Synthesis and properties of UV curable polyvinylsilazane as a precursor for micro‐structuring

Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1‐bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN‐based ceramic microstructures. The acrylate‐modified polymers (m‐PVSZ) were characterized by ¹H‐NMR, ¹³C‐NMR and FT‐IR methods to determine the chemical reaction mechanism. Differential photo‐calorimeter and FT‐IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano‐imprinting method; multi‐layered octagon structures were fabricated by a two‐photon absorption stereolithography process. The results indicate that m‐PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures. Copyright © 2015 John Wiley & Sons, Ltd.