect of modulation period (Λ) on Ti/TiN multilayer films deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating is reported. The crystallography structures and cross-sectional morphology of Ti/TiN multilayer films were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. Their mechanical properties were determined via nanoindentation measurements, while the film/substrate adhesion via the scratch test. It was found that the highest hardness value reached 43 GPa for the modulation period of 54 nm, while the film/substrate adhesion also reached the highest value of 83 N. Furthermore, the hardness enhancement mechanism in the multilayer films is discussed. |
| |
| Keywords: | Multilayer films Pulse biased arc ion plating Hardness Adhesion |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
