Ln2Sn2O7：Er3+纳米晶的制备及发光性能研究

采用溶胶-凝胶法合成Ln₂Sn₂O₇:Er³⁺(Ln=La,Gd,Y)纳米晶。通过X射线衍射和场发射扫描电子显微镜测试了样品的晶体结构和形貌,同时对样品的上转换发光性能进行了测试。结果表明:在980 nm连续激发光的激发下,样品主要表现为绿光发射。发射中心在528,549 nm的绿光和672 nm处的红光发射分别对应Er³⁺离子的⁴S_3/2→⁴I_15/2、²H_11/2→⁴I_15/2和 ⁴F_9/2→⁴I_15/2跃迁。以La₂Sn₂O₇:Er³⁺纳米晶为例,Er³⁺离子的摩尔分数为7%、退火温度为1 150℃是其制备的最佳条件,此时其各个发射峰的强度最高。对La₂Sn₂O₇:Er³⁺的发光强度与激发功率关系的研究表明,其绿光和红光发射均为双光子过程。激发光吸收和能量转移是La₂Sn₂O₇:Er³⁺纳米晶上转换发光的主要机制。     

沟道层厚度对室温制备的In2O3薄膜晶体管器件性能的影响

在室温下采用直流磁控溅射以SiO₂/Si为衬底制备了不同沟道层厚度的底栅式In₂O₃薄膜晶体管,讨论了沟道层厚度对底栅In₂O₃薄膜晶体管的电学性能的影响。实验结果表明:器件的特性与沟道层厚度有关,最优沟道层厚度的In₂O₃薄膜晶体管为增强型,其阈值电压为2.5 V,开关电流比约为10⁶,场效应迁移率为6.2 cm²·V^-1·s^-1。     

Homogeneous interface-type resistance switching in Au/La0.67Ca0.33MnO3/SrTiO3/F:SnO2 heterojunction memories

La0.67Ca0.33MnO3 thin films are fabricated on fluorine-doped tin oxide conducting glass substrates by a pulsed laser deposition technique with SrTiO3 used as a buffer layer. The current-voltage characteristics of the heterojunetions exhibit an asymmetric and resistance switching behaviour. A homogeneous interface-type conduction mechanism is also reported using impedance spectroscopy. The spatial homogeneity of the charge carrier distribution leads to field- induced potential-barrier change at the Au-La0.67Ca0.33MnO3 interface and a concomitant resistance switching effect. The ratio of the high resistance state to the low resistance state is found to be as high as 1.3 x 10^4% by simulating the AC electric field. This colossal resistance switching effect will greatly improve the signal-to-noise ratio in nonvolatile memory applications.     

Er3+和Yb3+共掺杂La2Ti2O7纳米晶的上转换发光

采用溶胶-凝胶法制备了 Er3+单掺杂A2 Ti2O7(A=La,Y,Gd)和Er3+,Yb3+共掺杂的La2 Ti2O7纳米晶样品.用X射线衍射仪、扫描电子显微镜和紫外-可见-近红外光谱仪分别对样品的结构、形貌和光吸收性质进行了表征;测试了样品在980 nm激光激发下的室温上转换光谱.结果发现,样品都发出了很强的绿光(大约在525和549 nm)和红光(大约660 nm).通过研究这些基质的晶体结构对上转换发光的影响,发现La2 Ti2O7基质中Er3+离子的上转换发射最强.对La2 Ti2O7纳米晶的上转换发光研究表明,Yb3离子能够有效地敏化Er3离子的上转换发射.对上转换发光强度与泵浦功率的依赖分析,发现红光和绿光的发射均属于双光子吸收过程,最后讨论了Er3+和Yb3的上转换发光机制.     

氧氩比对SnO2/Ag/SnO2透明导电膜光电性能的影响

在室温及不同的氧氩比条件下,采用射频磁控溅射Ag层和直流磁控溅射SnO2层,在载玻片衬底上制备出了SnO2/Ag/SnO2多层薄膜.用霍尔效应测试仪、四探针电阻测试仪和紫外-可见-近红外光谱仪等表征了薄膜的电学性质和光学性质.实验结果表明:当氧氩比为1:14时,所制得的薄膜的光电性质优良指数最大,为1.69×10-2 Ω-1;此时,薄膜的电阻率为9.8×10-5Ω·cm,方电阻为9.68Ω/sq,在400～800 nm可见光区的平均光学透射率达85％;并且,在氧氩比为1:14时,利用射频磁控溅射Ag层和直流磁控溅射SnO2层在PET柔性衬底上制备出了光电性质优良的柔性透明导电膜,其在可见光区的平均光学透过率达85％以上,电阻率为1.22×10-4Ωcm,方电阻为12.05Ω/sq.     

Optical study of Ba(Mn_xTi_(1-x)O_3) thin films by spectroscopic ellipsometry

Stoichiometric Ba(Mn_xTi_(1-x)O_3) (BMT)thin films with various values of x were deposited on Si(111)substrates by the sol-gel technique.The influence of Mn content on the optical properties was studied by spectroscopic ellipsometry(SE)in the UV–Vis–NIR region.By fitting the measured ellipsometric parameter(Ψand)with a four-phase model(air/BMT+voids/BMT/Si(111)),the key optical constants of the thin films have been obtained.It was found that the refractive index n and the extinction coefficient k increase with increasing Mn content due to the increase in the packing density.Furthermore,a strong dependence of the optical band gap Egon Mn/Ti ratios in the deposited films was observed,and it was inferred that the energy level of conduction bands decreases with increasing Mn content.     

Homogeneous interface-type resistance switching in Au/La_0.67Ca_0.33MnO₃/SrTiO₃/F:SnO₂ heterojunction memories

La0.67Ca0.33MnO3 thin films are fabricated on fluorine-doped tin oxide conducting glass substrates by a pulsed laser deposition technique with SrTiO3 used as a buffer layer. The current-voltage characteristics of the heterojunctions exhibit an asymmetric and resistance switching behaviour. A homogeneous interface-type conduction mechanism is also reported using impedance spectroscopy. The spatial homogeneity of the charge carrier distribution leads to field- induced potential-barrier change at the Au-La0.67Ca0.33MnO3 interface and a concomitant resistance switching effect. The ratio of the high resistance state to the low resistance state is found to be as high as 1.3 × 10 4 % by simulating the AC electric field. This colossal resistance switching effect will greatly improve the signal-to-noise ratio in nonvolatile memory applications.     

Na+离子掺杂Gd2O3 ∶ Sm3+纳米晶的发光增强

采用柠檬酸作燃烧剂,在柠檬酸-硝酸盐体系下制备了Gd₂O₃ ∶ Sm³⁺和Gd₂O₃ ∶ Sm³⁺,Na⁺纳米晶。用X射线衍射仪、透射电子显微镜、荧光光谱仪等对样品的结构、形貌和光致发光性能进行了分析。结果表明:所得纳米样品为纯立方相,晶粒尺寸约为30 nm。在室温下,用275 nm激发光激发各样品时,可观测到Sm³⁺离子 的较强发光,其主发射峰位分别位于561.5,603.5,651.5 nm,分别对应着Sm³⁺离子的⁴G_5/2→⁶H_5/2 , ⁴G_5/2→ ⁶H_7/2 和⁴G_5/2 →⁶H_9/2的电子跃迁, 其中以⁴G_5/2→⁶H_7/2 跃迁的光谱强度最强。实验表明:Na⁺离子的掺入使得Sm³⁺离子的光发射强度显著增强。对引起样品荧光强度变化的原因进行了分析。     

ZnFe2O4的固相法和水热法制备及其电化学性能研究

本文用固相反应法和水热法制备了ZnFe₂O₄材料,X射线衍射(X-ray diffraction, XRD)表明制备出来的ZnFe₂O₄为尖晶石结构,表面形貌测试 (scanning electron microscopy, SEM) 显示两种方法制备的材料的平均粒径分别为500 nm和200 nm.比表面积测试结果表明,两种方法制备的样品的比表面积分别为136.7 m² g^{-1关键词： 2O₄')" href="#">ZnFe₂O₄ 尖晶石结构 电化学性能 锂离子电池}     

氧氩比对SnO2/Ag/SnO2透明导电膜光电性能的影响

在室温及不同的氧氩比条件下,采用射频磁控溅射Ag层和直流磁控溅射SnO₂层,在载玻片衬底上制备出了SnO₂/Ag/SnO₂多层薄膜.用霍尔效应测试仪、四探针电阻测试仪和紫外-可见-近红外光谱仪等表征了薄膜的电学性质和光学性质.实验结果表明:当氧氩比为1:14时,所制得的薄膜的光电性质优良指数最大,为1.69×10^-2 Ω^-1;此时,薄膜的电阻率为9.8×10^-5 Ω·cm,方电阻为9.68 Ω/sq,在400~800 nm可见光区的平均光学透射率达85%;并且,在氧氩比为1:14时,利用射频磁控溅射Ag层和直流磁控溅射SnO₂层在PET柔性衬底上制备出了光电性质优良的柔性透明导电膜,其在可见光区的平均光学透过率达85%以上,电阻率为1.22×10^-4 Ωcm,方电阻为12.05 Ω/sq.