多糖衍生物手性固定相上采用酸性或碱性添加剂的流动相拆分β受体阻滞剂对映体

考察了多糖类手性固定相在含有酸性或碱性添加剂的流动相下高效液相色谱法拆分β受体阻滞剂对映体的效果。色谱条件: 流动相为10%～30%(体积分数,下同)乙醇-正己烷(含0.1%三氟乙酸)和10%～30%乙醇-正己烷(含0.1%三乙胺),流速1.0 mL/min,紫外检测波长254 nm。结果表明,在直链淀粉-三(3,5-二甲基苯基氨基甲酸酯)衍生物手性固定相(Chiralpak AD和Chiralpak IA)上拆分β受体阻滞剂对映体,酸性添加剂的流动相体系与碱性添加剂的流动相体系相比,碱性添加剂的流动相的拆分效果比酸性添加剂的流动相要好。而在纤维素-三(3,5-二甲基苯基氨基甲酸酯)衍生物的手性固定相(Chiralcel OD和Chiralpak IB)上分离β受体阻滞剂,比较酸性添加剂的流动相与碱性添加剂的流动相的拆分效果,发现酸性添加剂的流动相条件下对映体的保留减弱,但对映体的选择性增大,特别是在Chiralcel OD上,酸性添加剂的流动相体系对对映体的选择性非常理想,而且随着流动相中酸性添加剂含量的增加,β受体阻滞剂对映体的分离效果更佳。     

加速溶剂萃取技术在中药有效成分分析中的应用

以两种药材为研究实例,对加速溶剂萃取法（ASE）在中药材有效成分提取研究中的应用进行了简要介绍。采用正交试验法考察了提取丹参中丹酚酸B的提取条件（萃取温度、静态萃取时间、萃取溶剂以及料液比）,确定了较好的实验条件。比较了ASE、水蒸气蒸馏法、超声波提取法及索氏提取法对木香挥发油的提取效果,结果表明ASE对木香挥发油的提取效果最好。     

折射率改变为正的光折变晶体中形成一维光伏暗孤子

提出了一个考虑背景光光伏效应贡献的光伏孤子理论,它指出在折射率变化为正的晶体中,既可产生光伏亮孤子,也可产生光伏暗孤子.当背景光对信号光的有效Glass系数之比为R小于1时,孤子是亮的;R大于1时,孤子是暗的.对亮孤子而言,R值越大,孤子越宽,而对暗孤子,R值越大,孤子越窄.当R为1时,不能形成光伏孤子.一维暗孤子实验结果与理论一致. 关键词： 光折变空间孤子 光伏孤子 暗孤子 正折射率改变     

NaNO2晶体线性和非线性光学系数的计算

使用从头计算平面波赝势方法,计算了NaNO₂晶体电子能带结构,并使用改进的倍频公式计算了它的线性折射率和静态二级非线性系数,所得到的结果和实验值相符.采用实空间原子切割方法分析了阳离子和阴离子基团对光学性质的贡献.计算表明(NO₂)-基团对双折射率和倍频系数的贡献占主要地位,从而进一步验证了阴离子基团理论的正确性 关键词： 电子结构 非线性光学系数 从头计算方法     

Applied Physics A 53, no. 3 (1991)

Applied Physics A 53, no. 3 (1991)     

Room-Temperature Inductively Coupled Plasma Etching of InP Using Cl2/N2 and Cl2/CH4/H2

We optimize the room-temperature etching of InP using Cl2/CH4/H2 and Cl2/N2 inductively coupled plasma reactive ions. A design of experiment is used in the optimization. The results, in terms of etch rate, surface roughness and etched profile, are presented. These Cl2-based recipes do not require substrate heating and thus can be more cost effectively and widely applied. The Cl2/CH4/H2 process is able to give a higher etch rate （about 850 nm/min） and cleaner surface with less polymer formation compared to the conventional CH4/H2 process. The Cl2/N2 process produces even higher etch rate （as high as 2μm/rain）, but rougher surface with slight sidewall undercut. The Cl2/N2 process also has no polymer formation due to the absence of methane gas. Both the processes give very good selectivity to the silicon dioxide （SiO2） etch mask. The selectivity of InP to the oxide mask （up to 55：1） for the Cl2/N2 process is one of the highest reported so far. The etched structures possess reasonably good sidewall verticality and surface quality comparable to that obtained under elevated temperature condition （〉 200℃）.     

Applied Physics A 49, no. 2 (1989)

Applied Physics A 49, no. 2 (1989)     

TIME-AVERAGED SPONTANEOUS POWER RADIATION IN PLASMA FOCUS

The time-averaged spontaneous radiation power and its spectrum are derived analytically. The collective mode is taken to be electron-cyclotron mode driven by the relativistic electron beam existing in the unstable and late phases of plasma focus. The infrared range radiation calculated is in agreement with experimental observation.     

微波合成PtRu/C纳米催化剂及其对甲醇电化学氧化性能

PtRu/carbon nanosized catalyst with PtRu loading of 26.4wt% (Rt∶Ru=1.0∶1.0～1.1) was rapidly synthesized by the microwave polyol process employing the ethylene glycol solution of H₂PtCl₆ and RuCl₃ as precursors in the presence of XC-72 carbon support. TEM observations demonstrated that microwave-prepared PtRu nanoparticles were narrowly distributed and highly dispersed on the carbon with an average size of 3.9 nm. Electrochemical experiments showed that microwave-synthesized PtRu/carbon catalyst exhibited very high catalytic activity for electro-oxidation of liquid methanol at room temperature.