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1.
表面包覆改性对纳米CeO2分散性的影响 总被引:1,自引:0,他引:1
了改善纳米CeO2在Zn-Al类共晶合金中的分散性,采用超声液相包覆法对纳米CeO2进行表面活性剂表面包覆改性,并用AES测定了包覆层的厚度,用TEM研究了CeO2的团聚状况,用TGA分析了有机物包覆层的炭化温度范围,最后用FE-SEM观察了CeO2在复合材料中的分散情况。结果表明,包覆在纳米CeO2表面的厚度约为20 nm的表面活性剂层提高了微粒的分散性,而且该包覆层在495℃时已经炭化。热力学计算的结果也表明,炭化层能与氧化膜反应,该反应提高了CeO2与基体间的润湿性,并使其均匀分布在基体合金中。 相似文献
2.
In this paper, the magnetization reversal of the ferromagnetic
layers in the IrMn/CoFe/AlOx/CoFe magnetic tunnel junction has
been investigated using bulk magnetometry. The films exhibit very
complex magnetization processes and reversal mechanism. Thermal
activation phenomena such as the training effect, the asymmetry of
reversal, the loop broadening and the decrease of exchange field
while holding the film at negative saturation have been observed on
the hysteresis loops of the pinned ferromagnetic layer while not on
those of the free ferromagnetic layer. The thermal activation
phenomena observed can be explained by the model of two energy
barrier distributions with different time constants. 相似文献
3.
Influence of Ga+ ion irradiation on thermal relaxation of exchange bias field in exchange-coupled CoFe/IrMn bilayers 下载免费PDF全文
This paper reports that the CoFe/IrMn bilayers are deposited by magnetron sputtering on the surfaces of thermallyoxidized Si substrates.It investigates the thermal relaxations of both non-irradiated and Ga + ion irradiated CoFe/IrMn bilayers by means of holding the bilayers in a negative saturation field.The results show that exchange bias field decreases with the increase of holding time period for both non-irradiated and Ga + ion irradiated CoFe/IrMn bilayers.Exchange bias field is also found to be smaller upon irradiation at higher ion dose.This reduction of exchange bias field is attributed to the change of energy barrier induced by ion-radiation. 相似文献
4.
This paper reports that a CoFe/IrMn bilayer was deposited by high vacuum magnetron sputtering on silicon wafer
substrate; the thermal relaxation of the CoFe/IrMn bilayer is investigated by means of holding the film in a negative saturation field at various temperatures. The exchange bias decreases with increasing period of time while holding the film in a negative saturation field at a given temperature. Increasing the temperature accelerates the decrease of exchange field. The results can be explained by the quantitative model of the nucleation and growth of antiferromagnetic domains suggested by Xi H W et al. [2007 Phys. Rev. B 75 014434], and it is believed that two energy barriers exist in the
investigated temperature range. 相似文献
5.
微波固相合成氧化锌纳米棒 总被引:4,自引:0,他引:4
通过前驱体的微波固相热分解法快速合成了氧化锌纳米棒, 其直径在60~385 nm之间, 长可达数微米. 前驱体则通过一步室温固相反应制备. 用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、能量色散X射线分析(EDX)和透射电子显微镜(TEM)对产物的结构和形貌进行了表征. 同时, 对氧化锌纳米棒的光致发光(PL)性能作了测试, 结果表明在355 nm处有一个明显的近带隙发射峰. 另外, 对比实验表明, 微波辐射在氧化锌纳米棒的形成过程中起了关键性作用, 并对其形成机理进行了初步探讨. 相似文献
6.
ZnS纳米粒子的固相合成及其光学性能 总被引:1,自引:0,他引:1
将不同的添加剂引入到低温固相反应中,快速合成了不同尺寸的ZnS纳米粒子。利用TEM表征了产物形貌,利用XRD研究了不同的添加剂、同一添加剂下不同的反应温度、不同反应时间对纳米粒子尺寸的影响。结果表明,不同的添加剂对粒子的尺寸影响较大,其中,十二烷基胺以其特殊的反应方式在较高温度下获得了较小的纳米粒子。另外,在PEG400存在条件下,反应温度和反应时间对粒子尺寸均有一定的影响。同时,对不同条件下所得产物的紫外-可见光吸收性能也进行了测试。 相似文献
7.
Influence of Ga+ ion irradiation on the magnetisation reversal process and magnetoresistance in CoFe/Cu/CoFe/IrMn spin valves 下载免费PDF全文
Ga+ion irradiation is performed on the surfaces of IrMn-based spin valves and the effects of ion irradiation on the magnetisation reversal process and magnetoresistance(MR) are investigated.The results show that the exchange bias field and magnetoresistance ratio of the spin valve decrease with the increase of ion dose.The width of the forward step between the free layer and the pinned layer becomes gradually smaller with the increase of ion dose whilst the recoil step tends to be narrower with ion dose increasing up to 6×10 13 ions/cm 2 and the step disappears afterwards.Two peaks in the R-H curve are found to be asymmetric. 相似文献
8.
过渡金属硫化物因能带结构与层数具有明显的依赖关系而受到广泛关注,尤其是二维二硫化钼(MoS2)薄膜因其优良的光电性能而成为研究热点。目前,化学气相沉积法(CVD)和剥离法已成为制备MoS2薄膜的主要方法,但这两种方法均存在难以精确控制MoS2层数的问题,研究证实通过刻蚀手段能够对MoS2薄膜层数进行进一步加工,从而得到单层或特定层数的样品。本文综述了基于不同刻蚀原理的MoS2薄膜刻蚀技术的国内外研究进展,分析讨论了不同刻蚀技术对刻蚀后MoS2薄膜质量的影响,介绍了MoS2刻蚀方法在场效应晶体管(FET)以及其他光电器件领域的实际应用和发展前景,最后对将来研究中需要着力解决的问题进行了展望。 相似文献
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