碳化硅陶瓷密封材料上沉积复合金刚石薄膜

利用直流辉光等离子体化学气相沉积(DC-GD CVD)设备在碳化硅(SiC)密封材料上沉积复合金刚石薄膜(ICD).实验通过两步工艺,先在SiC上沉积一层微米金刚石薄膜(MCD),然后再沉积一层纳米金刚石薄膜(NCD)形成复合金刚石薄膜(ICD).通过场发射扫面电镜和拉曼测试,研究了MCD、NCD和ICD薄膜的表面形貌和材料结构.各种金刚石薄膜利用轮廓仪、划痕测试和摩擦磨损测试其力学性能.结果显示ICD薄膜既有较强的结合力,其摩擦系数也较低.ICD薄膜涂层的SiC密封环的摩擦系数为0.08 ～0.1.     

Dynamics of Ring-to-Volume Discharge Transition in H Mode in Inductively Coupled Plasma Torches at Atmospheric Pressure

The transition process in ring-to-volume discharge in H mode in inductively coupled plasma torches at atmospheric pressure is investigated by analyzing the time resolved image taken by a high speed camera. The effects of input power, plasma working gas flow rate, and its composition on the transition dynamics are also discussed.The results show that the discharge plasma has experienced ring discharge, and the development stage diffused from the boundary to the center in the confinement tube, and steady volume discharge after entering the H mode. Increasing input power, sheath gas flow rate and hydrogen contents in plasma working gas are all able to lessen the time consumed in the transition process in ring-to-volume discharge.