GaN高电子迁移率晶体管强电磁脉冲损伤效应与机理

提出了一种新型GaN异质结高电子迁移率晶体管在强电磁脉冲下的二维电热模型,模型引入材料固有的极化效应,高场下电子迁移率退化、载流子雪崩产生效应以及器件自热效应,分析了栅极注入强电磁脉冲情况下器件内部的瞬态响应,对其损伤机理和损伤阈值变化规律进行了研究.结果表明,器件内部温升速率呈现出"快速-缓慢-急剧"的趋势.当器件局部温度足够高时(2000 K),该位置热电子发射与温度升高形成正反馈,导致温度急剧升高直至烧毁.栅极靠近源端的柱面处是由于热积累最易发生熔融烧毁的部位,严重影响器件的特性和可靠性.随着脉宽的增加,损伤功率阈值迅速减小而损伤能量阈值逐渐增大.通过数据拟合得到脉宽τ与损伤功率阈值P和损伤能量阈值E的关系.     

Modeling and understanding of the thermal failure induced by high power microwave in CMOS inverter

The thermal failure induced by high power microwave(HPM) in a complementary metal oxide semiconductor(CMOS) inverter is investigated and its dependence on microwave parameters is discussed in detail. An analytical model of the temperature distribution is established and the relationships between hotspot temperature and pulse width and between hotspot temperature and frequency are predicted, which reveals a more severe rise in temperature under the influence of microwave with longer width and lower frequency. The temperature variation mechanism and the theoretical temperature model are validated and explained by the simulation. Furthermore, variation trend of damage threshold with microwave parameters is derived theoretically, and the conclusions are consistent with simulation results and reported data.     

Theoretical prediction of new C–Si alloys in C2/m-20 structure

We study structural,mechanical,and electronic properties of C_(20),Si_(20) and their alloys(C_(16)Si_4,C_(12)Si_8,C_8Si_(12),and C_4Si_(16)) in C2/m structure by using density functional theory(DFT) based on first-principles calculations.The obtained elastic constants and the phonon spectra reveal mechanical and dynamic stability.The calculated formation enthalpy shows that the C-Si alloys might exist at a specified high temperature scale.The ratio of BIG and Poisson's ratio indicate that these C-Si alloys in C2/m-20 structure are all brittle.The elastic anisotropic properties derived by bulk modulus and shear modulus show slight anisotropy.In addition,the band structures and density of states are also depicted,which reveal that C_(20),C_(16)Si_4,and Si_(20) are indirect band gap semiconductors,while C_8Si_(12) and C_4Si_(16) are semi-metallic alloys.Notably,a direct band gap semiconductor(C_(12)Si_8) is obtained by doping two indirect band gap semiconductors(C_(20) and Si_(20)).     

外界条件在电磁脉冲对GaAs赝高电子迁移率晶体管损伤过程中的影响

结合器件仿真软件Sentaurus TCAD,建立了GaAs赝高电子迁移率晶体管器件的电磁脉冲损伤模型.基于此模型,从信号参数和外接电阻两个方面出发讨论了外界条件对器件电磁脉冲损伤效应的影响.结果表明,信号参数的改变能够显著影响器件的损伤时间:信号幅度通过改变器件的吸收能量速度来影响器件的损伤效应,其与器件损伤时间成反比;信号上升时间的改变能够提前或延迟器件的击穿点,其与器件损伤时间成正比.器件外接电阻能够减弱器件的电流沟道,进而延缓器件的损伤进程,且源极外接电阻的影响更加明显.     

Physics-based analysis and simulation model of electromagnetic interference induced soft logic upset in CMOS inverter

The instantaneous reversible soft logic upset induced by the electromagnetic interference(EMI) severely affects the performances and reliabilities of complementary metal–oxide–semiconductor(CMOS) inverters. This kind of soft logic upset is investigated in theory and simulation. Physics-based analysis is performed, and the result shows that the upset is caused by the non-equilibrium carrier accumulation in channels, which can ultimately lead to an abnormal turn-on of specific metal–oxide–semiconductor field-effect transistor(MOSFET) in CMOS inverter. Then a soft logic upset simulation model is introduced. Using this model, analysis of upset characteristic reveals an increasing susceptibility under higher injection powers, which accords well with experimental results, and the influences of EMI frequency and device size are studied respectively using the same model. The research indicates that in a range from L waveband to C waveband, lower interference frequency and smaller device size are more likely to be affected by the soft logic upset.     

六角对称Si2Ge和SiGe2的物理性质：第一性原理计算

本文通过第一性原理计算预测了P6₂22空间群中的两种新型第14族元素合金Si₂Ge和SiGe₂,系统研究了这两种合金的结构、稳定性、弹性各向异性、以及电子和热力学特性. P6₂22-Si₂Ge和P6₂22-SiGe₂具有六角对称结构,其声子谱和弹性常数表明这两种合金在常态环境压力下具有动力学和机械稳定性. P6₂22-Si₂Ge和P6₂22-SiGe₂的弹性各向异性通过杨氏模量的表面结构、剪切模量的等高面和泊松比的方向依赖性进行了详细的研究,同时也讨论和比较了与第14族元素同素异形体P6₂22-Si₃和P6₂22-Ge₃的相关差异. 此外,通过对德拜温度和声速的测算,研究了P6₂22-Si₂Ge和P6₂22-SiGe₂的热力学特性.     

Investigation on latch-up susceptibility induced by high-power microwave in complementary metal–oxide–semiconductor inverter

The latch-up effect induced by high-power microwave(HPM) in complementary metal–oxide–semiconductor(CMOS) inverter is investigated in simulation and theory in this paper. The physical mechanisms of excess carrier injection and HPM-induced latch-up are proposed. Analysis on upset characteristic under pulsed wave reveals increasing susceptibility under shorter-width pulsed wave which satisfies experimental data, and the dependence of upset threshold on pulse repetitive frequency(PRF) is believed to be due to the accumulation of excess carriers. Moreover, the trend that HPMinduced latch-up is more likely to happen in shallow-well device is proposed.Finally, the process of self-recovery which is ever-reported in experiment with its correlation with supply voltage and power level is elaborated, and the conclusions are consistent with reported experimental results.     

Analysis of the damage threshold of the GaAs pseudomorphic high electron mobility transistor induced by the electromagnetic pulse

An electromagnetic pulse(EMP)-induced damage model based on the internal damage mechanism of the Ga As pseudomorphic high electron mobility transistor(PHEMT) is established in this paper. With this model, the relationships among the damage power, damage energy, pulse width and signal amplitude are investigated. Simulation results show that the pulse width index from the damage power formula obtained here is higher than that from the empirical formula due to the hotspot transferring in the damage process of the device. It is observed that the damage energy is not a constant, which decreases with the signal amplitude increasing, and then changes little when the signal amplitude reaches up to a certain level.