Temporal response of laminated graded-bandgap GaAs-based photocathode with distributed Bragg reflection structure: Model and simulation

To describe the dynamic response characteristics of the laminated graded-bandgap GaAs-based photocathode with distributed Bragg reflection structure, a general theoretical temporal response model is deduced by combining the unsteady continuity equation and numerical calculation method. Through the model, the contribution of the distribution Bragg reflection structure and graded-bandgap emission layer to the temporal response are investigated. Meanwhile, the relationships between the temporal response characteristics of the laminated GaAs-based photocathode and different structural parameters are also analyzed, including average electron decay time, emission layer thickness, and incident light wavelength. It is found that the introduction of distribution Bragg reflection (DBR) layer solves the discrepancy between the absorption capability of the emission layer and the temporal response. Moreover, the distributed Bragg reflection layer can improve the time response by optimizing the initial photoelectron distribution. The improvement effect of the DBR layer on the temporal response is enhanced with the emission layer thickness decreasing or the incident light wavelength increasing. These results explain the effect of the DBR layer of the photocathode on the dynamic characteristics, which can offer a new insight into the dynamic research of GaAs-based photocathode.     

InGaAs光电阴极制备工艺中的原位光电子能谱

为了探索InGaAs光电阴极高温净化工艺的最佳加热温度点,利用超高真空光电阴极制备与表征互联装置开展了不同加热温度点下的高温净化实验和表面铯/氧(Cs/O)激活实验。通过扫描聚焦X射线光电子能谱对化学清洗后、高温净化后以及表面激活后的InGaAs样品表面进行原位分析,检测不同温度点下表面杂质的脱附程度和化学元素组成变化。结果表明,样品表面的碳污染物和氧化物在625℃时都被完全去除,获得原子级清洁表面,但此时In元素会出现挥发现象,导致材料表面In含量降低,会使InGaAs材料的红外响应特性不明显,因此600℃被认为是最佳加热温度。结合原位紫外光电子能谱发现二次电子截止边随着温度的升高不断向高结合能的位置偏移,这表明高温净化能有效降低表面功函数值,而Cs/O激活能进一步降低表面功函数值,获得负电子亲和势,提高InGaAs光电阴极的近红外光电发射性能。