脉冲激光制膜过程中等离子体演化规律的研究

利用有限差分法对脉冲激光沉积(PLD)技术制备KTa065Nb035O3(KTN)薄膜过程中等离子体在等温和绝热两个阶段的速度演化进行了模拟，并给出了其中主要粒子在空间的具体演化规律，对等离子体在空间膨胀的物理机制，进行了深入的讨论，给出了相应演化过程的物理图像，并揭示了等离子体羽辉在膨胀过程中呈现椭球外形的内在原因.     

KTN薄膜脉冲激光沉积过程的机理研究

根据能量平衡原理,导出了脉冲激光作用靶材的烧蚀率公式,并根据流体动力学理论,得出了脉冲激光产生的等离子体的空间运动特性方程,将靶材烧蚀率公式与等离子体空间动力学方程结合起来,根据实验研究了不同激光功率密度和波长对Kta_0.65Nb_0.35O₃(KTN)薄膜沉积特性的影响,得到了一些有价值的结果,并对结果进行了详细的讨论,理论计算结果与实验大体符合. 关键词： PLD技术 烧蚀率 等离子体 KTN薄膜     

脉冲激光制备薄膜材料的机理

给出脉冲激光作用块状靶材的烧蚀模型.根据能量平衡原理,导出烧蚀面的位置随时间的变化关系.利用绝热近似、温度连续性条件和能量平衡原理来获得烧蚀面与固液相界面边界条件.结合热传导方程,利用精确解与积分近似法相结合的方案,给出固液两相的温度分布与时间和位置的变化关系,以及固液相界面的位置随时间的变化规律,并将理论结果与实验数据进行比较.由流体动力学理论,得出了脉冲激光产生的等离子体的空间输运方程,将此方程与靶材烧蚀率公式结合起来,根据实验数据研究了不同激光功率密度和波长对KTN(KTa_0.65Nb_0.35O₃)薄膜沉积特性的影响,得到了一些有价值的结果,并对结果进行了详细的讨论.     

Dynamic simulation on the preparation process of thin films by pulsed laser

An ablation model of targets irradiated by pulsed laser is established. By using the simple energy balance conditions, the relationship between ablation surface location and time is derived. By an adiabatic approximation, the continuous-temperature condition, energy conservation and all boundary conditions can be established. By applying the analytical method and integral-approximation method, the solid and liquid phase temperature distributions are obtained and found to be a function of time and location. The interface of solid and liquid phase is also derived. The results are compared with the other published data. In addition, the dynamics process of pulsed laser deposition of KTN (Kta_0.65Nb_0.35O₃) thin film is simulated in detail by using fluid dynamics theory. By combining the expression of the target ablation ratio and the dynamic equation and by using the experimental data, the effects of laser action parameters on the thickness distribution of thin film and on the thin film component characteristics are discussed. The results are in good agreement with the experimental data.