HER磁镜上硬X射线和热电子测量

一、引言 磁镜运行中,为了要知道它在电子回旋共振加热(ECRH)下形成热电子的参数,我们测量了硬X射线能谱、硬X射线发射的时间特性、不同磁场强度下形成热电子环的位置、以及热电子的脉冲幅度分布等。 HER是中国科学院等离子体物理研究所简单型磁镜装置,它的几何尺寸是,真空室长     

Improvement of Uniformity of Inductively Coupled Plasma with a one Spiral Antenna

Uniformity of inductively coupled plasma （ICP） is improved with a cone spiral antenna in our experiment. Performance of the ICP with a new type of antenna is experimentally investigated. The results indicate that the uniformity of plasma density in the radial direction is obviously improved as compared to the ICP with a planar spiral antenna. Performance of ICP is analysed with the experimental results.     

Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna

This paper develops a humped spiral antenna of top inductively coupled plasma with variable gap. Comparing with planar spiral antennae, it investigates the performance of humped spiral antennae in the calculated electromagnetic configurations and experimental results. It finds that the humped antenna has the improved uniformity of plasma density in the radial direction and the decreased electron temperature in the top inductively coupled plasma. By experimental and theoretical analyses, the plasma performance in the case of humped antennae is considered to be the combined results of the uniform electromagnetic configurations and the depressed capacitively coupling effect.     

Theoretical Computation for Non-Equilibrium Air Plasma Electrical Conductivity at Atmospheric Pressure

Based on the Chapman-Enskog theory, we calculate the electrical conductivity of non-equilibrium air plasma in the two-temperature model. We consider different degrees of non-equilibrium, which is defined by the ratio of electronic temperature to heavy particles temperature. The method of computing the composition of air plasma is demonstrated. After calculating the electrical conductivity from electron temperature 1000 K to 15000K, the present result is compared with Murphy＇s study [Plasma Chem. Plasma Process 15 （1994） 279] for equilibrium case. All the calculation is completed at atmospheric pressure. The present results may have potential applications in numerical calculation of non-equilibrium air plasma.     

Large area planar plasma sustained by surface microwave

In this paper, we show theoretically and experimentally that the large-area planar plasma with high density and good uniformity can be sustained by a surface microwave when the electron density is over-dense. From the experimental results we find that the nonuniformities in azimuthal plasma density and electron temperature have been greatly improved and in particular the nonuniformity is less than 10{\%} when the gas pressure is 30 Pa. By improving the antenna shape, enhancing the microwave power and choosing the appropriate gas pressure, the large area planar plasma with high density can be produced.     

HT-7U第一壁材料在HT-7装置中的辐照实验研究

把为HT-7U装置开发的系列碳基面对等离子体材料及其比对样品安装在样品架上，通过磁力传送机构送入HT-7装置刮削层中进行辐照实验研究。经过若干次等离子体放电实验后，取出样品进行表面形貌。表面元素成分及深度分布的X射线光电子能谱分析。结果发展，碳石墨材料的渗杂改性和抗等离子体溅射腐蚀的B4C/SiC梯度功能涂层可以有效地提高其抗待了子体轰击的能力。     

O2掺杂对SiCOH低k薄膜结构与电学性能的影响

以十甲基环五硅氧烷(D5)和氧气(O₂)作为反应气体，采用电子回旋共振等离子体化学气相沉积(ECR-CVD)方法制备了k＝2.62的SiCOH薄膜.研究了O₂掺杂对薄膜结构与电学性能的影响.结果表明，采用O₂掺杂可以在保持较低介电常数的前提下极大地降低薄膜的漏电流，提高薄膜的绝缘性能，这与薄膜中Si-O立体鼠笼、Si-OH结构含量的提高有关. 关键词： SiCOH薄膜 2掺杂')" href="#">O₂掺杂 介电性能 键结构     

Large Volume and High Density Surface Wave Plasmas Sustained by Two Microwave Launchers

Surface wave plasma （SWP） is an electromagnetic excitation along the planar interface between a dielectric and plasma medium when plasma density is so large that its permittivity becomes negative. An experiment SWP system consisting of two microwave launchers （upper and side microwave launcher） has been developed for producing large volume surface wave plasmas in our laboratory. The experimental investigation shows that comparable uniformity plasma with not only large volume but also high density properties has been obtained by the two launchers.     

ECR-PECVD制备SiO2薄膜中衬底射频偏压的作用

采用微波电子回旋共振等离子体增强化学气相沉积（ECR－PECVD）技术在单晶衬底上制备了SiO2薄膜,研究了射频偏压对薄膜特性的影响。通过X射线光电子能谱（XPS）、傅里叶变换红外线光谱（FTIR）、原子力显镜（AFM）和扫描隧道显微镜（STM）三维形貌图测量等手段,对成膜特性进行了分析。实验结果表明,通过改变射频偏压的参数来控制离子轰击能量,对ECR－PECVD成膜的内应力、溅射现象、微观结构和化学计量均有明显的影响。     

气体对介质阻挡放电激发XeCl*辐射的影响

在气体配比和气压易控制的小尺寸气体混合腔中．通过对混合气体Cl2／Xe进行参量(配比、气压)范围调节．研究了不同气体配比、气压下介质阻挡放电激发准分子XeCl*的辐射特性。结果表明．在一定放电功率下．合适的气体配比和气压能产生峰值辐射。对于放电管在气体比例pc12／p1在I．5％-4％范围内，放电形貌及准分子XeCl*辐射的强度和光谱特征表现出明显的差异。同比条件下．混合气体He／Cl2／Xe中放电产生的准分子辐射强度弱于混合气体Cl2／Xc。