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Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging 下载免费PDF全文
High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmost zone-width is shrinking down to 50 nm or even below,patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect.The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction(PEC),because of the large variety in the line width.This work develops a new strategy,nicknamed as local proximity effect correction(LPEC),efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction.By this way,50 nm zone plates with the aspect ratio from 4:1 up to 15:1 and the duty cycle close to 0.5 have been fabricated.Their imaging capability in soft(1.3 keV)and hard(9 keV)x-ray,respectively,has been demonstrated in Shanghai Synchrotron Radiation Facility(SSRF)with the resolution of 50 nm.The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm. 相似文献
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相位重建是实现X 射线相干衍射成像的关键, 它利用远场采集的样品傅里叶相干衍射花样、结合过采样理论,再采用迭代算法复原样品的相位信息. 文中采用数字模拟的方法, 利用小尺寸二维非周期性图形作为物场, 研究了过采样比对重构结果的影响, 研究发现, 迭代次数为1000 次时最佳过采样比的范围是3—7 之间. 利用噪声模拟方法, 研究了噪声对相位重建的影响, 找到了完成相位重建的噪声限是信噪比不能低于10. 分析了重构结果中孪生像以及随机平移的产生原因, 并给出了相应的解决办法, 结果表明, 此方法可有效地提高重构图像的质量.
关键词:
相干X射线衍射成像
过采样
相位重建算法
显微成像 相似文献