Fabrication of three-dimensional crystalline microstructures by selective ion implantation and chemical etching |
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Authors: | Wang Tzyy-Jiann Tsou Yueh-Hsun Chang Wen-Che Niu Huan |
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Institution: | 1.Institute of Electro-Optical Engineering, National Taipei University of Technology, No. 1, Sec. 3, Chung-Hsiao E. Road, 10608, Taipei, Taiwan, ROC ;2.Nuclear Science and Technology Development Center, National Tsing Hua University, No. 101, Sec. 2, Kuang-Fu Road, 30013, Hsinchu, Taiwan, ROC ; |
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Abstract: | We present a new fabrication technique to produce three-dimensional (3D) microstructures on crystalline substrate using selective
ion implantation and chemical etching. Localized lattice-damage layers at the specified depth beneath the substrate surface
are formed by selective ion implantation. After etching out the partial surface regions and the buried lattice-damage layers
by chemical etching, the 3D crystalline microstructures are produced. This technique is demonstrated on LiNbO3 crystal to produce undercutting and free-standing microstructures, including microwire, microring, and microdisk. The measurement
results of micro-Raman spectra show that the used fabrication process does not affect the original crystalline structure.
The features of this technique include smooth structure surface, large undercutting range, and auto-etching stop. By using
multiple implantations or repeating the proposed process several times, versatile 3D crystalline microstructures can be produced. |
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