Underpotential deposition of tin(II) on a gold disc electrode and determination of tin in a tin plate sample

This work describes a study of the underpotential deposition (UPD) of Sn²⁺ on a polycrystalline gold disc electrode using cyclic voltammetry (CV) and chronocoulometry (CC). Sn²⁺ ions showed well-defined peaks from UPD and UPD stripping (UPD-S) in 1 mol/L HCl solutions, while bulk deposition (BD) and BD stripping (BD-S) of the ions were also observed. The measured UPD shifts, E_UPD, between the UPD-S and the BD-S peaks were more than 200 mV. The UPD charge and the surface coverage of tin were measured by CC. A new method for determining Sn²⁺ was therefore developed, based on the excellent electrochemical properties of the Au/Sn UPD system. A plot of the UPD-DPASV (differential pulse anodic stripping voltammetry) signal versus the Sn(II) concentration was obtained for [Sn(II)] of 1.98×10^–7 to 3.64×10^–5 M. The method developed here has been applied to determine the tin in a tin plate sample.     

负载型纳米Ni催化剂用于对氯硝基苯选择加氢

以TiO2为载体,N iB为诱导剂,粉末化学镀法制备了负载型纳米N i催化剂.通过TEM、HRTEM、XRD和ICP技术对催化剂物性进行了表征.结果表明,碱性镀液可使载体表面均匀负载微晶结构纳米N i团簇,尺度为35nm左右.该负载型纳米N i在对氯硝基苯选择加氢反应中表现出很高催化加氢活性,并能有效抑制脱氯,达到了工业骨架镍水平.由酸性镀液得到的负载型非晶态纳米N i-P合金具有较弱的催化对氯硝基苯加氢活性.反应温度对反应时间和脱氯率有明显影响.     

原位漫反射红外光谱研究氮氧化物在Ag-ZSM-5催化剂上的吸附态及选择性催化还原反应机理

利用原位分析方法对催化剂表面吸附态进行动态表征，对了解催化反应机理具有重要的意义。漫反射红外光谱是一种理想的原位方法，应用该方法在298－773K范围原位考察了以丙烯为还原剂，NO在Ag-ZSM-5催化剂上的吸附态及选择性催化还原过程。认为NO的选择性催化还原符合直接作用机理，还原的关键是形成有机－氮氧化物（R－NO2或R－ONO）中间体。O2的作用是使C3H6充分活化，并是有效产生有机－氮氧化物不可缺少的条件。     

含锆层柱蒙脱石对1,2,4三甲基苯歧化反应的催化作用

用离子共聚法合成了硅锆层柱蒙脱石（ＳｉＺｒＰＩＬＭ）和铁锆层柱蒙脱石（ＦｅＺｒＰＩＬＭ），考察了它们对１，２，４三甲基苯（１，２，４ＴｒＭＢ）歧化反应的催化性能．１，２，４ＴｒＭＢ在催化剂样品上可发生歧化反应和异构化反应，歧化反应选择性达８０％以上．随着催化剂预处理温度的提高，１，２，４ＴｒＭＢ转化率下降，歧化反应选择性和四甲基苯（ＴｅＭＢ）中１，２，４，５ＴｅＭＢ含量则升高．催化剂对１，２，４ＴｒＭＢ歧化反应有择形催化作用，１，２，４，５ＴｅＭＢ和间二甲苯、邻二甲苯为主要产物，并且其含量偏离其热力学平衡组成，ＴｅＭＢ中１，２，４，５ＴｅＭＢ的含量在８５％以上．     

Process study of thermal plasma chemical vapor deposition of diamond,part II: Pressure dependence and effect of substrate pretreatment

The effect of pressure during thermal plasma chemical vapor deposition of diamond films has been investigated for a pressure range from 100 to 760 Torr. The maximum growth rate in our experiments occurs at 270 Torr for substrate temperatures around 1000°C. The existence of an optimum pressure for diamond deposition may he related to the balance between generation and recombination of atomic hydrogen and carbon-containing active species in front of the substrate. To estimate the concentrations of atomic hydrogen and methyl radicals under thermal plasma conditions, calculations based on thermodynamic equilibrium have been performed. This approximate evaluation provides useful guidelines because rapid diffusion results in a near frozen chemistry within the boundary layer. The effect of substrate pretreatment on diamond deposition depends on the type of substrate used. Two growth modes have been observed-layer growth and island growth of diamond crystals on various substrates. Screw dislocations have been observed in diamond deposition in thermal plasmas, and defects such as secondary nucleations are more concentrated along (III) directions than along (100) directions.     

A Novel Cu-Mo／ZSM-5 Catalyst for NOx Catalytic Reduction with Ammonia

The Cu-Mo/ZSM-5 catalysts with different Cu/Mo ratios were prepared by wet impregnation method, and their catalytic performance for selective catalytic reduction of NOx was studied. The results showed that Cu-Mo/ZSM-5 is a very effective catalyst for NOx catalytic reduction with ammonia, especially when Cu/Mo molar ratio is about 1.5. It not only exhibited the extremely high catalytic activity, but also showed good stability for 02. The bulk phase structure of Cu-Mo/ZSM-5 catalysts was determined by XRD technique, and the results indicated that there is a maximum dispersion for Cu species when Cu/Mo molar ratio is 1.5, and an interaction between Cu and Mo along with HZSM-5 may be present in Cu-Mo/ZSM-5, which may possibly result in a special structure favorable for the catalytic reduction of NOx over Cu-Mo/ZSM-5 catalyst.     

锆氢化反应研究2.羰基化合物的选择性还原

本文对芳香醛和酮的锆氢化反应及水解产物进行了研究。产物经NMR证明为相应的醇。并以苯甲醛为代表,初步探讨了锆氢化反应的过程。还研究了含有其他官能团的苯甲醛对锆氢化反应选择性的影响,以及含有较大取代基酮类的锆氢化反应。     

Selective Oxidation of Isobutene over CsFeCoBiMnMoOx Mixed Oxide Catalyst

Mixed oxide catalyst Cs0.1Fe2Co6BiMnMo12Ox was prepared by the coprecipitation method.Selective oxidation of isobutene was carried out in a fixed-bed reactor over Cs0.1Fe2Co6BiMnMo12Ox.The results showed that the catalyst had high catalytic activity. Under the optimum reaction conditions(n(i-C4):n(O2)=1:2-1:4, space velocity=180 h^-1, T=360℃), the yields of methacrolein and methacrylic acid can reach 80% and 8%, respectively. The total yield of liquid products (methacrolein, methacrylic acid and acetic acid) can reach about 90%.     

A Magnesium-Selective Ionophore Containing Four Amide Carbonyl Ligands Derived from L-Tartaric Acid and Axial Furano Oxygen Binding Sites

Octahedrally converging hexadentate macrocyclic receptors 1 and 2, based on L-tartaric acid and furanmoieties, were synthesized andtheir complexation properties studied. In this paper,magnesium ion selectivitiesdetermined by ISE experiments, chiroptical changes observedby circular dichroism(CD) on complexation, and association constants measuredby NMR titration arediscussed.     

Deposition of Oral Bacteria and Polystyrene Particles to Quartz and Dental Enamel in a Parallel Plate and Stagnation Point Flow Chamber

The aim of this paper is to determine to what extent (i) deposition of oral bacteria and polystyrene particles, (ii) onto quartz and dental enamel with and without a salivary conditioning film, (iii) in a parallel plate (PP) and stagnation point (SP) flow chamber and at common Peclet numbers are comparable. All three bacterial strains showed different adhesion behaviors, and even Streptococcus mitis BMS, possessing a similar cell surface hydrophobicity as polystyrene particles, did not mimic polystyrene particles in its adhesion behavior, possibly as a result of the more negative ζ potentials of the polystyrene particles. The stationary endpoint adhesion of all strains, including polystyrene particles, was lower in the presence of a salivary conditioning film, while also desorption probabilities under flow were higher in the presence of a conditioning film than in its absence. Deposition onto quartz and enamel surfaces was different, but without a consistent trend valid for all strains and polystyrene particles. It is concluded that differences in experimental results exist, and the process of bacterial deposition to enamel surfaces cannot be modeled by using polystyrene particles and quartz collector surfaces.