微波辅助合成石墨烯/氧化镍复合材料及其表征

本文通过微波辅助的方法,快速而有效地在热膨胀石墨烯(RG)的缺陷上原位合成氧化镍纳米颗粒,形成石墨烯/氧化镍复合材料(RG/NiO)。利用X-射线衍射(XRD),拉曼光谱(Raman),傅里叶变换红外(FTIR),扫描电镜(SEM),透射电镜(TEM),热重-差热(TGA-DSC)对所制备样品的结构、形貌和NiO含量在复合材料中的含量进行表征。结果表明,热膨胀石墨烯层数约7~8层,层间距约为0.35nm,缺陷多,在水热和微波处理后抗氧化性明显变差。复合材料中氧化镍颗粒平均粒径为25nm,均匀而密集地分散在石墨烯平面上,同时在复合材料中的含量为19.8%。     

Facile synthesis of Z-scheme NiO/α-MoO3 p-n heterojunction for improved photocatalytic activity towards degradation of methylene blue

In this article, Z-scheme NiO/α-MoO₃ p-n heterojunction is successfully synthesized by a facile hydrothermal route. The phase and nanostructures are researched through a series of characterizations, such as XRD, SEM, TEM, EDX, XPS and DRS. It is confirmed that the NiO nanoparticles are deposited homogeneously on one dimensional α-MoO₃ nanobelts and p-n heterojuction is constructed at the interface of α-MoO₃ and NiO. Photocatalytic activity of the as-synthesized photocatalysts is investigated by photodegradation of methylene blue (MB) under simulated solar light irradiation. Compared with bare α-MoO₃, the NiO/α-MoO₃ p-n heterojunction exhibits significantly improved photocatalytic activity and photostability for MB degradation. The improvement in the photocatalytic performance can be attributed to the optimization of the charge transport pathway offered by Z-scheme heterojunctions, which can promote the effective separation of electron-hole pairs. The results indicate that Z-scheme NiO/α-MoO₃ p-n heterojunction is a novel and efficient photocatalyst with potential application for the removal of organic contaminant in wastewater.     

Core-level electronic properties of nanostructured NiO coatings

Nanostructured NiO films with different thicknesses were grown on nanoporous alumina membrane substrates by reactive evaporation of Ni in an oxygen atmosphere. The reactive deposition process was assisted by a low energy oxygen ion-beam in order to increase the NiO input into the pores. Surface morphology and structure of the films were analyzed by SEM and XPS. SEM observations reveal a well adhered film of NiO on the substrate. This film appears to be uniform and presents a rather irregular nanostructured morphology, built of NiO clusters with sizes ranging between 5 and 30 nm. The core-level electronic properties of this nanostructured NiO film result to be similar to those of an ultrathin film about one monolayer thick. This behaviour can be explained by the large surface to volume ratio of both systems.     

Direct synthesis of porous NiO nanowall arrays on conductive substrates for supercapacitor application

Porous NiO nanowall arrays (NWAs) grown on flexible Fe-Co-Ni alloy have been successfully synthesized by using nullaginite (Ni₂(OH)₂CO₃) as precursor and investigated as supercapacitor electrodes. In details, we adopted a simple hydrothermal method to realize Ni₂(OH)₂CO₃ NWAs and examined their robust mechanical adhesion to substrate via a long-time ultrasonication test. Porous NiO NWAs were then obtained by a post-calcination towards precursors at 500 °C in nitrogen atmosphere. Electrochemical properties of as-synthesized NiO NWAs were evaluated by cyclic voltammetry and galvanostatic charge/discharge; porous NiO NWAs electrode delivered a specific capacitance of 270 F/g (0.67 A/g); even at high current densities, the electrode could still deliver a high capacitance up to 236 F/g (13.35 A/g). Meanwhile, it exhibited excellent cycle lifetime with ∼93% specific capacitance kept after 4000 cycles. These results suggest that as-made porous NiO NWAs electrode is a promising candidate for future thin-film supercapacitors and other microelectronic systems.     

TiO_2表面NiO光催化活性中心的构建及其光催化析氢性能研究

本文采用离子快速注入法,在低温条件下利用微量NiO物种对TiO_2光催化剂表面微结构进行了修饰和改性,构建了NiO光催化反应活性中心。研究结果表明,Ni物种是以TiO_2-NiO-H形式存在于TiO_2表面;相对于未修饰的TiO_2光催化剂,NiO的修饰很大程度上提高了其光催化析氢性能,在最佳条件下,放氢速率由1.1μmol·h~(-1)提高到241.4μmol·h~(-1)。另外,Ni物种含量,热处理温度,乙醇电子给体浓度,催化剂悬浮浓度对光催化析氢性能也有明显的影响。光电化学实验结果表明,NiO的表面修饰能够产生有效的光催化反应活性中心,增强了光生电子-空穴电子对的分离效果。所制备的光催化剂采用X射线粉末衍射(XRD),光电子能谱(XPS)等技术进行表征。     

氮掺杂二氧化钛-氧化镍双层薄膜的光电致色特性

以金属钛为靶材、O2/N2/Ar混合气氛为溅射气体,在导电玻璃(ITO)表面磁控溅射一层薄膜,再经300-500℃退火处理制备了氮掺杂TiO2薄膜.采用X射线衍射(XRD)、X光电子能谱(XPS)、扫描电子显微镜(SEM)和紫外-可见吸收光谱等对薄膜的微观结构、光学特性和光电化学性能等进行了研究.进而采用化学沉积的方法在TiO2-xNx薄膜表面沉积上一层多孔NiO薄膜,研究表明,制备的ITO/TiO2-xNx/NiO双层薄膜具有明显的光电致色特性,400℃退火处理的氮掺杂TiO2薄膜具有最高的光电流响应,经氙灯照射1h后,薄膜从无色变成棕色,500nm波长处光透过率从79.0%下降至12.6%.     

Fabrication of solid oxide fuel cell based on doped ceria electrolyte by one-step sintering at 800 °C

Ce_0.8Gd_0.05Y_0.15O_1.9 (GYDC) electrolyte was prepared by a carbonate co-precipitation method. Lithium nitrate at 1, 1.5, 2 and 3 mol% was added to GYDC as sintering additive. 96% relative density was achieved for GYDC at sintering temperature of 800 °C with addition of 1.5 mol% LiNO₃. The conductivities of GYDC with sintering aids LiNO₃ were measured by a.c. impedance spectroscopy and showed comparable values to that of pure GYDC sample sintered at 1400 °C. A single cell with 1.5 mol% LiNO₃ infiltrated GYDC electrolyte was fabricated by sintering at 800 °C for only 2 h. Lithiated NiO was synthesized by the glycine-nitrate combustion method and employed as cathode material. The cell was tested at temperatures from 500 to 575 °C and a maximum power density of 73 mW cm^− 2 was obtained at 575 °C. These preliminary results indicate that LiNO₃ is a very effective sintering additive for intermediate temperature solid oxide fuel cell fabrication.     

Electronic structures of N- and C-doped NiO from first-principles calculations

The large intrinsic band gap of NiO has hindered severely its potential application under visible-light irradiation. In this Letter, we have performed first-principles calculations on the electronic properties of N- and C-doped NiO to ascertain if its band gap may be narrowed theoretically. It was found that impurity bands driven by N 2p or C 2p states appear in the band gap of NiO and that some of these locate at the conduction band minimum, which leads to a significant band gap narrowing. Our results show that N-doped NiO may serve as a potential photocatalyst relative to C-doped NiO, due to the presence of some recombination centres in C-doped NiO.     

氧化镍薄膜的制备及电化学性质

分别采用真空蒸镀_热氧化(VE_TO)及脉冲激光沉积(PLD)技术制备氧化镍(NiO)阳极薄膜材料,并利用XRD、SEM、循环伏安、充放电等方法对薄膜的结构和电化学性能进行了表征。结果表明,两种方法均制备了厚度均匀、表面光滑、与基片结合紧密、无缺陷、致密的纳米晶形NiO薄膜。采用PLD技术制备的薄膜颗粒更小、结构更有序,具有更高的电化学比容量,并且能承受大电流充放电。因此,这两种方法制备的NiO薄膜可根据充放电电流密度的要求有选择的应用于全固态薄膜锂离子电池中。