厚胶接近式光刻中掩模优化研究（英）

随着光刻胶厚度的不断增大,制作的光刻图形畸变愈发严重,这极大的影响了微结构器件的性能与应用。针对高深宽比柱状微结构在光刻胶厚度方向上畸变的特点,提出了双面曝光和亮衬线、灰阶掩模相结合的办法,利用遗传算法对失真影响最大的区域进行搜索,光刻胶内部各层的衍射光场分布作为评价函数,对光刻过程引起的畸变进行优化。仿真结果显示,优化后光刻胶各层面型质量得到极大的改善,特征尺寸和边墙角等参数与理论值吻合得更好。优化算法具有很好的灵活性,因此在用于更厚光刻胶、更复杂掩模图形的优化上,具有重要的指导意义。     

Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation

A systematic interpretation of laser-induced damage in the nanosecond regime is realized with a defect distribution buried inside the redeposited layer arising from a polishing process. Under the 355-nm laser irradiation, the size dependence of the defect embedded in the fused silica can be illustrated through the thermal conduction model. Considering CeO_2 as the major initiator, the size distribution with the power law model is determined from the damage probability statistics. To verify the accuracy of the size distribution, the ion output scaling with depth for the inclusion element is obtained with the secondary ion mass spectrometer. For CeO_2 particulates in size of the depth interval with ion output satisfied in the negative exponential form, the corresponding density is consistent with that of the identical size in the calculated size distribution. This coincidence implies an alternative method for the density analysis of photoactive imperfections within optical components at the semi-quantitative level based on the laser damage tests.     

不同脉冲宽度355 nm波长激光诱导DKDP晶体损伤特性

研究了用于三倍混频的Ⅱ类DKDP晶体在35 ps,850 ps和7.6 ns三种不同脉宽355 nm波长激光作用下的损伤特性。实验对比分析了损伤阈值、概率和损伤针点形貌、尺寸和密度,并根据损伤阈值及概率得到前驱体阈值及密度。结果表明,前驱体的激光能量吸收量与脉宽线性相关。35 ps激光作用下DKDP有一种前驱体吸收激光能量形成熔融状损伤针点。850 ps激光作用下有两种前驱体吸收激光能量并产生力学破坏形成中心熔融四周断裂的损伤针点。7.6 ns激光作用下只有一种前驱体吸收激光能量,并且形成的损伤针点与850 ps对应的损伤针点有相同特征。     

Absorption modification by laser irradiation in DKDP crystals

Laser-induced modification at 355 nm of deuterated potassium dihydrogen phosphate(DKDP) crystals following exposure to nanosecond(ns) and sub-ns laser irradiation is investigated in order to probe the absorption mechanism in damage initiation. Laser damage resistance is greatly improved by sub-ns laser conditioning,whereas only a little improvement occurred after ns laser conditioning at the same laser fluence. Moreover, scattering and transmittance variations after the two types of laser conditioning indicate similar reduction of linear absorption. However, by contrast, large differences on nonlinear absorption modification are discovered using Z-scan measurement. This characteristic absorption modification by laser irradiation provides evidence that a nonlinear absorption mechanism plays a key role in damage initiation at 355 nm.