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1.
A series of lightly La-doped CdO thin films (1%, 5%, and 7%) have been prepared by a spin coater sol-gel technique on amorphous
glass and crystalline Si substrates. Those prepared films were studied by X-ray diffraction (XRD), UV-VIS-NIR absorption spectroscopy,
and dc-electrical measurements. The investigation shows that La doping grows slightly the CdO lattice parameter and decreases
the intrinsic energygap from 2.1 eV to 1.7 eV. The optical properties were easily explained in the framework of classical
Drude theory and thus all the corresponding parameters were determined. The electrical behaviour of the samples shows that
they are degenerate semiconductors until the atomic percentage of the La dopant was 7% then the sample was converted into
a non-degenerate semiconductor. Generally, it was observed that the conductivity and mobility of the carriers were decreased
by increasing the La content in the CdO film samples. 相似文献
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利用射频磁控溅射法在(LaAlO3)0.3(SrAl0.5Ta0.5O3)0.7 (001)单晶基底上生长了镧掺杂BaSnO3外延薄膜. 通过Hall效应和热电势测量证实了镧掺杂BaSnO3薄膜具有n型简并半导体特征, 并且基于载流子浓度和Seebeck系数计算出电子的有效质量为0.31m0 (m0为自由电子质量). 镧掺杂BaSnO3薄膜在可见波段具有良好的透明性(透过率大于73%). 基于介电模型对薄膜的透过率曲线进行拟合, 从拟合结果中不仅得到了薄膜的厚度为781.2 nm, 能带宽度为3.43 eV、 带尾宽度为0.27 eV和复光学介电常数随波长的变化规律, 而且也强力地支持了基于电学参数计算电子有效质量的正确性. 相似文献
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利用密度泛函理论框架下的平面波超软赝势法,通过第一性原理对La掺杂与Zn空位(V_(Zn))及La掺杂与S空位(V_S)共存的ZnS体系的电子结构、磁性机理、形成能及吸收光谱进行了研究.结果表明, La掺杂与空位(V_(Zn)或V_S)的空间位置最近时,掺杂体系的形成能最低,体系最稳定.另外,La掺杂与Zn空位共存时,体系具有磁性,且体系的净磁矩与La原子与Zn空位的相对位置有关;La掺杂与S空位共存时,掺杂体系无磁性,但此时体系的禁带宽度最窄且吸收光谱红移最显著. 相似文献
5.
采用溶胶凝胶-浸渍提拉法在ITO导电玻璃表面制备了纯TiO2薄膜和La掺杂TiO2薄膜,对其进行350℃、450℃、550℃保温2h热处理.利用XRD、SEM、EDS、XPS对样品结构、形貌、成分进行表征,利用电化学工作站对薄膜进行光电流测试,研究了La掺杂以及不同热处理温度对TiO2薄膜结构及光电流的影响.结果表明:La掺杂有细化TiO2晶粒和抑制锐钛矿相向金红石相转变的作用.随热处理温度提高,纯TiO2薄膜与La掺杂TiO2薄膜光电流密度均先增大后减小,450℃热处理后纯Ti02薄膜光电流密度为180 μA·cm-2,此温度下La掺杂TiO2薄膜光电流密度为650 μA·cm-2,是纯TiO2薄膜的3.6倍. 相似文献
6.
La-doped HfO2 gate dielectric thin films have been deposited on Si substrates using La(acac)3 and Hf(acac)4 (acac = 2,4-pentanedionate) mixing sources by low-pressure metal-organic chemical vapor deposition (MOCVD). The structure, thermal stability, and electrical properties of La-doped HfO2 films have been investigated. Inductive coupled plasma analyses confirm that the La content ranging from 1 to 5 mol% is involved in the films. The films show smaller roughness of ∼0.5 nm and improved thermal stability up to 750 °C. The La-doped HfO2 films on Pt-coated Si and fused quartz substrates have an intrinsic dielectric constant of ∼28 at 1 MHz and a band gap of 5.6 eV, respectively. X-ray photoelectron spectroscopy analyses reveal that the interfacial layer is Hf-based silicate. The reliable value of equivalent oxide thickness (EOT) around 1.2 nm has been obtained, but with a large leakage current density of 3 A/cm2 at Vg = 1V + Vfb. MOCVD-derived La-doped HfO2 is demonstrated to be a potential high-k gate dielectric film for next generation metal oxide semiconductor field effect transistor applications. 相似文献
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G. Le Bras P. BonvilleD. Colson A. ForgetN. Genand-Riondet R. Tourbot 《Physica B: Condensed Matter》2011,406(8):1492-1495
We have performed magnetization and magnetocapacitance measurements on ceramic samples of the multiferroic series Bi1−xLaxFeO3 for 0≤x≤.0.25. We show that doping with La reduces the transition magnetic field from the spatially modulated state to a homogenous one and increases the magnetocapacitance, these effects being the strongest for x=0.15, which is the highest concentration for maintaining the non-centrosymmetric rhomboedral structure (R3c) of BiFeO3. For highest La content (x≥0.17), analysis of the XRD patterns shows that the lattice symmetry gradually changes to orthorhombic (C222), giving rise to an enhancement of the latent magnetization and to a drop of the magnetodielectric constant. 相似文献
8.
TiO2 photoelectrodes with various nanostructures have been successfully prepared by the anodization method. The morphology, microstructure and optical properties of as-prepared photoelectrodes were studied by scanning electron microscopy (SEM), X-ray diffraction (XRD), ultraviolet/visible light diffuse reflectance spectra (UV/vis/DRS), surface photovoltage spectroscopy (SPS) and photocurrent. The electronic structure and optical properties of La doped/undoped TiO2 photoelectrodes with different crystal structures were calculated by the density function theory. The photocatalytic and photoelectrocatalytic activities of as-prepared photoelectrodes were evaluated. The results showed that the anodization potentials played a crucial role in the surface morphology and microstructure. Both results of theoretical calculations and experimental tests demonstrated that La-doped photoelectrodes were more sensitive to light than undoped one. The difference of photoelectrodes performance was ascribed to the crystal configuration, impurity energy levels and long-range orientation moving of photogenerated carriers. 相似文献
9.
Effect of La doping on microstructure of SnO2 nanopowders prepared by co-precipitation method 总被引:3,自引:0,他引:3
A series of La-doped SnO2 nanopowders with various dopant concentrations were prepared by chemical co-precipitation technique, and the nanopowders prepared were characterized by differential scanning calorimeter (DSC), thermo-gravimetric (TG), X-ray diffraction (XRD), transmission electron microscopy (TEM), and X-ray photoelectron spectroscopy (XPS). The results show that La doping can obviously prevent the growth of nanosized SnO2 crystallites. When the La concentration reaches and surpasses 5 at.%, SnO2 crystallite size reaches a minimum value and remains almost constant. With the increase of La concentration, La tends to dissolve in the bulk phase of SnO2 to form solid solution below 10 at.% addition and then starts to disperse onto the surface of the solid solution as a monolayer above 10 at.%. The effect of La doping on hindering crystallite growth can be attributed to the solute drag and lattice distortion resulting from La dissolving in the bulk phase of SnO2 to form solid solution, rather than the monolayer of La on the surfaces of the SnO2 powders. 相似文献
10.
Reversible alternation between bipolar and unipolar resistive switching in La-SrTiO_3 thin films 下载免费PDF全文
The alternation from bipolar to unipolar resistive switching is observed in perovskite La0.01Sr0.99TiO3thin films.These two switching modes can be activated separately depending on the compliance current(Icomp)during the electroforming process:with a higher Icomp(5 mA)the unipolar resistance switching behavior is measured,while the bipolar resistance switching behavior is observed with a lower Icomp(1 mA).On the basis of I–V characteristics,the switching mechanisms for the URS and BRS modes are considered as being a change in the Schottky-like barrier height and/or width at the Pt/La-SrTiO3interface and the formation and disruption of conduction filaments,respectively. 相似文献