Synthesis and properties of UV curable polyvinylsilazane as a precursor for micro‐structuring |
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| Authors: | Yi‐He Li Kwang‐Duk Ahn Dong‐Pyo Kim |
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| Affiliation: | 1. College of Science, National University of Defense Technology, Changsha, Hunan, PR China;2. Polymer Research Center, Korea Institute of Science and Technology, Seoul, Republic of Korea;3. National Center of Applied Microfluidic Chemistry, Department of Chemistry and Engineering, POSTECH, Gyungbuk, Republic of Korea |
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| Abstract: | Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1‐bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN‐based ceramic microstructures. The acrylate‐modified polymers (m‐PVSZ) were characterized by 1H‐NMR, 13C‐NMR and FT‐IR methods to determine the chemical reaction mechanism. Differential photo‐calorimeter and FT‐IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano‐imprinting method; multi‐layered octagon structures were fabricated by a two‐photon absorption stereolithography process. The results indicate that m‐PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures. Copyright © 2015 John Wiley & Sons, Ltd. |
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| Keywords: | polyvinylsilazne photoresist UV curing microstructure |
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