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Wang Tzyy-Jiann Tsou Yueh-Hsun Chang Wen-Che Niu Huan 《Applied Physics A: Materials Science & Processing》2011,102(2):463-467
We present a new fabrication technique to produce three-dimensional (3D) microstructures on crystalline substrate using selective
ion implantation and chemical etching. Localized lattice-damage layers at the specified depth beneath the substrate surface
are formed by selective ion implantation. After etching out the partial surface regions and the buried lattice-damage layers
by chemical etching, the 3D crystalline microstructures are produced. This technique is demonstrated on LiNbO3 crystal to produce undercutting and free-standing microstructures, including microwire, microring, and microdisk. The measurement
results of micro-Raman spectra show that the used fabrication process does not affect the original crystalline structure.
The features of this technique include smooth structure surface, large undercutting range, and auto-etching stop. By using
multiple implantations or repeating the proposed process several times, versatile 3D crystalline microstructures can be produced. 相似文献
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