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The transient time-resolved reflectivity of chromium film is studied by femtosecond pump-probe technique with a 70-fs laser. Experimental results show that the reflectivity change increases with the power of the pump laser. The fast decrease of the reflectivity occurs between 0-200 fs which is mainly due to the electron-electron interaction. Subsequencely, the slower recovery of the reflectivity between 200-900 fs is mainly due to the electron-phonon coupling process. The reflectivity after 900 fs rises little to a near-constant value for the thermal equilibrium of the system. The experimental results can be explained properly with numerical simulation of the two-temperature model. It is helpful for understanding of the electron ultrafast dynamics in chromium film. 相似文献
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光折变全息记录和二波耦合过程都是动力学光栅过程 ,二光束的干涉光强通过激发电子而产生感应相位栅与此相位栅通过光波耦合改变光束的相对强度的这两个过程同时发生 .以干涉光强调制度为主要变量 ,对于联立的带传输方程和耦合波方程 ,求得了适用于任意的干涉光强调制度下的解析解 ,其中考虑了电子的扩散、漂移、光生伏打效应 ,并且以不同的光激发效率作为初始条件 .此解比原来的不考虑光束耦合的全息记录或不考虑非线性响应的光束耦合更精确 .计算表明 ,对比于线性近似下的典型二波耦合 ,动态光栅的调制度在晶体内的空间变化更为缓慢 . 相似文献
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建立了包括扩散、漂移和光伏打效应三种输运机制,小信号光强、小调制度近似下描述双掺杂LiNbO3:Fe:Mn晶体用双色光进行全息存储的动力学的耦合微分方程组,数值求解并解释了晶体光存储的时间动态发展过程.在此基础上,分析了晶体的氧化还原程度对全息存储过程的影响,只有在晶体总的受主数密度Na(即Fe3+和Mn3+的数密度之和)大于铁离子数密度N2的条件下,双掺杂LiNbO3:Fe:Mn晶体全息存储才能达到非破坏性存储的目的.经过光固定的光栅的衍射效率随氧化增大,光折变灵敏度随氧化而减小,要获得高衍射效率就必须以降低光折变灵敏度为代价.在掺铁浓度一定的情况下,掺锰浓度越高,能实现信息长期存储对应的氧化还原状态的有效动态范围越大. 相似文献
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A simple modal analysis (MA) method to explain the diffraction process of 0th order nulled phase mask is presented. In MA, multiple reflections of the grating modes at grating interfaces are considered by introducing equivalent Fresnel coefficients. Analytical expressions of the diffraction efficiencies and modal guidelines for the 0th order hulled phase grating design are also presented. The phase mask structure, which comprises a high-index contrast HfO2 grating and a fused-silica substrate, is optimized using rigorous coupled-wave analysis around the 800-nm wavelength, after which the modal guideline for cancellation of the 0th order in a phase mask is verified. The proposed MA method illustrates the inherent physical mechanism of multiple reflections of the grating modes in the diffraction process, which can help to analyze and design both low-contrast and high-contrast gratings. 相似文献