全局优化问题的一个新的无参数填充函数

求全局最优化问题的填充函数算法被提出以来，参数的选取和调整一直是制约算法有效性的因素。如何在实际的计算过程中选取合适的参数，直接影响和决定了运算速度和效率。因此，构造不含参数的填充函数就显得极为重要。提出一个新的无参数的填充函数，对其理论性质进行了分析，并给出相应的填充函数算法，数值计算验证了算法的有效性。     

Spatiotemporal dynamics induced by nonlocal competition in a diffusive predator-prey system with habitat complexity

Nonlinear Dynamics - In this paper, we study a delayed diffusive predator–prey model with nonlocal competition in prey and habitat complexity. The local stability of coexisting equilibrium is...     

Static Charge Susceptibility in the <Emphasis Type="Italic">t-J-V</Emphasis> Model

We describe the static charge susceptibility and correlation function of the charge density in the twodimensional t-J-V model based on the method of equations of motion for the relaxation functions of the Hubbard operators. We obtain the dependence of the susceptibility and correlation function on the hole concentration and temperature. Charge density waves can develop if the intersite Coulomb interaction is sufficiently strong.     

An Inexact Modified Newton Method for Viscc and Application in Grasping Force

Acta Mathematicae Applicatae Sinica, English Series - For the variational inequality with symmetric cone constraints problem, we consider using the inexact modified Newton method to efficiently...     

Improving the gas barrier,mechanical and thermal properties of poly(vinyl alcohol) with molybdenum disulfide nanosheets

New multifunctional materials with both high structural and gas barrier performances are important for a range of applications. Herein we present a one‐step mechanochemical process to prepare molybdenum disulfide (MoS₂) nanosheets with hydroxy functional groups that can simultaneously improve mechanical strength, thermal conductivity, and gas permittivity of a polymer composite. By homogeneously incorporating these functionalized MoS₂ nanosheets at low loading of less than 1 vol %, a poly(vinyl alcohol) (PVA) polymer exhibits elongation at break of 154%, toughness of 82 MJ/m³, and in‐plane thermal conductivity of 2.31 W/m K. Furthermore, this composite exhibits significant gas barrier performance, reducing the permeability of helium by 95%. Under fire condition, the MoS₂ nanosheets form thermally stable char, thus enhancing the material's resistance to fire. Hydrogen bonding has been identified as the main interaction mechanism between the nanofillers and the polymer matrix. The present results suggest that the PVA composite reinforced with 2D layered nanomaterial offers great potentials in packaging and fire retardant applications. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2019 , 57, 406–414     

恒定非均匀磁场调控下的强制对流传热数值研究

分别对雷诺数、磁场强度和磁纳米流体浓度进行了讨论，并将数字高程模型(DEM)应用到梯度磁场模型的建立，分析了磁场梯度大小和方向对传热效果的影响。结果表明：雷诺数、磁场强度和梯度与传热效果呈正相关，在磁场介入的情况下，磁纳米流体浓度对传热效果的影响存在一个最佳值；磁场梯度方向垂直于流动方向时对传热的强化效果最显著。以平均努塞尔数和压降为目标参数，利用正交试验设计的方法研究了各变量对传热效果影响的权重大小，得到各变量取值范围内的最佳组合。     

Directing-Group-Free C7-Alkylations of N-Alkylindoles Mediated by Cationic Zirconium Complexes: Role of Brønsted Acid for Catalytic Manifold

Highly position selective alkylations of N-alkylindoles at C7-positions have been enabled by cationic zirconium complexes. The strategy provides a straightforward access to install alkyl groups at C7-positions of indoles without a complex directing group. Mechanistic studies provided support for the importance of Brønsted acids in the catalytic manifold.     

熔盐法合成钛酸锂钾片晶及形貌控制

在碳酸钾、碳酸锂和二氧化钛的混合原料中加入熔盐氯化钾,通过高温煅烧一步制备出钛酸锂钾片晶( K0.8 Li0.27Ti1.73O4, KLTO).通过控制熔盐的添加方式以及煅烧工艺(升温速率、煅烧时间)使材料的形貌朝着二维方向生长,并利用XRD和SEM等手段进行表征.分析发现:过快的升温速率或者较短的煅烧时间都会使材料朝三维方向生长成球状或者块状,反之则会使材料趋向一维方向生长成棒状;同时在煅烧温度达到一定值时再加入熔盐则更有利于片晶的生成.最终得到KLTO片状形貌的最佳控制工艺为:先以300 ℃/h升温至800 ℃后,再加入质量分数为40;的KCl熔盐,接着将升温速率变为200 ℃/h,加热至950 ℃,并在此温度下煅烧3 h.     

Towards Fabrication of Atomic Dopant Wires via Monolayer Doping Patterned by Resist-Free Lithography

Fabrication of atomic dopant wires at large scale is challenging.We explored the feasibility to fabricate atomic dopant wires by nano-patterning self-assembled dopant carrying molecular monolayers via a resist-free lithographic approach.The resist-free lithography is to use electron beam exposure to decompose hydrocarbon contaminants in vacuum chamber into amorphous carbon that serves as an etching mask for nanopatterning the phosphorus-bearing monolayers.Dopant wires were fabricated in silicon by patterning diethyl vinylphosphonate monolayers into lines with a width ranging from 1 μm down to 8 nm.The dopants were subsequently driven into silicon to form dopant wires by rapid thermal annealing.Electrical measurements show a linear correlation between wire width and conductance,indicating the success of the monolayer patterning process at nanoscale.The dopant wires can be potentially scaled down to atomic scale if the dopant thermal diffusion can be mitigated.     

Strategies in boosting photosensitization for biomedical applications

Science China Chemistry -