Electron-stimulated desorption of europium atoms from an oxidized tungsten surface

The yield of europium atoms in electron-stimulated desorption from Eu layers adsorbed on the surface of oxidized tungsten was studied with a surface-ionization detector as a function of the incident-electron energy, surface coverage by europium, and degree of tungsten oxidation. The yield of Eu atoms measured as a function of electron energy exhibits a distinct resonant character with peaks at electron energies corresponding to europium and tungsten core-level ionization energies. The peaks associated with the europium ionization reach a maximum intensity at europium coverages less than 0.1 and decrease subsequently to zero with increasing coverage, while the peaks due to tungsten ionization pass through the maximum intensity at a monolayer europium coverage. The coverage corresponding to the maximum europium atom yield grows with increasing tungsten oxidation. The results obtained are accounted for by the formation of the europium and tungsten core excitons. In the first case, the particles desorb in the reverse motion toward the surface of the oxidized tungsten; in the second, they desorb as a result of repulsion between the tungsten core exciton and the EuO molecule.     

Oxidation kinetics of thin titanium films grown on tungsten

Growth of thin Ti films on (100)W and the kinetics of their oxidation are studied using thermal-desorption spectroscopy and Auger electron spectroscopy. Titanium films grow nearly layer by layer on the (100)W face at room temperature. The activation energy for desorption of Ti atoms decreases from 5.2 eV for coverage θ=0.1 to 4.9 eV in a multilayer film. Oxidation of a thin (θ=6) titanium film starts with dissolution of oxygen atoms in its bulk to the limiting concentration for a given temperature, after which the film oxidizes to TiO, with the TiO₂ oxide starting to grow when exposure of the film to oxygen is prolonged. The thermal desorption of oxides follows zero-order kinetics and is characterized by desorption activation energies of 5.1 (TiO) and 5.9 eV (TiO₂).     

Electron-stimulated desorption of cesium atoms from cesium layers deposited on a germanium-coated tungsten surface

The yield and energy distribution of Cs atoms from cesium layers adsorbed on germanium-coated tungsten were measured, using the time-of-flight technique with a surface-ionization-based detector, as a function of the energy of bombarding electrons, germanium film thickness, the amount of adsorbed cesium, and substrate temperature. The threshold for the appearance of Cs atoms is ～30 eV, which correlates well with the germanium 3d-level ionization energy. As the electron energy increases, the Cs atom yield passes through a broad maximum at ～120 eV. For germanium film thicknesses from 0.5 to 2 monolayers, resonance Cs yield peaks were observed at electron energies of 50 and 80 eV, which can be related to the tungsten 5p and 5s core-level ionization energies. As the cesium coverage increases, the Cs atom yield passes through a flat maximum at monolayer coverage. The energy distribution of Cs atoms follows a bell-shaped curve. With increasing cesium coverage, this curve shifts to higher energies for thin germanium films and to lower energies for thick films. The Cs energy distribution measured at a substrate temperature T = 160 K exhibits two bell-shaped peaks, namely, a narrow peak with a maximum at ～0.35 eV, associated with tungsten core-level excitation, and a broad peak with a maximum at ～0.5 eV, deriving from the excitation of the germanium 3d core level. The results obtained can be described within a model of Auger-stimulated desorption.     

Track membrane with immobilized colloid silver particles

A method for modification of track membranes by immobilization of polymer complexes of colloid silver nanoparticles on the surface of microfiltration membranes was developed. The antimicrobial properties of track membranes modified with silver nanoparticles were tested on E. coli, Ps. aeruginosa, St. aureus, and B. cereus.     

Application of electron-stimulated desorption for studying adsorbed layers

After a brief discussion of the main result of the research initiated by N.I. Ionov in his laboratory using electron-stimulated desorption for studying the surface layers of tungsten, we consider in greater detail recent results on layered coatings formed on the tungsten surface upon simultaneous adsorption of sodium (or cesium) and gold atoms on this surface, as well as the effect of sputtering of samarium atoms on the (Cs + Au)/W(100) surface that has already been formed at 300 K.     

Electron-stimulated cesium atom desorption from the Cs/CsAu/Au/W system

This paper reports on a continuation of the investigation of electron-stimulated Cs-atom desorption from a tungsten surface on which cesium and gold films had been adsorbed at T = 300 K. Earlier studies revealed that Cs atoms start to desorb only after more than one monolayer of gold and more than one monolayer of cesium had been deposited on the tungsten surface. In this case, a coating consisting of a gold adlayer on tungsten, a CsAu compound possessing semiconducting properties, and a cesium monolayer capping CsAu (Cs/CsAu/Au/W) is formed on the tungsten surface at 300 K. The yield of atoms from this system exhibits a resonant dependence on the incident electron energy E _e , with an appearance threshold of 57 eV and a maximum at 64 eV. In this case, Cs atoms desorb in two channels, with one of them involving Cs desorption out of the cesium monolayer, and the other, from the CsAu monolayer. The Cs yield at E _e = 64 eV has been investigated in both desorption channels, with an additional cesium coating deposited on the already formed Cs/CsAu/Au/W layered system, as well as of the effect annealing produces on the yield and energy distributions of Cs atoms. It has been demonstrated that Cs atoms evaporated at 300 K on a layered coating with a cesium monolayer atop the CsAu layer on tungsten capped with a gold adlayer, rather than reflected from the cesium monolayer or adsorbing on it, penetrate through the cesium monolayer into the bulk of CsAu even with one CsAu layer present. The desorption yield does not vary with increasing cesium concentration at 300 K, but falls off gradually at 160 K. Annealing within the temperature range 320 K ≤ T _H ≤ 400 K destroys the cesium monolayer and the one-layer CsAu coating, but the multilayer CsAu compound does not break up in this temperature range even after evaporation of the cesium monolayer. It is shown that Cs atoms escape from the multilayer CsAu compound primarily out of the top CsAu layer.     

Retentivity and separability of silica gel modified by chiral selector <Emphasis Type="Italic">N</Emphasis>-(3-sulfo,3-carboxy)-propionylchitosan

A new sorbent based on silica gel modified by N-(3-sulfo,3-carboxy)-propionylchitosan (SCPC-modified silica gel) has been synthesized, and its chromatographic properties have been studied. The laws governing the retention and resolution of chiral compounds with the use of SCPC have been investigated. The enantioselectivity of the sorbent toward several basic compounds, including fluoxetine, chlorcyclizine, pindolol, and other medicinals, has been investigated.     

Electron-stimulated desorption of rare-earth metal atoms

The yield of europium and samarium atoms in electron-stimulated desorption from layers of rare-earth metals (REMs) adsorbed on the surface of oxidized tungsten has been measured as a function of the incident electron energy, surface coverage by REMs, degree of tungsten oxidation, and substrate temperature. The measurements were performed using the time-of-flight method with a surface-ionization-based detector within the substrate temperature interval 140–600 K. The yield studied as a function of electron energy has a resonance character. Overlapping resonance peaks of Sm atoms are observed at electron energies of 34 and 46 eV, and those of Eu atoms, at 36 and 41 eV. These energies correlate well with the REM 5p and 5s core-level excitation energies. The REM yield is a complex function of the REM coverage and substrate temperature. The peaks due to REM atoms are seen at low REM coverages only, and their intensity usually passes through a maximum with increasing coverage and substrate temperature. The concentration dependence of the REM atom yield is affected by the deposition of slow Ba⁺ ions, but only if they are deposited after the REM adsorption. At higher REM coverages, additional peaks are observed at electron energies of 42, 54, and 84 eV, which originate from excitation of the 5p and 5s tungsten levels and result from desorption of SmO and EuO molecules. The temperature dependence of the intensity of these peaks is explained to be due to the order-disorder phase transition. The desorption of REM atoms is the result of their reversed motion through the adsorbed REM layer, and the SmO and EuO molecules desorb due to the formation of an antibonding state between the REM oxide molecules and the tungsten ions.     

Nucleophilic substitution in 4-bromo-5-nitrophthalodinitrile: XV. Synthesis of bis-4,5-(phenylsulfanyl)phthalonitrile,octakis-4,5-(phenylsulfanyl)phthalocyanines,and their sulfo and alkylsulfamoyl derivatives

Novel water- and organic-soluble derivatives of octakis-4,5-(sulfanylphenyl)phthalocyanine and its magnesium and aluminum complexes were synthesized starting from 4,5-bis(phenylsulfanyl)phthalonitrile obtained by nucleophilic substitution of the bromine and nitro group in 4-bromo-5-nitrophthalonitrile. Spectral and luminescence characteristics of the newly synthesized compounds were studied.