不同晶格磁性光子晶体异质结的界面传导模

利用平面波展开方法研究了两种二维磁性光子晶体(MPC)的带隙(PBG)结构,一种磁性光子晶体是在长方格子纯电介质背景上放置磁性介质长方形散射子,另一种是在三角形格子纯电介质背景上放置磁性介质圆形散射子。计算了这两种磁性光子晶体的带隙随磁导率的变化规律,发现这两种磁性光子晶体的带隙宽高比(带隙宽与带隙中心位置比)都比较大。在此基础上由这两种磁性光子晶体构成了磁性光子晶体异质结(MRRTC异质结),并利用超原胞方法计算了这种异质结的带隙结构。研究发现MRRTC异质结无需从界面做晶格拉开或者侧向滑移就可在绝对带隙中产生界面传导模。分别从MRRTC异质结的界面处做晶格拉开和侧向滑移,发现传导模位置及形状发生了很大变化。     

圆柱形散射子二维光子晶体的态密度与局域态密度

二维光子晶体只有赝带隙,因此能否利用二维光子晶体有效控制原子自发辐射是令人感兴趣也是有实际意义的问题。其中最重要的因素是态密度和局域态密度的性质。采用平面波展开结合晶体群论的方法计算了二维正方格子光子晶体的态密度和局域态密度。其中散射子为空气圆柱,放置在均匀的电介质背景上。结果显示两个特点:第一,总态密度和局域态密度在原来二维光子晶体赝带隙处虽然已经不为零,但是取值明显低于赝带隙范围之外的值,即存在一个准光子带隙。第二,局域态密度在空气散射子界面处发生突变,空气散射子区域的局域态密度相对较大,这可由电位移矢量的连续性来理解。由于这两个特点在其他二维光子晶体中也被发现过,它们可能是普遍存在的。     

Ultra-narrow bandwidth optical filters consisting of one-dimensional photonic crystals with anomalous dispersion materials

We present a new type of optical filter with an ultra-narrow bandwidth and a wide field-of-view （FOV）. This kind of optical filter consists of one-dimensional photonic crystal （PC） incorporating an anomalous-dispersion-material （ADM） with, for instance, an anomalous dispersion of 6P3/2←6S1/2 hyperfine structure transition of a caesium atom. The transmission spectra of optical filters are calculated by using the transfer-matrix method. The simulation results show that the designed optical filter has a bandwidth narrower than 0.33GHz and a wide FOV of ±30°as well. The response of transmission spectrum to an external magnetic field is also investigated.     

Darwin方程在劳厄情况的二维解析解

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嵌镶晶体消光因子计算方法

介绍一种消光因子计算方法——在Darwin传输方程严格解的基础上引入初级消光修正，从而将初、次级两类消光包括在一起．用此方法对LiF的消光因子做了计算，结果表明：当取初级消光因子y_p=0.936时，反映总体误差的R因子由3.03%（未做初级消光修正）减小到2.12%． 关键词：     

Characteristics of Spontaneous Emission of Polarized Atoms in Metal-Dielectric Multiple Layer Structures

The spontaneous emission （SE） progress of polarized atoms in a stratified structure of air-dielectric（DO）-metal（M） dielectric（D1）-air can be controlled effectively by changing the thickness of the D1 layer and rotating the polarized direction of atoms. It is found that the normalized SE rate of atoms located inside the DO layer crucially depends on the atomic position and the thickness of the D1 layer. When the atom is located near the DO-M interface, the normalized atomic SE rate as a function of the atomic position is abruptly onset for the thin D1 layer. However, with the increasing thickness of the D1 layer, the corresponding curve profile exhibits plateau and stays nearly unchanged. The substantial change of the SE rate stems from the excitation of the surface plasmon polaritons in metal-dielectric interface, and the feature crucially depends on the thickness of D1 layer. If atoms are positioned near the DO-air interface, the substantial variation of the normalized SE rate appears when rotating the polarized direction of atoms. These findings manifest that the atomic SE processes can be flexibly controlled by altering the thickness of the dielectric layer D1 or rotating the orientation of the polarization of atoms.     

Pt/Co/Pt/Ni多层膜的磁光特性

用磁控溅射法制备了Pt/Co/Pt/Ni系列样品,其中Ni层具有不同的厚度.通过测量样品的Kerr转角、椭偏率、折射率和吸收率,推算出了四个等效电导张量元σ_1xx,σ_2xx,σ_1xy,σ_2xy随Ni层厚度的变化情况.再结合电导张量元与Kerr角的理论公式,分析了在Ni层厚度的变化过程中,每一个电导张量元对Kerr角的贡献;发现在短波段σ_2xy起主导作用,而在长波段四个电导张量元共同起作用.经分析认为这是由于在Ni层的增厚过程中,Pt 5d带劈裂程度逐渐减小.与纯Pt/Co膜相比,在Ni层的厚度为0.10—0.23nm的范围内样品具有较低的居里温度和较高的Kerr角,这说明Pt/Co/Pt/Ni多层膜具有较高的应用价值. 关键词：