高压超大电流光电导开关及其击穿特性研究

研制了耐压达32 kV,通态峰值电流达3.7 kA的高压超大电流半绝缘GaAs光电导开关.分析了光电导开关在强场下的击穿机理,指出对于间接能带间隙光导材料(如Si)制作的光电导开关,开关的击穿电压主要由陷阱填充限制电导模型决定.而对于直接能带间隙光导材料(如GaAs,InP等)制作的光电导开关,开关击穿主要是由开关体负阻效应在开关阳极产生的空间电荷累积所导致的开关阳极电场剧增引起的.基于转移电子效应对GaAs光电导开关击穿电压进行了理论计算,计算结果与实验相一致. 关键词： 光电导开关 击穿 转移电子效应 陷阱填充     

Mechanism of Current Oscillations in Gallium ArsenidePhotoconductive Semiconductor Switches

Semi-insulating photoconductive semiconductor switch with an electrode gap of 4 mm, triggered by a laser pulse with energy of 0.5md, and applied bias of 2.5kV, the periodicity current oscillation with a cycle of 12ns is obtained. It is indicated that the current oscillation is one mode of transferred electron effect, namely quenched domain mode. This mode of trans-electron oscillator is obtained when the instantaneous bias electric field drops below the sustaining field （the minimum electric field required to support the domain） before the domain reaches the anode, which leads to the domain disappears somewhere in the bulk of the switch and away from the ohmic contacts. We mainly analyse the time-dependent characteristic of the mode, the theoretical analysis results are in excellent agreement with the experiment.