MOCVD-InAs/GaSb DBR结构材料的特性研究

本研究采用MOCVD技术在GaSb衬底上制备InAs与GaSb交替生长层构成的分布布喇格反射镜(DBR)材料.由于InAs与GaSb材料晶格匹配良好,且折射率差较大,因此用这两种材料交替生长构成的DBR结构,在较低生长周期时即可获得较高的反射率.将其引入共振腔增强型红外探测器结构,做为共振腔的腔体,将大大改善器件性能,实现红外光的高灵敏度室温探测.根据多膜增反原理,膜层反射率随膜层周期增加而增加,理论计算结果显示InAs/GaSb DBR结构工作波长为2.4μm,周期为22时,膜层反射率即可高于80.11;.我们用扫描电子显微镜,X-ray射线衍射,反射光谱测量等分析手段,对InAs/GaSb DBR结构材料的物理性能进行表征.结果表明,我们已经成功获得高质量的晶格匹配的InAs、GaSb单晶薄膜,以及InAs/GaSb交替生长组成的不同周期的DBR结构材料.反射光谱测量显示,InAs/GaSb DBR反射率随膜层周期数增加而增加,当InAs/GaSb DBR周期数为22时,其反射率约为44.27;.     

GaAs基底TiO2/SiO2减反射膜的反射率性能分析

本文设计并制备了适用于砷化镓(GaAs)多结太阳电池的TiO2/SiO2双层减反射膜,通过实测反射谱来验证了理论设计的正确性。利用编程分析了TiO2、SiO2单层膜的厚度及其折射率对双层膜系反射率的影响。结果显示,在短波范围(300～600 nm),TiO2膜厚对反射率的影响要大于SiO2,而SiO2折射率对反射率的影响比TiO2大;在中波范围(600～900 nm),随着单层膜的厚度和折射率的增加,双层膜系反射率存在一个最小值,变化趋势是先降低,而随后增加。同时,计算结果得到SiO2和TiO2的最优物理膜厚分别为78.61 nm和50.87 nm,此时在短波段中心波长λ1=450 nm处最小反射率为0.0034%,在中波段中心波长λ2=750 nm处最小反射率为0.495%。采用电子束蒸发法在GaAs基底上淀积TiO2/SiO2双层膜,厚度分别为78 nm和50 nm。实测短波和中波相应的反射率极小值分别为0.37%和2.95%,与理论结果吻合较好。     

近红外宽带全方向反射镜的设计

研究了一维光子晶体的全方向反射镜.用传输矩阵法分析了影响全反镜全方向反射带带宽和位置的因素.利用带隙展宽理论,构建异质结构光子晶体,设计得到了近红外宽带全反射镜.比较发现,Te/SiO2构成的一维异质结构全向带反射特性优于TiO2/SiO2构成的一维异质结构,该反射镜TE偏振波的全方向反射带分布在近红外波段1 001 ～ 2999 nm范围内,TM偏振波的全向反射带分布在1001 ～2323 nm波段范围内,获得的反射率高于98;,而薄膜层数只需要20层.     

基于一维光子晶体陷光的超薄晶硅太阳电池光学结构优化

先选择增透膜、Ag底面反射镜和三角带型一维光子晶体结构作为超薄晶硅电池(有源层厚度为12μm)的陷光结构,然后利用有限差分频域法对这一陷光结构进行了优化,最后通过吸收光谱和光电流密度谱对优化的陷光结构性能进行了评估.计算表明:在300 nm≤A≤800 nm的波长范围内,优化陷光结构实现了Yablonovith陷光极限;在800 nm≤A≤1100 nm的波长范围内,该优化陷光结构的性能略低于Yablonovith陷光极限,但明显高于矩形条带式一维光子晶体陷光结构的陷光性能.     

入射角度对远红外与激光兼容伪装光子晶体特性的影响研究

利用薄膜光学理论中的特征矩阵法计算了所设计的光子晶体薄膜的反射光谱,利用镀膜法制备了光子晶体薄膜.同时进行了样品光谱曲线的测试,并对其在远红外波段的发射率进行了测试.测试结果表明,制备的光子晶体在10.6μm激光波长处的反射率较低,并且在除缺陷处的远红外波段的反射率较高,因此,可以实现远红外与10.6 μm激光兼容.但当入射角度的增加时,激光波长处的反射率有所上升,并向短波方向偏移;在除激光波长处的远红外波段的反射率也降低较多.因此,入射角度的增加对光子晶体兼容效果的影响逐渐增大.     

KTP晶体的水热法生长及其光学性能的测量

使用水热法成功生长出大尺寸、高质量的KTP晶体,对该晶体的光学性能进行测量分析.由LambDA900分光光度计测量得到的水热法生长KTP晶体的透过率曲线表明晶体具有良好的光透过性能,其透过短波下限与熔盐法生长的KTP晶体基本相当.利用自准直法精确测量水热法生长KTP晶体的折射率,拟合得到30℃下折射率的Sellmeier方程的系数,并计算532nm与1319nm波长对应的主轴折射率,计算值与实验值相吻合.     

水热法制备一维钛酸纳米材料及其在太阳光反射涂料中的应用研究

以微米级二氧化钛(P25)为原料,用水热法制备了一维纳米钛酸材料,分析了纳米钛酸的形貌、红外特性和晶体结构。并进一步对纳米钛酸作为太阳光反射涂料填料的效果进行了研究,其涂层在可见光波段(380～780 nm)范围平均反射率可达到76.15%,在红外波段(780～2500 nm)范围平均反射率可达47.34%。     

MOVPE生长AlAs/GaAs Bragg反射膜

采用常压金属有机物气相沉积法生长AlAs/GaAs周期性反射膜,并利用双晶X射线衍射、扫描电子显微镜和记录式分光光度计等分析手段,对材料结构及光学性质进行了分析.实验结果表明,在780℃连续生长的薄膜结构和晶体质量都很好,但是反射率低;通过模拟计算,连续生长存在渐变层,而渐变层大大降低了反射率;在同样生长条件下间断生长得到较高反射率的薄膜材料.     

YAlO3∶Ce晶体的生长及性能研究

本文采用中频感应提拉法生长了尺寸为ø35 mm×70 mm的完整的YAlO₃∶Ce(YAP∶Ce)晶体。XRD测试结果表明所生长的YAP∶Ce晶体主相为YAP相,同时存在第二相YAG相;光致激发发射光谱表明晶体发射波长在344 nm和376 nm,激发波长分别为273 nm、290 nm和305 nm;X射线激发发射光谱表明晶体发射波长在377 nm附近;在γ高能射线激发下,晶体衰减时间曲线呈指数衰减,拟合后得到YAP∶Ce晶体的衰减时间为46 ns,通过高斯拟合以后YAP∶Ce晶体的能量分辨率和绝对光产额分别为8.51%和8 530 ph/MeV。本文分析了晶体生长过程中产生开裂和相变的原因,通过优化温场和工艺可以得到完整无开裂的晶体。如何获得更大尺寸的无开裂、无相变晶体,并实现量产是该晶体规模化应用中需要解决的重要技术难题。     

磁控溅射ZrN薄膜的生长机理及光学性能

利用直流反应磁控溅射法在Si衬底上沉积了高结晶质量的氮化锆(ZrN)薄膜。采用X射线衍射仪(XRD)、场发射扫描电子显微镜(FE-SEM)、原子力显微镜(AFM)和光谱椭偏仪(SE)研究了沉积时间对ZrN薄膜结构、表面形貌和光学性能的影响。结果表明:所沉积薄膜均为NaCl结构的立方相ZrN,具有(111)面单一取向;沉积时间的增加提高了薄膜的结晶质量;ZrN薄膜的表面形貌、晶粒尺寸以及表面粗糙度随沉积时间发生变化,沉积45 min的薄膜表面出现致密的三角锥晶粒,且表面粗糙度最大,薄膜呈柱状生长。随后利用Extend Structure Zone Model解释了ZrN薄膜的生长机制,最后研究了ZrN薄膜的光反射特性,发现反射光谱与晶粒形状和表面粗糙度密切相关,表面具有三角锥状晶粒的薄膜,其反射谱在300~800 nm波长范围内存在振荡现象,相比于具有不规则晶粒形貌的薄膜其反射率明显下降。本文中研究的生长条件与晶体结构、微观形貌和光学性能之间的关系,可为器件中应用的ZrN薄膜最佳制备条件的优化提供重要的参考价值。     

HRTEM investigation of high-reflectance AlN/GaN distributed Bragg-reflectors by inserting AlN/GaN superlattice

A high-quality AlN/GaN distributed Bragg-reflectors (DBR) was successfully grown on sapphire substrate by low-pressure metal-organic chemical vapor deposition using ultra-thin AlN/GaN superlattice insertion layers (SLILs). The reflectivity of AlN/GaN DBR with ultra-thin AlN/GaN SLIL was measured and achieved blue peak reflectivity of 99.4% at 462 nm. The effect of ultra-thin AlN/GaN superlattice insertion layer was examined in detail by transmission electron microscopy, and indicated that the crack of AlN/GaN DBR can be suppress by inserting AlN/GaN SLIL. For electronic properties, the turn on voltage is about 4.1 V and CW laser action of vertical-cavity surface-emitting laser (VCSEL) was achieved at a threshold injection current of 1.4 mA at 77 K, with an emission wavelength of 462 nm.     

Highly reflective AlGaAsSb/InP Bragg reflector at 1.55 μm grown by MOVPE

The metalorganic vapor-phase epitaxy growth of a highly reflective 24-pair AlGaAsSb/InP-distributed Bragg reflector (DBR) is reported for the first time. The influence of the growth parameters such as the V/III input ratio, the growth temperature and the pressure, the total H₂ flow, the gas velocity and the switching sequence of the source gases at the interfaces has been deeply investigated and optimized to achieve stable growth conditions. The DBR achieves a reflectivity as high as 99.5% around 1.55 μm, a uniform stable composition, and an excellent crystal quality over the 2 inch wafer, with a surface free of crosshatch and a defect density below 1/cm². For the optical characterizations, measurements of linear and nonlinear reflectivity, transmission, pump-probe and photoluminescence were done. The interfaces and bulk layers of InP/AlGaAsSb/InP heterostructures were analyzed by transmission electron microscopy. High resolution X-ray diffraction measurements were used to determine the composition shift in the growth plane of the DBR. The measurements show the high quality of the growth and demonstrate that thick AlGaAsSb/InP heterostructures can be grown by metalorganic vapor-phase epitaxy (MOVPE), and in particular DBRs above 1.31 μm.     

Design and application of dielectric distributed Bragg back reflector in thin-film silicon solar cells

A dielectric distributed Bragg reflector (DBR) formed by four pairs of hydrogenated amorphous silicon/silicon nitride layers is used as the back reflector in thin-film silicon solar cells. The DBR was designed to perform in a broad wavelength range with the peak reflectance at 600 nm. The DBR was fabricated at low substrate temperature (172 °C) and applied at the rear side of flat and textured amorphous silicon single-junction solar cells in both superstrate (pin) and substrate (nip) configurations. The spectral response and electrical I–V characteristics were measured. Solar cells with optimized DBR exhibit an enhanced external quantum efficiency in the long wavelength range and the electrical performance is comparable to solar cells having conventional Ag back reflector.     

The reduction of the misfit dislocation in non-doped AlAs/GaAs DBRs

The non-doped AlAs/GaAs distributed Bragg reflectors (DBRs) with density of misfit dislocation (MD) close to zero had been obtained. The reduction of MD density was achieved by increasing temperature distribution homogeneity on the growing crystal in consequence of higher rotation rate of the wafer. Two structures of DBR were crystallized using molecular beam epitaxy (MBE) under the same optimal growth condition. The growth runs differ only in the rotation rate of the wafers. X-ray topograph showed no residual MDs in case of faster rotation. The DBR structure with residual MD density is still highly strained. No additional relaxation process has occurred, what was confirmed by an angular position of DBR zeroth-order peak on high-resolution X-ray diffractometry (HRXRD) rocking curve.     

InP/InGaAlAs distributed Bragg reflectors grown by low-pressure metal organic chemical vapor deposition

Long-wavelength vertical cavity surface emitting lasers (VCSELs) are considered the best candidate for the future low-cost reliable light sources in fiber communications. However, the absence of high refractive index contrast in InP-lattice-matched materials impeded the development of 1.3–1.5 μm VCSELs. Although wafer fusions provided the alternative approaches to integrate the InP-based gain materials with the GaAs/AlAs materials for their inherent high refractive index contrast, the monolithic InP-based lattice-matched distributed Bragg reflectors (DBRs) are still highly attractive and desirable. In this report, we demonstrate InP/InGaAlAs DBRs with larger refractive index contrast than InP/InGaAsP and InAlAs/InGaAlAs DBRs. The switching between InP and InGaAlAs layers and growth rate control have been done by careful growth interruption technique and accurate in situ optical monitoring in low-pressure metal organic chemical vapor deposition. A 35 pairs 1.55 μm centered InP/InGaAlAs DBRs has the stopband of more than 100 nm and the highest reflectivity of more than 99%. A VCSEL structure incorporating 35 pairs InP/InGaAlAs DBR as the bottom mirror combined with a 2λ thick periodic gain cavity and 10 pairs SiO₂/TiO₂ top dielectric mirrors was fabricated. The VCSELs lased at 1.56 μm by optical pumping at room temperature with the threshold pumping power of 30 mW.     

Fabrication of Multilayer Films on the Basis of Lysozyme Protein and Precipitant (Iodide and Potassium) Ions on a Silicon Substrate by the Modified Langmuir–Schaefer Method

Multilayer structures, consisting of successive lysozyme layers and layers of iodide and potassium ions, have been formed on a silicon substrate by the modified Langmuir–Schaefer method; the use of this technique implies preliminary preparation of a crystallization protein solution containing an oligomeric phase. The multilayer structure has been characterized by methods of X-ray reflectivity and total external reflection X-ray standing waves (TER XSW). The data obtained indicate the formation of a dense lysozyme film (3 nm thick) and layers of potassium and iodide ions, adjacent to this film.     

(La,Y)掺杂AlN的电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的平面波超软赝势方法对纯AlN、(La,Y)单掺杂以及La-Y共掺杂AlN 超胞进行几何结构优化,计算了稀土元素(La,Y)掺杂前后体系的能带结构、态密度和光学性质。结果表明:未掺杂的AlN是直接带隙半导体,带隙值为E_g=4.237 eV,在费米能级附近,态密度主要由Al-3p、N-2s电子轨道贡献电子,光吸收概率大,能量损失较大;掺杂后使得能带结构性质改变,带隙值降低,能带曲线变密集,总态密度整体下移;在光学性质中,稀土元素掺杂后均提高了静态介电常数、光吸收性能,增强了折射率和反射率,减小了电子吸收光子概率及能量损失;其中La-Y共掺体系变化得较为明显。     

不同形貌的纳米氧化锌粉的光学性能研究

本文采用水热和溶剂热法制备了粒状、棒状、片状、管状纳米氧化锌粉体,并对四种不同形貌的氧化锌粉的光学性能进行了对比研究.结果表明:氧化锌纳米粒,纳米片和纳米管在200~400 nm区域的反射率均低于8;,而氧化锌纳米棒在200~400 nm区域的反射率大约为18;.氧化锌纳米管对甲基橙的光催化降解效果最好,在距离30 cm 的30 W紫外灯条件下进行照射,8 h完全降解,而氧化锌纳米棒对甲基橙的光催化降解效果最差,在相同的实验条件下,氧化锌纳米棒的降解率仅为70;.     

Conduction mechanism for sputtered a-C:H based structures

Metal–insulator–metal (MIM) and metal–insulator–semiconductor (MIS) structures fabricated by magnetron sputtering deposition of insulating hydrogenated amorphous carbon are analyzed by measuring their current–voltage characteristics in order to find the conduction mechanism. For MIM structures, the linearity of the logarithmic dependencies between current density and electric field intensity (log J–log E) for higher fields indicate a space charge limited current (SCLC) conduction mechanism. The calculated values of the effective mobility are in agreement with other literature results. For MIS structures, the power-law dependence between current and voltage also indicate a space–charge limited currents based conduction mechanism.     

P和Al掺杂立方相Ca2Si电子结构及光学性质的第一性原理计算

采用基于密度泛函理论的第一性原理平面波超软贋势方法,分别计算了立方相Ca2Si及掺杂P、Al的电子结构和光学性质.结果表明:立方相Ca2Si是带隙为0.55483 eV的直接带隙半导体,价带主要由Si的3p和Ca的3d、4s态电子构成,导带主要由Ca 的3d、4s和Si的3p态电子共同构成,静态介电常数为11.92474,折射率为3.45322.Ca2Si掺P后,Ca2Si转变为n型半导体,其带隙值是0.42808 V,价带主要由Si、Al的3p和Ca的3d、4s态电子构成,导带主要由Ca的3d、Al的3p、3s和Si的3p态电子构成.静态介电常数为7.92698,折射率为2.81549.掺Al后, Ca2Si转变为n型半导体,带隙值是0.26317 eV,费米面附近的价带主要由Si、P的3p和Ca的3d态电子构成,导带主要由Ca的3d 4s、P的3p、3s和Si的3p态电子构成.静态介电常数为17.02409,折射率为4.12603.掺P和Al均降低Ca2Si的反射率,提高Ca2Si的吸收系数,提高Ca2Si的光利用率.说明掺杂能够有效地改变Ca2Si的电子结构和光学性质,为Ca2Si材料的研发和应用提供理论依据.