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Hamaker三个假设条件是用连续方法解离散问题的理论基础.根据Hamaker三个假设条件,利用连续方法计算两个原子之间的相互作用力,发现作用力同经典的Lennard-Jones势所反映的作用力不一致.通过分析得出Hamaker均质材料假设条件仅适用于微观物质间距较大的范围以及数字密度随间距变化的结论;推导出数字密度随间距变化的表达式,修正了Hamaker提出的用连续方法计算微观物质间相互作用力的表达式.最后对Hamaker常数进行分析,得出Hamaker常数本身就是随物质间距变化的结论,从而对目前存在的
关键词:
Hamaker假设
数字密度
Hamaker常数
Lennard-Jones势 相似文献
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微机械纳米接触连续方法的建模和计算 总被引:3,自引:1,他引:2
为解决微机械中"微碰撞"、"纳米接触"问题,建立了纳米接触的刚性球-面模型,根据Hamaker3个假设和Lennard Jones势,利用连续方法推导出球同平面第1和第N层原子之间的作用力表达式,仿真出粘着力同原子层之间的关系,得出影响纳米接触的主要原子为接触区域少数几层原子的结论,从而为纳米接触、纳米摩擦的进-步研究提供理论基础. 相似文献
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The study on mechanism and model of negative bias temperature instability degradation in P-channel metal-oxide-semiconductor field-effect transistors 下载免费PDF全文
Negative Bias Temperature Instability (NBTI) has become one of the most serious reliability problems of metal- oxide-semiconductor field-effect transistors (MOSFETs). The degradation mechanism and model of NBTI are studied in this paper. From the experimental results, the exponential value 0.25-0.5 which represents the relation of NBTI degradation and stress time is obtained. Based on the experimental results and existing model, the reaction-diffusion model with H+ related species generated is deduced, and the exponent 0.5 is obtained. The results suggest that there should be H+ generated in the NBTI degradation. With the real time method, the degradation with an exponent 0.5 appears clearly in drain current shift during the first seconds of stress and then verifies that H+ generated during NBTI stress. 相似文献
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针对Hamaker理论在工程实际中存在的问题,从物质结构出发分析晶体结构,发现晶体结构存在空隙,Hamaker连续介质假设不成立.为实现介质的连续性,根据物质结构理论,提出体心立方体和面心立方体的Wigner-Seitz密实拼构模型.通过分析双Wigner-Seitz模型同经典Lennard-Jones势,推导出Hamaker介质修正系数,对Hamaker可加性假设和均质材料假设进行了修正,同时修正了Hamaker提出的用连续方法计算微观物质间相互作用力的表达式,对斥力进行了分析,将微观连续介质的应用范围
关键词:
Hamaker假设
Wigner-Seitz模型
Lennard-Jones势
微观连续介质 相似文献
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The effects of channel length and width on the degradation of negative bias temperature instability (NBTI) are studied. With the channel length decreasing, the NBTI degradation increases. As tile channel edges have more damage and latent damage for the process reasons, the device can be divided into three parts: the gate and source overlap region, the middle channel region, and the gate and drain overlap region. When the NBTI stress is applied, the non-uniform distribution of the generated defects in the three parts will be generated due to the inhomogeneous degradation. With tile decreasing channel length, tile channel edge regions will take up a larger ratio to the middle channel region and the degradation of NBTI is enhanced. The channel width also plays an important role in the degradation of NBTI. There is an inflection point during the decreasing channel width. There are two particular factors: the lower vertical electric field effect for the thicker gate oxide thickness of the sha/low trench isolation (STI) edge and the STI mechanical stress effecting on the NBTI degradation. The former reduces and the latter intensifies the degradation. Under the mutual compromise of the both factors, when the effect of the STI mechanical stress starts to prevail over the lower vertical electric field effect with the channel width decreasing, the inflection point comes into being. 相似文献
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