直流电弧等离子体制备NiO纳米颗粒研究

采用直流电弧等离子体技术成功制备了NiO纳米颗粒,并利用X射线衍射(XRD)、透射电子显微镜(TEM)和相应选区电子衍射(SAED)、傅里叶变换红外光谱(FTIR)、BET氮吸附等测试方法对样品的成分、形貌、晶体结构、比表面积、粒度分布、红外吸收性能进行表征分析.实验结果表明:直流电弧等离子体制备的NiO纳米颗粒为fcc结构的晶态,形貌呈规则的球形,粒度均匀,分散性良好,粒径范围在15～45 nm,平均粒径为25 nm,比表面积为33 m2/g.与普通块体NiO相比,红外吸收峰发生了红移.     

纳米高近红外反射颜料制备工艺研究

采用柠檬酸溶胶-凝胶法制备了纳米高近红外反射颜料,研究了Fe/Cr摩尔比、水解温度、溶液金属离子浓度、pH值、煅烧温度等因素对凝胶时间及试样性能的影响.结果表明,在Fe/Cr摩尔比为0.50,水解温度70℃,溶液金属离子浓度为2.5～3.5 mol/L,pH =3 ～4,煅烧温度为900℃保温60 min的条件下,制备颜料的主晶相为Cr1.3Fe0.7O3,近红外波段范围内(700～2500 nm)其平均反射率可达到77.58;,晶粒尺寸在50～ 200 nm之间.     

GaAs基底TiO2/SiO2减反射膜的反射率性能分析

本文设计并制备了适用于砷化镓(GaAs)多结太阳电池的TiO2/SiO2双层减反射膜,通过实测反射谱来验证了理论设计的正确性。利用编程分析了TiO2、SiO2单层膜的厚度及其折射率对双层膜系反射率的影响。结果显示,在短波范围(300～600 nm),TiO2膜厚对反射率的影响要大于SiO2,而SiO2折射率对反射率的影响比TiO2大;在中波范围(600～900 nm),随着单层膜的厚度和折射率的增加,双层膜系反射率存在一个最小值,变化趋势是先降低,而随后增加。同时,计算结果得到SiO2和TiO2的最优物理膜厚分别为78.61 nm和50.87 nm,此时在短波段中心波长λ1=450 nm处最小反射率为0.0034%,在中波段中心波长λ2=750 nm处最小反射率为0.495%。采用电子束蒸发法在GaAs基底上淀积TiO2/SiO2双层膜,厚度分别为78 nm和50 nm。实测短波和中波相应的反射率极小值分别为0.37%和2.95%,与理论结果吻合较好。     

Ag纳米蛾膜结构阵列对薄膜硅太阳能电池光吸收的影响

设计了一种带有Ag纳米蛾膜结构阵列的薄膜硅太阳能电池背反射器.采用时域有限差分(FDTD)法,系统仿真研究了Ag纳米蛾膜阵列的底部直径、高度、阵列周期常数对薄膜硅太阳能电池光吸收的影响.仿真结果表明,Ag纳米蛾膜结构最佳结构参数为:d=60 nm,a=120 nm,h =100 nm.吸收光谱表明带有Ag纳米蛾膜结构的薄膜硅太阳能电池可有效增加700～ 1200 nm波段范围的光,同带有Ag层的薄膜硅太阳能电池相比,光吸收平均增强53.8;,这是因为Si/Ag界面产生表面等离子体共振现象所致.     

温度梯度法生长氟化钙晶体

用温度梯度法成功生长了直径75mm、完整、透明的氟化钙晶体,对晶体进行了TG-DTA测试分析,确定了其熔点为1413.5℃,并测试了晶体从190nm的紫外波段到40000nm的红外波段的透过率,发现从中紫外波段到红外波段氟化钙晶体的透过率已经能满足各种应用的要求,但在远紫外波段和真空紫外波段(246nm以下)氟化钙晶体的透过率需要进一步提高.     

薄膜厚度对Ag纳米薄膜结构特性及光学性能的影响

采用密度泛函理论,研究了Ag(111)纳米薄膜的结构稳定性、电子特性及光学性能.结果表明,Ag (111)纳米薄膜原子层厚度增加到13层,即膜厚约为2.8nm时,纳米薄膜表面能趋于稳定,为薄膜能够稳定存在的临界厚度.薄膜表面处原子间为弱离子键作用,层间距变化及表面效应主要集中在表面附近几层.在可见光及红外波段,Ag(111)纳米薄膜的折射率明显高于块体材料而消光系数略高于块体材料;随着薄膜厚度的增加,在该波段,折射率减小,消光系数增加,吸收变大.     

晶体硅表面Ag纳米颗粒形貌控制及其对黑硅性能的影响

采用湿法化学法在太阳能级Si(100)表面沉积Ag纳米颗粒,并对Ag颗粒进行了退火处理.利用扫描电子显微镜研究了不同沉积时间及退火工艺对硅片表面Ag纳米颗粒形貌的影响规律.在此基础上采用退火前后的Ag纳米颗粒辅助化学腐蚀法制备了黑硅减反射结构,并用扫描电子显微镜观察了所制备黑硅的微结构,用紫外-可见分光光度计研究了所制备黑硅的反射率.研究表明,制备的Ag颗粒为不规则片状结构,并且随Ag沉积时间的延长,Ag颗粒逐渐长大.通过对样品退火处理,Ag颗粒收缩成球状纳米颗粒.利用未退火的Ag颗粒制备的黑硅呈不规则纳米线状微结构,在300 ～ 1100 nm范围内平均反射率为2.7;;而利用退火后球状Ag纳米颗粒制备的黑硅则呈多孔状微结构,同样波长范围内平均反射率为14.2;.     

ZnO纳米线的水热法生长

本文采用两步湿化学法在玻璃衬底上制备了ZnO纳米线。首先,利用Sol-gel方法在载玻片上制备含有ZnO纳米颗粒的薄膜作为“种子”衬底。然后,利用水热法在“种子”衬底上生长了高度取向的ZnO纳米线。并对“种子”衬底和随后生长的ZnO纳米线进行了X射线衍射(XRD)、扫描电子形貌图(SEM)和原子力显微镜(AFM)等分析。结果表明“种子”衬底为大范围内纳米颗粒均匀一致的ZnO薄膜。通过水热法制备的ZnO纳米线的直径在50～80nm,平均直径为60nm,长度大约为2μm。该ZnO纳米线除了具有很强的紫外发光(399nm)外,还在蓝光(469nm)和绿光(569nm)波段有较弱的光致发光现象。     

大面积垂直取向介孔二氧化硅薄膜的制备及性能研究

具有大尺度无缺陷垂直孔道的介孔二氧化硅薄膜在生物材料、电化学和光学传感器中具有重要应用价值.本文采用电化学辅助自组装(EASA)工艺制备大面积(5×5 cm2)孔道垂直定向的介孔二氧化硅薄膜,利用循环伏安曲线(CV),扫描电子显微镜(SEM)、原子力显微镜(AFM)、高分辨透射电子显微镜(HRTEM)、二维掠入射小角X射线散射(2D-GISAXS)等手段对薄膜渗透性、表面宏观形貌,及介孔孔道的结构等进行了表征,并通过同步辐射反射率计测试了该薄膜在极紫外波段的光学性能.结果 表明,采用EASA法在大面积基底上成功制备出了具有垂直取向孔道且渗透性良好的介孔二氧化硅薄膜,其孔径和晶胞参数大小分别为2.83 nm和4.1 nm,且其在极紫外波段(5～11nm)的反射率最高可达75;.     

偶联剂对Mn-Zn铁氧体颗粒分散性及磁性能的影响

本研究采用沸腾回流共转化法制备锰锌铁氧体纳米颗粒的基础上,分别采用TC-114(钛酸酯)、KH-151(硅烷)、TC-114与KH-15复配对铁氧体颗粒进行包覆。结果表明:包覆后的锰锌铁氧体纳米颗粒均是尖晶石结构,偶联剂包覆使纳米锰锌铁氧体颗粒尺寸变小,其中TC-114与KH-151复配后包覆得到的锰锌铁氧体纳米颗粒粒径最小(17.7 nm),比未包覆的颗粒减少10.9 nm。经TC-114、KH-151包覆后的锰锌铁氧体颗粒FT-IR光谱中分别出现了Ti-O-Fe,Si-O-S两个新的吸收峰。Zeta电位测试结果表明其有最低电位-46.1 mV,在所测pH范围最稳定(绝对值均大于30 mV),分散效果最佳。烧结后包覆颗粒的饱和磁化强度大幅提高,其中经TC-114与KH-151复配包覆的颗粒比未包覆提高了29.5%,矫顽力降低了32.3%。     

降温速率对DAST单晶生长的影响

使用籽晶法通过调整降温速率生长出高质量4-N,N-二甲胺基-4′-N′-甲基-氮杂芪对甲苯磺酸盐(DAST)晶体,研究了降温速率对DAST晶体结晶质量、光学特性及太赫兹输出特性的影响。通过核磁共振分析表征了合成原料的结构和纯度。使用X射线衍射仪对生长晶体的(001)面进行X射线摇摆曲线测试,测试结果表明在降温速率为0.1 ℃/d条件下获得的晶体质量最佳,其摇摆曲线半高宽(FWHM)为57.6″。此条件下生长的晶体在780~1 576 nm波长范围内光透过率达65%。使用差频法从DAST晶体中产生了0.1~20 THz范围内的宽频可调谐太赫兹波,在18.8 THz处得到太赫兹波最大输出能量为0.477 μJ/脉冲,对应的能量转换效率达5.31×10^-5。     

Photosensitive organic-inorganic hybrid structures based on porous silicon

Abstract

In this study, the photovoltaic organic-inorganic structures were created by deposition of poly(3,4-ethylenedioxythiophene) film doped by poly(styrenesulfonate) and reduced graphene oxide on the porous silicon/silicon substrate. Formation of the hybrid structure was confirmed by means of atomic-force microscopy and Fourier transform infrared spectroscopy. The current-voltage characteristics of the obtained structures were studied. It was found the increase of electrical conductivity and photo-induced signal in organic-inorganic structures. Temporal parameters and spectral characteristics of photoresponse in the 400–1100?nm wavelength range were investigated. The widening of spectral photosensitivity in a short-wavelength range due to light absorption in various layers of the multijunction structure in comparison with single crystal silicon was revealed.     

Temperature and excitation intensity tuned photoluminescence in Tl4GaIn3S8 layered single crystals

Photoluminescence spectra of Tl₄GaIn₃S₈ layered crystals grown by Bridgman method have been studied in the wavelength region of 500–780 nm and in the temperature range of 26–130 K with extrinsic excitation source (λ_exc = 532 nm), and at T = 26 K with intrinsic excitation source (λ_exc = 406 nm). Three emission bands A, B and C centered at 514 nm (2.41 eV), 588 nm (2.11 eV) and 686 nm (1.81 eV), respectively, were observed for extrinsic excitation process. Variations in emission spectra have been studied as a function of excitation laser intensity in the 0.9‐183.0 mW cm^–2 range for extrinsic excitation at T = 26 and 50 K. Radiative transitions from the donor levels located at 0.03 and 0.01 eV below the bottom of the conduction band to the acceptor levels located at 0.81 and 0.19 eV above the top of the valence band were proposed to be responsible for the observed A‐ and C‐bands. The anomalous temperature dependence of the B‐band peak energy was explained by configurational coordinate model. From X‐ray powder diffraction and energy dispersive spectroscopic analysis, the monoclinic unit cell parameters and compositional parameters of Tl₄GaIn₃S₈ crystals were determined, respectively. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optical properties of thermally evaporated CdS thin films

CdS thin films of varying thicknesses were deposited on cleaned glass substrates at room temperature by thermal evaporation technique in a vacuum of about 2 x 10^‐5 torr. UV‐VIS spectra of the films were studied using the optical transmittance measurements which were taken in the spectral region from 300 nm to 1100 nm. The absorbance and reflectance spectra of the films in the UV‐VIS region were also studied. Optical constants such as optical band gap, extinction coefficient, refractive index, optical conductivity and complex dielectric constant were evaluated from these spectra. All the films were found to exhibit high transmittance (∼ 60 ‐ 93 %), low absorbance and low reflectance in the visible/near infrared region from ∼ 500 nm to 1100 nm. The optical band gap energy was found to be in the range 2.28 – 2.53 eV. All the films annealed at 300°C for 4 hours in vacuum (∼ 10^‐2 torr) showed a decrease in the optical transmittance with its absorption edge shifted towards the longer wavelength, leading to the result that the optical band gap decreases on annealing the films. Also, on annealing crystallinity of the films improves, resulting in decrease in the optical transmittance. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

A non-template hydrothermal route to uniform 3D macroporous films with switchable optical properties

Here we report the direct synthesis of long-range uniform 3D macroporous film on the surface of glass via a non-template strategy by reacting silica with a mixture solution of HCl and H₂O₂ under hydrothermal conditions. The size of macropores can be tuned from 1 μm to 7 μm by changing the hydrothermal temperature. Followed by the impregnation or release of water, the 3D porous films showed a high-contrast optical switchable property. The maximum optical transmittance modulation of these 3D porous films was up to 50% over the visible and near IR wavelength range. Furthermore, liquid-induced optical switching device were designed as a sandwich structure. The average transmittance of the device was varied between 62.3% (from 350 to 1100 nm) at the transparent state and 13.2% (from 350 to 1100 nm) at the opaque state, respectively. Such a wide modulation range of optical transmittance is suitable for application of this porous film to energy saving smart windows.     

The growth and spectroscopic characteristics of Ca3Y2(BO3)4:Er laser crystal

The Ca₃Y₂(BO₃)₄:Er³⁺ crystal with a size up to 20 mm×30 mm was grown by the Czochralski method. The absorption spectrum was measured and its absorption peaks were assigned to the corresponding transitions between the Er³⁺ energy levels. A broad emission spectrum from 1429.4 to 1662.8 nm was exhibited from 530 nm wavelength pumping. This crystal is promising as a tunable infrared laser crystal.     

反式二苯乙烯(TSB)的溶液法晶体生长

本文观测了TSB在苯甲醚等有机溶剂中的结晶习性,测定了相应的溶解度曲线和亚稳区.采用溶液降温法在50~30 ℃的温度范围内进行晶体生长,获得透明度好的厘米级TSB晶体.通过对所得晶体进行X射线粉末衍射、紫外-近红外透过光谱、吸收光谱和紫外荧光光谱等测试,表明:本实验使用的不同生长溶剂对TSB晶体结构不会产生影响,所得晶体在410~1000 nm波长范围内透过率不低于80;,而在200~360 nm范围内有吸收,在波长为272.8 nm的激发光作用下,得到较强的荧光峰,峰位为386 nm.     

Cd4BiO（BO3）3的生长与透过光谱（英文）

采用顶部籽晶法生长出了40×10×3 mm3和32×10×2 mm3的非线性光学晶体Cd4BiO(BO3)3。用XRD粉末衍射和热重-差示扫描量热仪确定了该晶体为同成分熔融晶体,熔点为897℃,在990℃以上开始分解。测量了晶体300～6500 nm的室温透过光谱,结果表明Cd4BiO(BO3)3晶体在750～2550 nm的透过率约为80%,紫外截止波长为395 nm。     

直流反应磁控溅射法制备ZnO: Zr透明导电薄膜

以Zn∶ Zr为靶材,利用直流反应磁控溅射法制备了ZnO∶ Zr透明导电薄薄膜.研究了沉积压强对ZnO∶ Zr薄膜形貌、结构、光学及电学性能的影响.实验结果表明所制备的ZnO∶ Zr为六方纤锌矿结构的多晶薄膜,具有垂直于衬底方向的c轴择优取向.沉积压强对ZnO∶ Zr薄膜的晶化程度、形貌、生长速率和电阻率影响很大,而对其光学性能如透光率、光学带隙及折射率影响不大.当沉积压强为2Pa时,ZnO∶ Zr薄膜的电阻率达到最小值2.0×10-3Ω ·cm,其可见光平均透过率和平均折射率分别为83.2％和1.97.     

Influence of annealing on the physical properties of filtered vacuum arc deposited tin oxide thin films

Tin oxide (SnO₂) thin films were deposited on UV fused silica (UVFS) substrates using filtered vacuum arc deposition (FVAD). During deposition, the substrates were at room temperature (RT). As-deposited films were annealed at 400 and 600 °C in Ar for 30 min. The film structure, composition, and surface morphology were determined as function of the annealing temperature using X-ray diffraction (XRD), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The XRD patterns of the SnO₂ thin films deposited on substrates at RT indicated that the films were amorphous, however, after the annealing the film structure became polycrystalline. The grain size of the annealed films, obtained from the XRD analysis, increased with the annealing temperature, and it was in the range 8-34 nm. The AFM analysis of the surface revealed an increase in the film surface average grain size from 15 nm to 46 nm, and the surface roughness from 0.2 to 1.8 nm, as function of the annealing temperature. The average optical transmission of the films in the visible spectrum was >80%, and increased by the annealing ∼10%. The films’ optical constants in the 250-989 nm wavelength range were determined by variable angle spectroscopic ellipsometry (VASE). The refractive indexes of as-deposited and annealed films were in the range 1.83-2.23 and 1.85-2.3, respectively. The extinction coefficients, k(λ), of as-deposited and annealed films were in the range same range ∼0-0.5. The optical energy band gap (E_g), as determined by the dependence of the absorption coefficient on the photon energy at short wavelengths, increased with the annealing temperature from 3.90 to 4.35 eV. The lowest electrical resistivity of the as-deposited tin oxide films was 7.8 × 10⁻³ Ω cm, however, film annealing resulted in highly resistive films.