Formation of Anatase Nanocrystals in Sol-Gel Derived TiO2-SiO2 Thin Films with Hot Water Treatment

We have successfully prepared transparent and porous anatase nanocrystals-dispersed films by treating the sol-gel derived TiO₂-SiO₂ films containing poly(ethylene glycol), PEG, with hot water. This process was done at temperatures lower than 100°C under atmospheric pressure, and thus anatase nanocrystals-dispersed films can be formed on various kinds of substrates including organic polymers with poor heat resistance. The changes in structure and composition of the TiO₂-SiO₂ gel films with hot water treatment were related to the formation process of anatase nanocrystals in the TiO₂-SiO₂ gel films with hot water treatment. The formation of anatase nanocrystals was found to proceed to hydrolysis of Si–O–Ti bonds and dissolution of SiO₂ component. In addition, porous film structure formed by leaching of PEG with hot water treatment led to homogenous dispersion of anatase nonocrystals in the films.     

Study on the Superhydrophilicity of the SiO2-TiO2 Thin Films Prepared by Sol-Gel Method at Room Temperature

Nanoscale SiO₂-TiO₂ composite thin films with the thickness of about 100 nm were prepared by sol-gel method at room temperature in air. The chemical states of the elements on the surface and near the surface were measured by XPS. The results showed that the Ti on/near the surface of the thin films existed not only as TiO₂ but also as Ti₂O₃. Part of the TiO₂ was changed to Ti₂O₃ after UV irradiation. The crystalline structure of the TiO₂ in the SiO₂-TiO₂ thin films was anatase with the crystallite size of 14–20 nm. It was found that the thin film prepared at room temperature in air has good superhydrophilic property and has strong adherence to the substrate.     

掺杂钒和硅对TiO2薄膜超亲水性的影响

0引言 TiO2薄膜是众多氧化物半导体薄膜中研究最为广泛的一种材料．其表面的超亲水性和表面自清洁效应开辟了光催化薄膜功能材料的新的研究领域，已成为众多研究者研究的对象。但是如果薄膜仅由TiO2组成，当光照停止，水在TiO2薄膜表面的润湿角逐渐升高．并恢复原始状态。TiO2的禁带较宽，普通光线如太阳光等都不能将其激发．限制了其实际应用。因此如何使TiO2材料的光谱响应范围由紫外光反扩展到可见．光区一日如何更长时间地保持薄膜良好的亲水性是目前研究的重点。     

Preparation of Co–Al and Ni–Al layered double hydroxide thin films by a sol–gel process with hot water treatment

Using hot water treatment of sol–gel derived precursor gel films, Co–Al and Ni–Al layered double hydroxide (LDH) thin films were prepared. The precursor gel films of Al₂O₃–CoO or Al₂O₃–NiO were prepared from cobalt or nickel nitrates and aluminum tri-sec-butoxide using the sol–gel method. Then, the precursor gel films were immersed in a NaOH aqueous solution of 100 °C. Nanocrystallites of Co–Al and Ni–Al LDH were precipitated with the hot water treatment with NaOH solution. The largest amounts of nanocrystals were obtained with a solution of pH = 10 for Co–Al LDH, and with that of pH = 9 for Ni–Al LDH. X-ray diffraction measurements confirmed that this process formed CO₃ ²⁻ intercalated LDHs. Both Co–Al and Ni–Al LDH thin films were confirmed to work as electrodes for electrochemical devices by cyclic voltammogram measurements.     

Photocatalytic Decomposition of Acetaldehyde with Anatase Nanocrystals-Dispersed Silica Films Prepared by the Sol-Gel Process with Hot Water Treatment

Anatase nanocrystals of 5 to 10 nm in diameter were formed in the silica-titania films by treatment with hot water. The formation of nanocrystals with hot water treatment was a unique phenomenon to the silica-titania system and the addition of organic polymers such as PEG was indispensable for the high dispersion of anatase nanocrystals in the films. The hydrolysis of Si—O—Ti bonds with hot water was considered to play an important role for the formation of anatase nanocrystals. The resultant films were transparent even after the formation of anatase nanocrystals. Acetaldehyde was photocatalytically decomposed into CO₂ on the films which were subjected to a hot water treatment. The amounts of generated CO₂ were twice of that of introduced acetaldehyde, indicating that the total acetaldehyde was completely decomposed to CO₂. Anatase nanocrystals-dispersed films can be formed on various kinds of substrates including those with poor heat resistance such as organic polymers and organisms by this process, so that the substrates coated with the films are expected to be widely used for photocatalytic applications.     

Formation of Superhydrophobic Alumina Coating Films with High Transparency on Polymer Substrates by the Sol-Gel Method

Transparent, superhydrophobic coating films have been prepared on polymer substrates at low temperatures through the sol-gel method. Al₂O₃ gel films were prepared on poly(ethylene terephthalate) substrates from Al(O-sec-C₄H₉)₃ chemically modified with ethyl acetoacetate. A small roughness of about 20–50 nm was found to form on the surface of the Al₂O₃ gel films dried at room temperature and then immersed in hot water at 60°C. The electron diffraction measurements have shown that this roughened surface consists of pseudoboehmite nanocrystals. The coating of hydrolyzed fluoroalkyltrimethoxysilane on the Al₂O₃ gel films with the small roughness produced transparent, superhydrophobic films with contact angle for water larger than 150°.     

Formation of Superhydrophobic-Superhydrophilic Pattern on Flowerlike Alumina Thin Film by the Sol-Gel Method

We have prepared superhydrophobic surfaces which become superhydrophilic by heat-treatment at 500°C or irradiation of UV-light. When hydrolyzed fluoroalkyltrimethoxysilane (FAS) was coated on Al₂O₃ gel film with a roughness of 20 to 50 nm, the films showed superhydrophobicity and high transparency; the contact angle for water of the film was 165° and the transmittance for the visible light was higher than 92%. When the FAS-coated thin films were heat-treated at temperatures higher than 500°C, the films became superhydrophilic; the contact angle for water on the films was smaller than 5°. Thin films of amorphous TiO₂ or anatase TiO₂ were coated between Al₂O₃ gel and FAS layer, and the contact angle for water was also about 160°. UV irradiation using high-pressure mercury lamp on these films resulted in the contact angle to be smaller than 5°. When UV light was irradiated through a photomask, superhydrophobic-superhydrophilic micropatterns applicable as a stamper for printing or a substrate of micro-optical components were successfully obtained on the films.     

Sol-gel synthesis of nanocomposite materials based on lithium niobate nanocrystals dispersed in a silica glass matrix

With the final goal to obtain thin films containing stoichiometric lithium niobate nanocrystals embedded in an amorphous silica matrix, the synthesis strategy used to set a new inexpensive sol-gel route to prepare nanocomposite materials in the Li₂O-Nb₂O₅-SiO₂ system is reported. In this route, LiNO₃, NbCl₅ and Si(OC₂H₅)₄ were used as starting materials. The gels were annealed at different temperatures and nanocrystals of several phases were formed. Futhermore, by controlling the gel compositions and the synthesis parameters, it was possible to obtain LiNbO₃ as only crystallizing phase. LiNbO₃-SiO₂ nanocomposite thin films on Si-SiO₂ and Al₂O₃ substrates were grown. The LiNbO₃ average size, increasing with the annealing temperature, was 27 nm for a film of composition 10Li₂O-10Nb₂O₅-80SiO₂ heated 2 h at 800 °C. Electrical investigation revealed that the nanocrystals size strongly affects the film conductivity and the occurrence of hysteretic current-voltage curves.     

The effect of PO<Subscript>2,5</Subscript> and AlO<Subscript>1,5</Subscript> additions on structural changes and crystallization behavior of SiO<Subscript>2</Subscript>-TiO<Subscript>2</Subscript> sol-gel derived glasses and thin films

SiO₂-TiO₂-PO_2,5 (STP) and SiO₂-TiO₂-AlO_1,5 (STA) glasses were prepared by sol-gel processing. Their infrared absorption spectra (IR), differential thermal analysis curves (DTA) and X-ray diffraction patterns (XRD) have been recorded. In the SiO₂-TiO₂ system, the chemical homogeneity of the sol-gel glass could be evaluated by the relative concentration of Si-O-Ti heterocondensation comparing to Si-O-Si homocondensation. For the STA system, a gradual decrease of the Si-O-Ti/Si-O-Si band ratio (based on IR spectra) with the addition of Al₂O₃ is observed, with the simultaneous formation of Si-O-Al and Ti-O-Al bounds, i.e Al₃ ⁺ ions are dissolved in the SiO₂-TiO₂ glass matrix and do not promote glass-in-glass phase-separation in the composition range of 0–15 mol% AlO_1.5. In the STP system, on the other hand, P=O bond IR stretch in the ternary glasses indicates that P=O free PO₂O_2/2 ⁻ tetrahedra are formed, rather than the double bonded POO_3/2 tetrahedra that usually occur in binary SiO₂-P₂O₅ glasses. It can be concluded that SiO₂-TiO₂-P₂O₅ glass separates into a SiO₂-rich phase and a TiO₂(P₂O₅)-rich phase. During heat-treatment in STA system only anatase precipitates, even at T ~ 1,000 °C, while in for STP, anatase (TiO₂) or (TiO)₂P₂O₇ (TOP) crystals precipitate at ~600 °C, depending on the P₂O₅ concentration. The major crystal phase, cristobalite, precipitated at ~1,000 °C and at ~1,200 °C, the P-containing phase melts.     

Microstructure and Photocatalytic Property of SiO<Subscript>2</Subscript>-TiO<Subscript>2</Subscript> Under Various Process Condition

Nanophase silica-titania particles were prepared by two different synthetic routes, namely, sol–gel and hydrothermal processing. The crystallinity and crystallographic phases, particle size and surface area of the materials were controlled by varying the calcination temperature, and/or the ratio of Si to Ti. It was determined by XRD that the crystallite sizes of SiO₂-TiO₂ prepared by sol–gel and hydrothermal processing decreased from 11 to 6 nm and 12 to 9 nm, respectively, as the mole fraction of silica was increased from 0.1 to 0.4. It is proposed that the presence of the amorphous silica suppresses the growth of anatase TiO₂ grains and their phase transformation to rutile. The photocatalytic decomposition rate of 1,4-dichlorobenzene (DCB) in aqueous solution with the sol–gel derived SiO₂-TiO₂ powder prepared at 750 °C was about 10 ± 5% higher than that observed with Degussa P25, whereas the SiO₂-TiO₂ samples prepared by hydrothermal processing at 250 °C showed a slightly lower decomposition rate than P25.     

Evaluation of Photocatalytic Activity of Transparent Anatase Nanocrystals-Dispersed Silica Films Prepared by the Sol-Gel Process with Hot Water Treatment

Anatase nanocrystals were precipitated mainly at the surface of the silica-titania gel films with hot water treatment, whereas the addition of poly(ethylene glycol) (PEG) in the films led to the dispersion of anatase nanocrystals in the whole of the films after the treatment. Both films with and without PEG showed high photocatalytic activities for acetaldehyde, NO _x and stearic acid in the gas-solid system, and for methylene blue and potassium iodide in the liquid-solid system. The addition of PEG improved the photocatalytic activities of the resultant films due to the smaller anatase crystallites and the porous film structure. The residual silica under-layer of the superficially anatase-precipitated films is expected to act as a protective one for an organic polymer substrate against the photocatalytic degradation.     

Structural Changes in Sol-Gel Derived SiO2 and TiO2 Films by Exposure to Water Vapor

Structural changes in sol-gel derived thin films by exposure to water vapor were investigated using Fourier transform infrared absorption spectroscopy, ellipsometry and x-ray diffraction. We found that SiO₂ gel films were densified with a decrease in OH groups by the exposure at 60°–180°C. The shrinkage and the peak frequency of ₄ (TO) for the exposed films were comparable to those heated in a dry atmosphere at temperatures above 500°C. However, OH groups in the films were not completely removed by the water exposure. A subsequent annealing above 300°C changed the structure of the water-exposed SiO₂ films with condensation of the remaining OH groups. Although the exposed SiO₂ gel films were amorphous, TiO₂ gel films were transformed to anatase with a decrease in OH groups by the treatments at 80°–180°C.     

Formation of Zn–Al layered double hydroxide thin films intercalated with sulfonated spiropyran

We prepared Zn–Al layered double hydroxide (LDH) thin films intercalated with sulfonated 1,3′,3′-trimethyl-6-nitrospiro[2H-chromene-2,2′-indoline] anions (SP-SO₃ ^?) by immersion of sol–gel derived amorphous Al₂O₃–ZnO thin films in hot water containing SP-SO₃H. Extended interlayer spacing, in comparison to the Zn–Al LDH with carbonate anions, was observed after immersion in distilled water containing SP-SO₃H at 60 °C for 30 min, indicating that we formed Zn–Al LDH films with SP-SO₃ ^? directly on glass substrates. The merocyanine form of SP-SO₃ ^? was shown by UV spectra to have stabilized in the hydroxide layers of LDH.     

The effect of calcination on the surface properties of the systems Al2O3-TiO2, SiO2-Al2O3, and SiO2-TiO2 prepared from metal alkoxides

Summary The effect of calcining temperature on the surface properties of the systems Al₂O₃-TiO₂, SiO₂-Al₂O₃, and SiO₂-TiO₂ prepared by co-hydrolysis of the corresponding metal alkoxide mixtures was studied from the crystal structure, the specific surface area, the heat of immersion in water and the surface acidity.Generally, the crystal growth of the systems accelerates with the rise of temperature of calcination. The specific surface area diminishes markedly with the rise of temperature of calcination, while the surface acidity remains almost constant. But the heat of immersion depends on the composition of the systems.

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Zusammenfassung Die Systeme Al₂O₃-TiO₂, SiO₂-Al₂O₃ und SiO₂-TiO₂ wurden durch die Hydrolyse der korrespondierenden Metallalkoxyde hergestellt. Von den Systemen wurden die spezifische Oberfläche, die Kristallstruktur, die Benetzungswärme in Wasser und das Oberflächen-p_H in Abhängigkeit von der Glühtemperatur gemessen.Im allgemeinen wird das Kristallwachstum mit der Erhöhung der Glühtemperatur beschleunigt und die spezifische Oberfläche vermindert. Hingegen ist der Oberflächen-p_H-Wert mit der Erhöhung der Glühtemperatur fast unveränderlich. Aber die Benetzungswärme hängt von der Komposition der Systeme ab.

     

Preparation of Titania Nanosheet-Precipitated Coatings on Glass Substrates by Treating SiO2-TiO2 Gel Films with Hot Water Under Vibrations

Titania nanosheet-precipitated coatings have been prepared by treating SiO₂-TiO₂ gel films on glass substrates with hot water at 90°C under vibration. Longitudinal vibrations at about 6 Hz during the treatment enhanced the formation of titania nanosheet. The titania nanosheet consisted of several layers with a spacing of about 0.6 nm and was identified as hydrated titania with a lepidocrocite-type structure. The morphology of the titania nanosheet-precipitated coatings is probably achieved by lowering of the concentration of hydrolyzed titania species at the surface due to rapid water flow driven by the vibrations. The coatings were transparent in the visible range and showed high photocatalytic activity and antifogging property.     

Effect of substrate on phase formation and surface morphology of sol-gel lead-free KNbO3, NaNbO3, and K0.5Na0.5NbO3 thin films

Environmentally acceptable lead-free ferroelectric KNbO₃ (KN) or NaNbO₃ (NN) and K_0.5Na_0.5NbO₃ (KNN) thin films were prepared using a modified sol-gel method by mixing potassium acetate or sodium acetate or both with the Nb-tartrate complex, deposited on the Pt/Al₂O₃ and Pt/SiO₂/Si substrates by a spin-coating method and sintered at 650°C. X-ray diffraction (XRD) analysis indicated that the NN and KNN films on the Pt/SiO₂/Si substrate possessed a single perovskite phase, while NN and KNN films on the Pt/Al₂O₃ substrate contained a small amount of secondary pyrochlore phase, as did KN films on both substrates. Scanning electron microscopic (SEM) and atomic force microscopic (AFM) analyses confirmed that roughness R _q of the thin KNN/Pt/SiO₂/Si film (?? 7.4 nm) was significantly lower than that of the KNN/Pt/Al₂O₃ film (?? 15 nm). The heterogeneous microstructure composed of small spherical and larger needle-like or cuboidal particles were observed in the KN and NN films on both substrates. The homogeneous microstructure of the KNN thin film on the Pt/SiO₂/Si substrate was smoother and contained finer spherical particles (?? 50 nm) than on Pt/Al₂O₃ substrates (?? 100 nm). The effect of different substrates on the surface morphology of thin films was confirmed.     

Ordered Mesoporous Thin Films of Rutile TiO2 Nanocrystals Mixed with Amorphous Ta2O5

Ordered mesoporous thin films of composites of rutile TiO₂ nanocrystals with amorphous Ta₂O₅ are fabricated by evaporation‐induced self‐assembly followed by subsequent heat treatment beyond 780 °C. Incorporation of selected amounts of Ta₂O₅ (20 mol %) in the mesoporous TiO₂ film, together with the unique mesoporous structure itself, increased the onset of crystallization temperature which is high enough to ensure the crystallization of amorphous titania to rutile. The ordered mesoporous structure benefits from a block‐copolymer template, which stabilizes the mesostructure of the amorphous mixed oxides before crystallization. The surface and in‐depth composition analysis by X‐ray photoelectron spectroscopy suggests a homogeneous intermixing of the two oxides in the thin film. A detailed X‐ray absorption fine structure measurement on the composite film containing 20 mol % Ta₂O₅ and heated to 800 °C confirms the amorphous nature of the Ta₂O₅ phase. Photocatalytic activity evaluation suggests that the rutile nanocrystals in the synthesized ordered mesoporous thin film possess good ability to assist the photodegradation of rhodamine B in water under illumination by UV light.     

Preparation and properties of SiO2-TiO2 thin films from silicic acid and titanium tetrachloride

The preparation of SiO₂-TiO₂ thin films by the sol-gel method using silicic acid and titanium tetrachloride as starting materials was studied. The homogeneous sols were obtained by the condensation reaction of silicic acid with titanium tetrachloride in methanol-tetrahydrofuran. The dipcoating of slide glasses and silicon wafers followed by heat treatment gave oxide thin films of 88–93% transmittance, 3000–4500 Å thickness, and 1.45–1.80 refractive index, depending on heat-treatment temperature and TiO₂ content. FT-IR measurement showed that the Si-O-Ti bond is formed even in the sol and films. The variations of film thickness and refractive index on transformation from the gels into the oxides were found to be quite low.     

Characterization of a passivation layer comprising MgO?SiO2 and ZrO2

Thin films with magnesium oxide (MgO) and silicon oxide (SiO₂) compounds mixed at various mixture ratios were deposited on flexible polyether sulfone (PES) substrates by an e‐beam evaporator to investigate their potential for transparent barrier applications. In this study, as the MgO fraction increased, thin films comprising MgO and SiO₂ compounds became more amorphous, and their surface morphologies became smoother and denser. In addition, zirconium oxide (ZrO₂) was added to the above‐mentioned compound mixtures, and the properties of the compound mixture comprising Mg? Si? Zr? O were then measured. ZrO₂ made the thin mixture films more amorphous, and made the surface morphology denser and more uniform. Whole thin films of 250 ± 30 nm in thickness were formed, and their water vapor transmission rates (WVTRs) decreased rapidly. The best WVTR was obtained by depositing thin films of Mg? Si? Zr? O compound among the whole thin films. The WVTRs of the PES substrate in the bare state decreased from 47 to 0.8 g m^?2 day^?1. This Mg? Si? Zr? O compound was deposited on polyethylene terephtalate (PET) substrates again to confirm the availability of the compound mixture. Thin films on the PET substrates decreased the WVTRs remarkably from 2.96 to 0.01 g m^?2 day^?1. These results were similar to those of thin films on PES substrates. As the thin mixture films became more amorphous and surface morphology denser and more uniform, the WVTRs decreased. Therefore, the thin mixture films became more suitable for flexible organic light emitting displays (OLEDs) as transparent passivation layers against moisture in air. Copyright © 2006 John Wiley & Sons, Ltd.     

Preparation and Characterization of SiO2-MxOy(M = V, Sn, Sb) Thin Films from Silicic Acid and Metal Chlorides

The preparation of SiO₂-M _x O _y (M = V, Sn, Sb) binary oxide thin films by sol-gel method was investigated. The reaction of silicic acid with metal chloride (M = Sn and Sb) or oxychloride (M = V) formed homogeneous solutions. The dip-coating of slide glass and silicon wafer followed by heat treatment gave oxide films having Si—O—M bond. The changes of FT-IR spectra as a function of heat treatment temperature and molar composition confirmed the Si—O—M bonds. The sheet resistance of films increased with an increase on heat treatment temperature and decrease in the content of metal oxide M _x O _y . X-ray diffraction peaks were observed for the SiO₂-V₂O₅ films with high V₂O₅ contents and heat-treated above 250°C, while the others were amorphous. Oxide films heat treated at 500°C had a thickness between 340–470 nm.