Development of B‐doped Si multiple delta‐layer reference materials for SIMS profiling

B‐doped Si multiple delta‐layers (MDL) were developed as certified reference materials (CRM) for secondary ion mass spectrometry (SIMS) depth profiling analysis. Two CRMs with different delta‐layer spacing were grown by ion beam sputter deposition (IBSD). The nominal spacing of the MDL for shallow junction analysis is 10 nm and that for high energy SIMS is 50 nm. The total thickness of the film was certified by high resolution transmission electron microscopy (HR‐TEM). The B‐doped Si MDLs can be used to evaluate SIMS depth resolution and to calibrate the depth scale. A consistency check of the calibration of stylus profilometers for measurement of sputter depth is another possible application. The crater depths measured by a stylus profilometer showed a good linear relationship with the thickness measured from SIMS profiling using the calibrated film thickness for depth scale calibration. The sputtering rate of the amorphous Si thin film grown by sputter deposition was found to be the same as that of the crystalline Si substrate, which means that the sputtering rate measured with these CRMs can be applied to a real analysis of crystalline Si. Copyright © 2005 John Wiley & Sons, Ltd.     

轮廓仪检测的系统误差分析

从轮廓仪的工作原理出发，分析了影响轮廓仪检测精度的主要系统误差，并以二次旋转非球面为例计算了系统误差对面形检测精度的影响，得出Talysurf轮廓仪在测量时，系统误差对面形误差的影响随顶点曲率的绝对值、口径以及偏心率函数的增大而增大，随定位误差和不重合误差的增大而增大的结论。最后的实验结果证明了该结论的正确性。     

中小口径非球面元件加工技术的探讨

结合非球面轮廓检验和抛光工艺技术设备的研究 ,探讨了一种规范化的针对中小口径非球面元件的加工方法 ,并具体分析了实现非球面高效率批量化生产的技术途径 ,为中小非球面元件的广泛应用提供了有利的技术支持。     

层析三维数字化仪层析图像滤波器的设计及研究

提出一种新型的递归中值滤波器，抛掉了统计参数的制约，将滤波算法转化为一种优化处理。该方法兼顾了滤波处理的光滑连续性及抑制噪声的累积特性，可有效地消除脉冲型干扰的影响，同时也从理论的角度上对该算法进行了分析。为消除加性高斯噪声，提出了一种基于图像边缘方向的小波线性滤波器，它仅仅处理边缘信息。该算汉的极大优点是克服了边缘模糊效应，小波的去噪逆向重构的处理方法对边缘为跃型的层析图象非常实用。     

A Shack–Hartmann measuring head for the two‐dimensional characterization of X‐ray mirrors

The recent development of short‐wavelength optics (X/EUV, synchrotrons) requires improved metrology techniques in terms of accuracy and curvature dynamic range. In this article a stitching Shack–Hartmann head dedicated to be mounted on translation stages for the characterization of X‐ray mirrors is presented. The principle of the instrument is described and experimental results for an X‐ray toroidal mirror are presented. Submicroradian performances can be achieved and systematic comparison with a classical long‐trace profiler is presented. The accuracy and wide dynamic range of the Shack–Hartmann long‐trace‐profiler head allow two‐dimensional characterizations of surface figure and curvature with a submillimeter spatial resolution.     

Shack-Hartmann波前传感器非零位在轴检测离轴非球面反射镜

在离轴非球面反射镜研磨后期和粗抛光阶段,被测反射镜面形与理想面形存在着较大的偏差,表面反射率较低,采用干涉测量会因局部区域干涉条纹过密或条纹对比度过低,造成普通干涉仪无法进行全口径测量,而普通接触式轮廓仪测量精度此时已经不能满足加工要求。鉴于Shack-Hartmann波前传感器较大的动态范围和较高的测量精度,提出了采用Shack-Hartmann波前传感器非零位在轴检测离轴非球面面形,研究了该方法的检测原理并搭建了检测系统,分析了系统误差来源,并制作了用于在轴检测离轴非球面的参考波前,对两个不同加工精度的离轴非球面反射镜进行了测量,并与干涉仪的测量结果进行了对比。对比结果表明,Shack-Hartmann波前传感器的测量结果是正确可靠的,并且可以弥补轮廓仪测量和干涉仪测量的不足,从而证明了采用Shack-Hartmann波前传感器在轴检测离轴非球面的可行性和正确性。     

数字微镜器件的时空特性对相位测量轮廓术的影响

数字微镜器件是一种新型的微电子、微机械、微光学集成器件,可广泛的用于大屏幕投影显示。实际上,数字微镜器件作为一种新型的空间光调制器,在光学信息处理和结构照明型三维传感中也具有广泛的应用前景。介绍了数字微镜器件和数字光处理器的基本原理,分析了数字微镜器件的时间空间特性,用计算机模拟了这种时空特性对相位测量轮廓术的影响。结果表明,数字微镜器件(DMD)可为投影系统在结构照明型光学三维传感中的应用提供指导。     

轮廓仪在柱面镜检测中的应用

目前柱面镜检测的主要方法是样板比较法和干涉法。样板法对球面、柱面样板均有较高要求，而干涉法也需合适的高要求的辅助镜，并且对环境要求较严格。提出了用轮廓仪配用合适工装检测柱面镜的方法，该方法简洁、直观、快速，对环境要求较低。分析了该方法的检测误差，实验验证了分析的正确性，指出高精度轮廓仪在一定范围内能保证柱面镜的检测精度。这种方法不仅适用于零件的最终检测，也适用于加工过程中的检测。     

Effects of Smoothing on Multivariate Statistical Properties of the Normal to a Rough Curve or Surface

Much of the practical interest attached to curves and surfaces derives from features of roughness, rather than smoothness. For example, considerable attention has been paid to fractal models of curves and surfaces, for which the notions of a normal and curvature are usually not well defined. Nevertheless, these quantities are sometimes measurable, because the device for recording a rough surface (such as a stylus or “compass”) adds its own intrinsic smoothness. In this paper we address the effect of such smoothing operations on the multivariate statistical properties of a normal to the surface. Particular attention is paid to the validity of commonly assumed unimodal approximations to the distribution of the normal. It is shown that the actual distribution may have more than one mode, although in a range of situations the unimodal approximation is valid.     

Observation of ground surface roughness values obtained by stylus profilometer and white light interferometer for common metal materials

To find some practical understandings and to derive some rules for roughness calibration for common metal materials, this paper counts surface roughness on 50 ground workpieces of five different materials obtained by a stylus profilometer (here-in-after, ‘SP’) and a white light interferometer (here-in-after, ‘WLI’). The materials include iron, stainless steel, 45 steel, copper and aluminium on which hardness values are widely ranged. The results show that SP measurement result is generally smaller than WLI measurement result for its stylus tip size and scratches on surface. The SP method has obvious scratches on soft materials (Al and Cu), which leads to the reduction of low spatial frequency information on the measured profile. WLI measurement result is more accurate when measured surface is smooth while SP is more suitable for rough and hard surface roughness measurement.