Gemini阳离子表面活性剂在水溶液中胶团化行为的温度效 应与焓、熵补偿

测定了Cemini阳离子表面活性剂C~m-----s-----C~m·2Br(m=8,10,12,;s=2,6及m=12;s=3,4)水溶液的电导,从电导(k)～表面活性剂浓度(c)曲线的转折点可求得临界胶团浓度cmc.实验发现,Gemini阳离子表面活性剂的胶团化倾向明显强于其“单体分子”)即单离子头基单烷烃链表面活性剂)。根据质量作用模型计算了胶经过程的吉布氏能、焓和熵的改变。结果表明Gemini表面活性剂聚集机理和其对应的“单体分子”类似,主要来自熵驱动。所有的焓/熵补偿图均呈现良好的线性关系,补偿直线在γ轴的截距随s减小而变小,这意味着具有较小s的Gemini表面活性剂倾向于生成稳定的胶团。     

Gemini阳离子表面活性剂的合成及其胶束生成

传统的单头基单烷烃链表面活性剂由于离子头基间的电荷斥力或水化引起的分离倾向使得它们在界面或分子聚集体中难以紧密排列,造成表面活性偏低 .为克服这一缺陷进行了大量尝试,例如添加无机电解质屏蔽离子头基的电荷斥力、升高温度以降低头基的水化,甚至采用合适的二元表面活性剂复配等等 .当前一种从根本上克服头基间分离倾向的化学方法正受到关注 [1],这种方法通过化学键将二个单头基单烷烃链表面活性剂在离子头基处用联接基团（ spacer）使其联接起来,从而获得称之为 Gemini的新型表面活性剂 [2]. Gemini表面活性剂大大促进了其 "…     

Gemini阳离子表面活性剂的合成及其胶束生成 Gemini阳离子表面活性剂的合成及其胶束生成

Cationic Gemini surfactants, alkanediyl-α,ω-bis(dimethyldodecylammonium bromide) have been synthesized by the following method: firstly dodecyl bromide was prepared by the reaction of dodecanol with bromic acid in the presence of strong sulfuric acid. Dodecylbromide was then reacted with N,N-tetramethyl ethane diamine(or N,N-tetramethyl hexana diamine) to prepare the title-compounds. Micellization of these Gemini surfactants was investigated using conductivity measurement. The results showed that the critical micelle concentration(cmc) of the Gemini surfactants has a much lower value compared with that of the corresponding “ monomer” . For a series of the Geminis with the same length(s) in the spacer chain, the cmc decreased with increasing the carbon number (m) in the alkyl chain. The aggregation number(N) of the micelle also drastically decreased with m. For the same value of m, the cmc varied slightly with s, which indicated that the electrostatic interaction between the ionic-groups of the “ monomer” has been naturally changed duo to a link between the two ionic-groups of the “ monomer” through a spacer. However, N was strongly decreased with s,which may be a reason of steric inhibition coming from the ionic-groups due to a link of spacer. With increasing temperature, micellization of the Gemini surfactants was slightly enhanced.