High sensitivity Hall devices with AlSb/InAs quantum well structures

AlSb/InAs quantum well (QW) structures and InAs films on GaAs (001) substrates were grown by molecular beam epitaxy (MBE). We investigated the dependence of electron mobility and two-dimensional electron gas (2DEG) concentration on the thickness of an InAs channel. It is found that electron mobility as high as 19050 cm2·V-1·s-1 has been achieved for an InAs channel of 22.5 nm. The Hall devices with high sensitivity and good temperature stability were fabricated based on the AlSb/InAs QW structures. Their sensitivity is markedly superior to Hall devices of InAs films.     

有机电致发光器件的瞬态电响应特性

详细研究了有机发光二极管(OLED)在脉冲电压下的瞬态电流响应特性.瞬态响应电流由3部分组成:正向电流峰(IP)、稳态电流(IS)及反向电流峰(IN).研究发现IS为器件工作时通过器件的电流,而IN与IP则分别对应OLED器件电极/有机界面附近的空间电荷的形成及消失过程.IN、IP与脉冲电压成线性关系,阳极的费米能级与空穴传输材料的HOMO能级差导致IN大于IP.利用不同占空比的双脉冲电压研究了电流与空间电荷的关系,发现空间电荷的充分放电临界占空比只受界面接触的影响,而与器件内部结构无关.     

利用变温瞬态电致发光研究OLED载流子的输运机理

研究了不同温度下几种结构的有机电致发光器件(OLED)的瞬态电致发光响应特性以及电流密度-电压-亮度特性。研究发现,启亮电压随温度升高而减小的加速度在200 K时出现拐点,且这一数值主要由电子传输层Alq3的迁移率决定。当温度为200 K时,延迟时间td最重要的影响因素是Mo O3空穴注入势垒,随着温度的升高,Δtd逐渐减小,到300 K时基本消失。Vf代表光衰减时间随温度增长的平均速率。Mo O3注入层和电致发光材料Ir(ppy)3都会对载流子的堆积起促进作用。由Mo O3注入层不同引起的ΔVf是0.52μs/K,由电致发光材料Ir(ppy)3不同引起的ΔVf是0.73μs/K。