热退火对电子束蒸镀方法制备的ZnO:Al薄膜光电性质的影响

采用电子束蒸镀方法在Si(100)衬底上沉积了ZnO:Al(ZAO)薄膜.在氧气气氛下对ZnO:Al薄膜进行了退火处理,退火温度的范围为400～800℃.X射线衍射(XRD)图样表明所制备的ZnO:Al薄膜具有六方结构,为c轴(002)择优取向的多晶薄膜.用Van der Pauw法测量了ZAO薄膜的电学特性,结果显示其电导率在500℃达到最大值.测量了ZAO薄膜的室温微区光致发光和变温发光光谱,观测到了ZnO自由激子、束缚在中性施主中心(D0)上的束缚激子以及束缚在离化施主中心(D+0)上的束缚激子发射.     

透明导电薄膜与p-Si:H膜接触特性的研究

本实验采用PECVD方法在不同透明导电薄膜上沉积了p型掺杂(p-Si:H)膜.用拉曼(Raman)光谱测试了p-Si:H膜的晶化率,并用扫描电子显微镜(SEM)观察了其形貌.结果表明:在SnO2上沉积的p-Si:H膜的晶化率较其它两种衬底高,相应的SEM形貌显示颗粒尺寸也较大.通过I-V测试仪测试了ZnO:Al/p-Si:H、SnO2/p-Si:H和SnO2/ZnO:Al/p-Si:H的接触特性,结果显示ZnO:Al/p-Si:H的接触特性并不比SnO2/p-Si:H差.     

反应磁控溅射制备AZO薄膜相结构的演化及机理研究

在室温下,利用直流反应磁控溅射技术在不同的氧气流量下沉积ZnO∶ Al (AZO)薄膜.采用XRD、SEM和TEM技术分析薄膜相成分、表面截面形貌及微观结构.结果表明:氧气流量为2.5 sccm时,沉积形成的薄膜为不透明具有金属导电性能的AZO/Zn( AZO)双层复合膜结构;氧气流量为3.5 sccm时,沉积形成了透明导电的AZO薄膜;氧气流量为5.0 sccm时,形成了透明不导电且含有纳米Al2O3颗粒的AZO薄膜;此外,AZO薄膜在400℃退火后,薄膜晶粒长大和(002)晶面方向择优生长更加明显以及高氧气流量沉积的AZO薄膜中的纳米Al2O3颗粒消失.     

GaN衬底掺杂模式对ZnO纳米棒光学性质的影响

本文通过水热法在u-GaN(undoped GaN)/Al2 O3和p-GaN/Al2O3衬底上制备了ZnO纳米棒阵列.利用X射线衍射仪(XRD)、高分辨X射线衍射仪(HRXRD)、场发射扫描电子显微镜(FESEM)、原子力显微镜(AFM)和光致发光谱(PL)对样品进行表征,研究在无种子层和金属催化剂情况下u-GaN/Al2 O3和p-GaN/Al2O3衬底对ZnO纳米棒生长的影响.结果表明,在u-GaN和p-GaN上生长的ZnO纳米棒均为六方纤锌矿结构.在p-GaN上生长的ZnO纳米棒直径较细且密度更大,这可能是由于p-GaN界面比较粗糙,界面能量较大,为ZnO的生长提供了更多的形核区域;与生长在u-GaN上的ZnO纳米棒阵列相比,p-GaN上所沉积的ZnO纳米棒在378.3 nm处有一个较强的近带边发射峰,且峰强比较大,说明在p-GaN上所制备的ZnO纳米棒的晶体质量和光学性能更好.     

Al衬底取向与ZnO薄膜织构的关系

以发生了二次再结晶的高纯Al为衬底材料,采用射频磁控溅射法制备了ZnO薄膜.研究了溅射工艺及Al衬底取向对ZnO薄膜的影响,分析了Al衬底取向与ZnO薄膜织构的关系.结果显示,当溅射工艺恰当时,高纯Al衬底上可以制备出晶态ZnO薄膜,但Al衬底的取向对ZnO薄膜的结晶性具有更大的影响.Al衬底的轧面上主要为{100}面织构,沉积的ZnO薄膜主要是{0002}面织构和少量的{1120}面织构组分.     

Al2O3衬底上生长ZnO薄膜的结构和光学特性

用脉冲激光沉积法在Al2O3(0001)衬底上沉积了ZnO薄膜.衬底温度分别为300℃、400℃、500℃、600℃和700℃.利用X射线衍射(XRD)和光致发光谱(PL)对薄膜的结构和光学性能进行研究.X射线衍射的结果表明在不同温度下生长的ZnO薄膜均具有高度c轴择优取向,衬底温度400℃时,膜的应力较小质量较高.ZnO薄膜有很强的紫外发光峰,紫外发光峰的强度与衬底温度密切相关,并发现当衬底温度从300℃增到400℃时,紫外发射峰出现6nm的蓝移.     

衬底对宽带隙CGS薄膜的影响

分别在Al∶ ZnO(ZAO)薄膜和Mo薄膜两种不同衬底材料上,采用“三步法”共蒸发工艺沉积了约0.8 μm厚的CuGaSe2(CGS)薄膜,用X射线衍射仪测量薄膜的织构,研究不同衬底材料对CGS薄膜的影响.在ZAO薄膜底电极上沉积的CGS薄膜的(112)衍射峰强度较Mo薄膜底电极上减弱,(220/204)衍射峰反而增强.     

PET上沉积Al掺杂ZnO薄膜的光电特性研究

采用脉冲激光沉积技术(PLD),室温下在柔性衬底PET上制备了高度c轴择优取向的Al掺杂ZnO薄膜.XRD分析表明,不同Al掺杂浓度的样品均呈现单一的ZnO相.荧光光谱和透射光谱分析显示,低温低氧压下制备的Al掺杂ZnO薄膜在紫光区域有很强的荧光发射,在可见光区域具有较高的透射率;并且可以通过Al掺杂浓度调节薄膜紫色发光强度和薄膜带隙.薄膜的电阻率随着Al掺杂浓度的增加先降低后增加,在掺杂浓度为3;原子分数时达到最小值.     

O2/(O2+Ar)流量比对ZnO-0.25mol; V2O5薄膜缺陷类型的影响

利用射频磁控溅射技术在玻璃衬底上沉积ZnO-0.25mol; V2O5(ZnO∶V)薄膜,研究了O2/(O2+Ar)流量比(0;~87.5;)对ZnO∶V薄膜中缺陷的影响.研究结果表明:沉积的ZnO∶V薄膜为具有c轴取向的纤锌矿结构,V以五价和四价形式共存其中.ZnO∶V薄膜中的缺陷态为氧空位(VO)和间隙锌(Zni)杂化形成的复合体,两者比例随O2/(O2+Ar)流量比而变化.     

ZnO:Al透明导电薄膜的制备及其特性分析

采用射频磁控溅射工艺在玻璃衬底上制备出c轴择优取向的ZnO:Al(AZO)透明导电薄膜,靶材为AZO(2;质量分数Al2O3)陶瓷靶.对在不同溅射功率下沉积出来的薄膜运用X射线衍射(XRD)、可见光区透射谱、四探针方法分别进行结构和光电特性的表征.得出在200W下沉积的膜性能最好,可见光区平均透过率达到89;以上,电阻率最低为9.3×10-4Ω·cm.     

CsI-LiCl共晶材料的坩埚下降法生长与闪烁性能研究

本文采用坩埚下降法,在真空密封的石英坩埚中成功生长出CsI-LiCl与CsI-LiCl:Na共晶闪烁体。通过扫描电子显微镜(SEM)观察晶体微结构表明该共晶中LiCl相与CsI相存在周期性的层状排列,CsI相的厚度在5 μm左右。共晶样品的X射线激发发射谱显示在CsI-LiCl和CsI-LiCl:Na共晶样品存在缺陷发光,在CsI-LiCl样品中还观察到了纯CsI的自陷激子(STE)发光。CsI-LiCl样品在α粒子激发下的多道能谱中观察到明显的全能峰,这一结果证明CsI-LiCl共晶可用于热中子探测的潜力。     

静电纺丝法制备CeO2微纳米纤维及其除氟性能

以聚丙烯腈(PAN)为载体,六水合硝酸铈[Ce(NO₃)₃·6H₂O]为原料,采用静电纺丝法制备了Ce(NO₃)₃/PAN纤维,在空气中热处理得到CeO₂微纳米纤维,通过XRD、BET和SEM对CeO₂微纳米纤维进行表征。采用静态吸附实验探讨了CeO₂微纳米纤维去除水溶液中氟离子的性能,考察了溶液pH值、初始氟离子浓度及共存阴离子等对吸附性能的影响。结果表明,pH=3时,CeO₂微纳米纤维对F^-的吸附性能最佳,CeO₂吸附量随着F^-浓度的增大呈上升趋势。CeO₂微纳米纤维对F^-的吸附等温线遵循Langmuir模型,二级动力学模型能很好地描述CeO₂微纳米纤维对F^-的吸附过程。CeO₂微纳米纤维的除氟性能优良,可为其实际应用提供理论参考。     

X-ray analysis of sideroxol from <Emphasis Type="Italic">Sideritis leptoclada</Emphasis>

Sideroxol (1), a kaurane diterpene which has the ent-7α,18-dihydroxy-15β,16β-epoxykaurane structure (MW = 320.47, C₂₀H₃₂O₃) was obtained from the acetone extract of Sideritis leptoclada plant as well as from some other Sideritis species. It crystallizes in the orthorhombic space group P2₁, 2₁, 2₁ with a = 10.967(3), b = 24.555(5), c = 6.372(4) Å, Dc = 1.240 g cm⁻³, Z = 4, and refines to R = 0.065 for 721 independent reflections. The skeleton consists of three fused six-membered rings and a five-membered ring with fused epoxide. The six membered rings exhibited slightly distorted chair conformation. In addition to sideroxol, two kaurane and five kaurene diterpenes were isolated from the hexane and acetone extracts of the studied plant.     

Photoluminescence characteristics of Mg- and Si-doped GaN thin films grown by MOCVD technique

We have studied the optical, structural and surface morphology of doped and undoped GaN thin films. The p- and n-type thin films have been successfully prepared by low-pressure MOCVD technique by doping with Mg and Si, respectively. The different carrier concentrations were obtained in the GaN thin films by varying dopant concentrations. Photoluminescence (PL) studies were carried to find the defect levels in the doped and undoped GaN thin films at low temperature. In the undoped GaN thin films, a low intensity and broad yellow band peak was observed. The donor–acceptor pair (DAP) emission and its phonon replicas were observed in both the Si or Mg lightly doped GaN thin films. The dominance of the blue and the yellow emissions increased in the PL spectra, as the carrier concentration was increased. The XRD and SEM analyses were employed to study the structural and surface morphology of the films, respectively. Both the doped and the undoped films exhibited hexagonal structure and polycrystalline nature. Mg-doped GaN thin films showed columnar structure whereas Si-doped films exhibited spherical shape grains.     

New zeotype borophosphates with chiral tetrahedral topology: (H)0.5M1.25(H2O)1.5[BP2O8]·H2O (M = Co(II) and Mn(II))

Two new isostructural open‐framework zeotype transition metal borophosphate compounds, (H)_0.5M_1.25(H₂O)_1.5[BP₂O₈]·H₂O (M = Co(II) and Mn(II)) were synthesized by mild hydrothermal method. The structure of compounds were characterized by single‐crystal X‐ray diffraction which have ordered, alternating, vertex‐sharing BO₄, PO₄, and (MO₄)OM(H₂O)₂ groups with hexagonal, P 6₁ 2 2 (No 178) space group and unit cell parameters for Co a = 9.4960(6) Å, c = 15.6230(13) Å, for Mn a = 9.6547(12) Å, c = 15.791(3) Å, Z = 1 for both of them. TGA/DTA analysis, IR spectroscopy were used for characterization. Magnetic susceptibility measurements for both of the compound indicate strong antiferromagnetic interaction between metal centers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Solubility of Ag2O into the Na2O–B2O3–Al2O3 system

The solubility of Ag₂O was measured for the Na₂O–B₂O₃ and Na₂O–B₂O₃–Al₂O₃ system with the rotating crucible method and static method, respectively, under air atmosphere at temperatures ranging from 1273 to 1423 K. The contamination of melts from crucibles could be avoided by the rotating crucible method, with which it became possible to measure the solubility of Ag₂O for the Na₂O–B₂O₃ system above the melting point of Ag for the first time. It was found that the addition of Na₂O decreases the solubility of Ag₂O while the addition of Al₂O₃ had little effect on the solubility. The effect of Na₂O and Al₂O₃ on the solubility of Ag₂O is expressed by interaction coefficients and is analyzed in terms of the basicity of melts. The solubility of Ag₂O in Na₂O–B₂O₃–Al₂O₃ melts increased with increased temperature. This phenomena was explained by a small enthalpy change in oxidation of silver.     

Considerations on the structure and physical properties of B2O3-SiO2 and GeO2-SiO2 glasses

Data of density, refractive index and thermal expansion coefficient for B₂O₃-SiO₂ and GeO_2-SiO₂ glasses have been analyzed. The volumes of the structural units are the same found for the vitreous B₂O₃, GeO₂ and SiO₂. The volume of any structural unit is constant over the entire composition region of the glass system. The same has been found for the differential refraction and unit refraction of the structural units in these glasses. Different features are observed for the differential expansion of the structural units. There is a considerable change with composition in the differential expansion of BO₃, GeO₄ and SiO₄ units. The effect is attributed to a change in the asymmetry of vibrations with the number of Si-O-B or Si-O-Ge linkages in the matrix. The thermal expansion coefficient is mainly determined by the contribution of B₂O₃ or GeO₂ in the concerned glasses.     

Molecular structure and crystal packing of uncomplexed 1,6-bis(N-cyano-p-methoxy-anilino)-2,4-hexadiyne, C22H18N4O2

The X-ray crystal structure of 1,6-bis(N-cyano-p-methoxy-anilino)-2,4-hexadiyne, C₂₂H₁₈N₄O₂, is determined. The crystal packing is dominated by phenyl stacking interactions. Weak C–H···N hydrogen bonds help align the molecules. C–H··· hydrogen bonding is not apparent.     

Structural and electrical properties of vapour phase grown Cd1 − xFexTe single crystals

Cd_1 − xFe_xTe single crystals were prepared by vapour phase growth method in the composition range of 0 ≤ x ≤ 0.03. Chemical analysis, surface morphology, structural investigations and electrical properties were carried out by EDAX, SEM, XRD, TEM and transport technique, respectively. Microscopic variations between the target and actual compositions were noticed. Morphology studies revealed that dislocation aided growth is active in the present crystals. TEM and XRD studies confirmed that the samples of all compositions crystallized in zinc blende structure, and the lattice parameters varied almost linearly decreases with Fe content. At room temperature, the resistivity of the Cd_1 − xFe_xTe crystals of all compositions (x = 0.01, 0.015, 0.02, 0.025 and 0.03) lies in the range of 3.5-6.5 M Ω, the activation energies lie in the range of 63-133 meV, and the samples were show the ‘p’ type conductivity.     

空位浓度对纤锌矿CdS电子结构和光学性质影响的第一性原理研究

本文基于密度泛函理论的平面波超软赝势方法,采用第一性原理研究了含Cd空位缺陷CdS和含S空位缺陷纤锌矿CdS的几何结构、能带结构、电子态密度及光学性质。通过计算分析可知,含Cd空位缺陷的CdS体系均为p型半导体,含S空位缺陷的CdS体系跃迁方式均由直接跃迁变为间接跃迁。Cd、S空位缺陷的CdS体系的态密度总能量降低。空位CdS体系相较于本征CdS体系的静介电常数均有提高,并随着空位浓度的增大而增大,Cd空位缺陷体系更为明显,极化能力得到显著提升。空位Cd的CdS体系相较于本征CdS体系在红外波段存在明显的吸收,空位S的CdS体系相较于本征CdS体系在可见光波段存在明显的吸收。