蒙卡燃耗中的氙振荡现象分析及计算研究

根据氙振荡产生的机理,按照燃耗步长来划分:在短步长条件下会产生物理氙振荡,在长步长条件下会产生数值氙振荡。研究发现,当燃耗步长增大到19 h,物理氙振荡的振幅最小,随着燃耗步长继续增大,表现为数值氙振荡,当燃耗步长27 d,数值氙振荡振幅最小。采用平衡氙方法强制使中子通量与氙浓度平衡,在堆芯物理计算程序(RMC)的输运模块中运用平衡氙方法对碘氙的浓度进行不断的迭代更新,在保证收敛的情况下抑制了氙振荡现象的发生。     

团簇增强的纳秒激光电离产生Xez+(z≤20)高价离子

利用功率密度为1011—1012W·cm-2的1064nm纳秒激光电离氙原子团簇，在飞行时间质谱中观察到电离态高达+20的高价离子.不同脉冲束位置实验表明，仅当激光作用于分子束的中段时，才能观察到高价离子，且高价离子的强度随束源压力的增加而迅速增强.实验结果表明束中大尺寸团簇的存在与高价离子的形成密切相关.讨论了高价离子产生的可能机理. 关键词： 氙 纳秒激光 高价离子 飞行时间质谱     

在Ar和Xe低温基体中Fe（CO）3与CO扩散控制反应研究

本文用２８０ｎｍ脉冲激光光解被Ａｒ和Ｘｅ基体隔离的Ｆｅ（ＣＯ）５以产生配位不饱和的Ｆｅ（ＣＯ）３。用傅里衰变换红外光谱仪实时监察光解停止后Ｆｅ（ＣＯ）３和ＣＤ的复合，并以Ｓｍｏｌｕｃｈｏｗｓｋｉ扩散控制反应动力学理论模型求得Ｆｅ（ＣＯ）３与ＣＯ的反应半径为４．０×１０＾－１０ｍ，ＣＯ在１０Ｋ的Ａｒ和Ｘｅ基体中的扩散系数分别为２．２×１０＾－２３ｍ＾２／ｓ和４．５×±∩＾－２３ｍ＾２／ｓ。     

Structural modification of C60 films induced by 300-keY Xe-ion irradiation

The structural modification of C60 films induced by 300-keV Xe-ion irradiation was investigated. The irradiated C60 films were analysed using Fourier transform infrared spectroscopy, the Raman scattering technique, ultraviolet/visible spectrophotometry and atomic force microscopy. The analysis results indicate that the Xe-ion irradiation induces polymerization and damage of the C60 molecule and significantly modifies the surface morphology and the optical property of the C60 films. The damage cross-section for the C60 molecule was also evaluated.     

吸附势理论在活性炭对氙的吸附平衡研究中的应用

实验测定了吸附温度为20℃、30℃、50℃时氙在活性炭上的吸附平衡数据。应用吸附势理论建立了20℃下氙在活性炭上的吸附特性曲线。运用该特性曲线计算了30℃、50℃下的吸附平衡数据,并与实验值进行了比较,计算值与实验值符合较好。结果表明,应用吸附势理论可以较好地预测活性炭对氙的吸附平衡。     

氙离子注入氯化钾和溴化钾晶体光谱特性

用36keV氙离子注入,有效地使氯化钾和溴化钾晶体着色.在室温下,对着色晶体进行系统光谱分析.在着色晶体中,观测到大量F、R、M和未知色心,并给出色心生成与转化机理.用解谱的方法,分别从着色氯化钾和溴化钾晶体吸收光谱中合理地分解出K、F、R、M和一些其它吸收带,并精确确定这些吸收带的光谱参数.     

Molecular Dynamics Simulation of Xe Behavior in U-Mo Alloys Fuel

Classical molecular dynamics simulations are used to investigate the fission gas Xe behavior in a U-Mo alloy fuel matrix. The embedded atom method potential proposed by Smirnova et al. is used to describe the U-Mo-Xe system. The results show that the initial configuration of interstitial Xe atoms in U-Mo alloys is very instable and has a strong tendency to get together and to form a Xe bubble by ejecting the adjacent U atoms and Mo atoms from their former normal lattice sites. The pressure in Xe bubbles is initially quite high and then drops with increasing Xe concentration obviously. The matrix swelling of U-Mo alloys associated with the Xe bubble growth follows approximately a linear relationship with the ratio of Xe to U at low Xe concentration while the rate of swelling increases rapidly at high Xe concentration. The simulation results are in good agreement with the experimental data. The recovery of the damaged structure in the U-Mo alloys matrix is also investigated. It is shown that a damaged structure cannot be recovered completely after a system is relaxed for a long time while still having lots of defects.     

基于OFI椭圆偏振光场等离子体中电离电子能量分布的研究

在准静态隧道电离理论模型和准经典阈上电离理论模型的基础上,建立了一个描述基于光场感生电离的椭圆偏振光场电离电子能量分布的简单模型,推导出了既易于理解又相对简单适用的描述椭圆偏振光场的电子能量分布函数解析表达式.利用此式数值计算了不同偏振参量下的椭圆偏振光场中类钯氙系统的电子能量分布曲线,计算结果表明在相同的激光功率密度下,偏振参量对基于OFI电子碰撞机制的X射线辐射强度是有影响的,并与报道的实验结果一致 关键词： 椭圆偏振光场 电子能量分布 类钯氙系统 电子碰撞机制     

PREPARATION OF ACTIVATED CARBON FIBER AND THEIR XENON ADSORPTION PROPERTIES（Ⅲ）-ADSORPTION ON MODIFIED ACTIVATED CARBON FIBER

Structures of a series of activated carbon fibers were modified by impregnating them withorganic and inorganic materials such as Methylene blue(Mb)、 p-nitrophenol (PNP)、 NaCl or byoxidizing with KMnO4 or HNO3. The influence of pore filling or chemical treatment on their xenonadsorption properties was studied. The experimental results show that Mb and PNP filling ofactivated carbon fibers result in the decrease of xenon adsorption capacities of these treated ACFs,which is due to the decrease of their surface area and micro-pore volume. However, the adsorptioncapacity increases greatly with oxidizing treatment of activated carbon fibers by 7mol/L HNO3.