AlO_x/LiF composite protection layer for Cr-doped(Bi,Sb)_2Te_3 quantum anomalous Hall films

We have realized robust quantum anomalous Hall samples by protecting Cr-doped(Bi,Sb)_2Te_3 topological insulator films with a combination of LiF and A1O_x capping layers.The AlO_x/LiF composite capping layer well keeps the quantum anomalous Hall states of Cr-doped(Bi,Sb)_2Te_3 films and effectively prevent them from degradation induced by ambient conditions.The progress is a key step towards the realization of the quantum phenomena in heterostructures and devices based on quantum anomalous Hall system.     

在预刻蚀的衬底上通过分子束外延直接生长出拓扑绝缘体薄膜的微器件

在利用光刻将拓扑绝缘体外延薄膜加工成微米尺寸结构的过程中,所用的各种化学物质会导致薄膜质量的下降.在实验中,通过在钛酸锶衬底上预先光刻出Hall bar形状的凸平台并以此为模板进行拓扑绝缘体(Bi x Sb1-x)2Te3薄膜的分子束外延生长,直接获得了薄膜的Hall bar微器件,从而避免了光刻过程对材料质量的影响.原子力显微镜和输运测量结果均显示该微器件保持了(Bi x Sb1-x)2Te3外延薄膜原有的性质.这种新的微器件制备方法有助于在拓扑绝缘体中实现各种新奇的量子效应,并可推广于其他外延生长的低维系统.