银纳米微粒荧光猝灭法测定水中痕量ClO2

在pH 9.1的NH4Cl-NH3·H2O缓冲溶液中,银纳米微粒在470 nm处产生一个荧光峰;它能被ClO2氧化导致体系的荧光发生猝灭.ClO2浓度在0.001 1～0.185μg·mL-1范围内与荧光猝灭强度成良好的线性关系,检测限为0.004 7μg·mL-1 ClO2.据此建立了测定ClO2的荧光分析新方法,用于饮用水中ClO2的测定,结果满意.     

二维位置灵敏探测器输出图像畸变的修正

高分辨(e,2e)谱仪采用二维位置灵敏探测器同时对能量和角度进行多道测量.二维位置灵敏探测器由级联使用的微通道板和电阻阳极板组成,由于电阻阳极板的边缘效应和制造工艺的缺陷,测量得到的位置图像与实际图像总会有一定的形变,存在一定的非线性.本文针对高分辨(e,2e)谱仪二维位置灵敏探测器输出图像的“桶形”畸变及位置非线性,采用一种简易的冷刻法(用脉冲信号来模拟真实电子束团),检验了二维位置灵敏探测器的Gear型电阻阳极板的线性好坏,并用分割成小三角形的方法找出测量得到的畸变图像与原始真实图像的映射关系,再用此关系对其它测量得到的畸变图像进行修正,并对修正的结果进行了评估.通过修正,由“桶形”畸变所造成的图像扭曲得到明显改善.修正后的x方向非线性由修正前的2.1%变为0.59%.这种检验和修正方法对其它领域类似探测器输出图像的修正也有一定的指导意义.     

980 nm激发下Er3+/Yb3+共掺杂ZrO2-Al2O3粉末的上转换发光特性

通过固相反应法制备了Er3+/Yb3+共掺杂ZrO2-Al2O3粉末的样品,并对样品在980nm激光激发下的上转换发光特性进行了研究.从发射光谱可以发现,在可见光范围内有3个强的发光带,一个位于654nm附近的红光带和两个分别位于545nm、525nm附近的绿光带,分别对应于Er3+离子的以下辐射跃迁:4F9/2→4I15/2、4S3/2→4I15/2、2H11/2→4I15/2.其中又以Er3+离子的4F9/2→4I15/2跃迁产生的红色荧光辐射最强.对其上转换发光机制进行了分析,发现这三个发光过程都是双光子过程.对样品粉末进行了XRD检测,发现ZrO2主要以立方相为主,并且计算得到了这种立方结构的晶格常数.Al2O3固溶于ZrO2中,Al3+嵌入ZrO2后产生氧空位,导致ZrO2晶体的对称性降低,这种结构变化更有利于提高上转换效率,即上转换发光强度增强.     

恒流应力下E2PROM隧道氧化层的退化特性研究

在电容测量的基础上研究了薄隧道氧化层在恒定Fowler-Nordheim(F-N)隧穿电流下的退化情况. 这种退化是恒流应力和时间的函数，对恒流应力大小的依赖性更加强烈，隧道氧化层在F-N电流下的退化是注入电荷密度(Q_inj)的函数. 在较低Q_inj下氧化层中发生正电荷俘获，在较高Q_inj下发生负电荷俘获，导致栅压变化的反复. 关键词： 2PROM')" href="#">E²PROM 隧道氧化层 退化 恒流应力     

温度/应变/扭曲三参量同时测量低成本传感系统

提出了一种利用布喇格光纤光栅反射光作信号源、高频CO2激光脉冲写入的长周期光纤光栅和超周期光纤光栅作传感器实现温度、应变和扭曲同时测量的全光栅型低成本强度解调传感方案.文中利用长周期光纤光栅边缘滤波效应实现了温度、应变和扭曲传感信号的实时解调.实验结果表明，其温度和应变的测量灵敏度分别为－0.211 dB/℃和－0.012 dB/10με；而扭曲率的测量灵敏度为0.4394 dB/(rad·m－1)，是该法写入普通LPFG的4倍以上.     

B_2分子X~3Σ_g~-和A~3Σ_u~-态的势能函数

使用SAC/SAC-CI方法,利用D95(d),6-311g**以及cc-PVTZ等基组,对B2分子的基态(X3Σg-)和第一激发态(A3Σu-)的平衡结构和谐振频率进行了优化计算.通过对3个基组的计算结果的比较,得出了D95(d)基组为3个基组中的最优基组的结论;使用D95(d)基组,利用SAC的GSUM(Group Sum of Operators)方法对基态(X3Σg-),SAC-CI的GSUM方法对激发态(A3Σu-)进行单点能扫描计算,用正规方程组拟合Murrell-Sorbie函数,得到了相应电子态的完整势能函数;从得到的势能函数计算了与基态(X3Σg-)和第一激发态(A3Σu-)相对应的光谱常数(Be,αe,ωe和ωeχe),结果与实验数据吻合.     

共振光散射法测定环境水样中痕量锡

基于在Tris-HCl介质中,痕量锡对氯酚红-人血白蛋白-十二烷基硫酸钠体系的共振散射光谱有明显的猝灭作用;考察了它们的光谱特征、影响因素和适宜的反应条件;确定了散射光强度与Sn2 的关系,从而建立了测定痕量锡的共振光散射新方法.该法在室温下进行,操作方便,灵敏度高和选择性好.其线性范围为0.2-4.0μg/L,检出限0.12μg/L,用于环境水样中痕量Sn2 的测定,相对标准偏差小于3.1%,加标回收率为95.5%-100.5%,效果良好.     

2-(2-喹啉偶氮)-5-二甲氨基苯胺光度法测定铜

在pH=4.0的磷酸盐缓冲介质中,CTMAB存在下,2-(2-喹啉偶氮)-5-二甲氨基苯胺(QADMAA)与铜反应生成2:1稳定络合物,络合物λmax=580nm,ε=1.14×105L·mol-1·cm-1.铜含量在0.01-0.6μg/mL内符合比耳定律,方法用于环境样品中铜的测定,结果令人满意.     

The AB2-XA1 electronic transition of NO2: A rovibronic survey covering 14 300-18 000 cm

More than 250 rotationally resolved vibrational bands of the A²B₂-X²A₁ electronic transition of ¹⁵NO₂ have been observed in the 14 300-18 000 cm⁻¹ range. The bands have been recorded in a recently constructed setup designed for high resolution spectroscopy of jet cooled molecules by combining time gated fluorescence spectroscopy and molecular beam techniques. The majority of the observed bands has been rotationally assigned and can be identified as transitions starting from the vibrational ground state or from vibrationally excited (hot band) states. An exceptionally strong band is located at 14 851 cm⁻¹ and studied in more detail as a typical benchmark transition to monitor ¹⁵NO₂ in atmospheric remote sensing experiments. Standard rotational fit routines provide band origins, rotational and spin rotation constants. A subset of 177 vibronic levels of ²B₂ vibronic symmetry has been analyzed in the energy range between 14 300 and 17 250 cm⁻¹, in terms of integrated density and using Next Neighbor Distribution. It is found that the overall statistical properties and polyad structure of ¹⁵NO₂ are comparable to those of ¹⁴NO₂ but that the internal structures of the polyads are completely different. This is a direct consequence of the X²A₁-A²B₂ vibronic mixing.     

Solid-phase epitaxy of CaSi2 on Si(1 1 1) and the Schottky-barrier height of CaSi2/Si(1 1 1)

Thin Ca films were evaporated on Si(1 1 1) under UHV conditions and subsequently annealed in the temperature range 200–650 °C. The interdiffusion of Ca and Si was examined by ex situ Auger depth profiling. In situ monitoring of the Si 2p core-level shift by X-ray photoemission spectroscopy (XPS) was employed to study the silicide formation process. The formation temperature of CaSi₂ films on Si(1 1 1) was found to be about 350 °C. Epitaxial growth takes place at T≥400 °C. The morphology of the films, measured by atomic force microscopy (AFM), was correlated with their crystallinity as analyzed by X-ray diffraction (XRD). According to measurements of temperature-dependent I–V characteristics and internal photoemission the Schottky-barrier height of CaSi₂ on Si(1 1 1) amounts to qΦ_Bn=0.25 eV on n-type and to qΦ_Bp=0.82 eV on p-type silicon.