引入Si掺杂层调控InGaAs/GaAs表面量子点的光学特性

在InGaAs/GaAs表面量子点(SQDs)的GaAs势垒层中引入Si掺杂层,以研究Si掺杂对InGaAs/GaAs SQDs光学特性的影响。荧光发光谱(PL)测量结果显示,InGaAs/GaAs SQDs的发光强烈依赖于Si掺杂浓度。随着掺杂浓度的增加, SQDs的PL峰值位置先红移后蓝移; PL峰值能量与激光激发强度的立方根依赖关系由线性向非线性转变;通过组态交互作用方法发现SQDs的PL峰位蓝移减弱;时间分辨荧光光谱显示了从非线性衰减到线性衰减的转变。以上结果说明Si掺杂能够填充InGaAs SQDs的表面态,并且改变表面费米能级钉扎效应和SQDs的荧光辐射特性。本研究为深入理解与InGaAs SQDs的表面敏感特性关联的物理机制和载流子动力学过程,以及扩大InGaAs/GaAs SQDs传感器的应用提供了实验依据。     

Photoluminescence of Si nanocrystallites in different types of matrices

This paper presents the comparative investigation of photoluminescence (PL) and its temperature dependence for rf-magnetron co-sputtered Si-enriched SiO_x systems and amorphous Si films prepared by hot-wire CVD method with Si nanocrystallites of different sizes. It is shown that PL spectra of Si–SiO_x films consist of the five PL bands peaked at 1.30, 1.50, 1.76, 2.05 and 2.32 eV. Amorphous Si films with Si nanocrystallites are characterized by three PL bands only peaked at 1.35, 1.50 and 1.76 eV. The peak position of the 1.50 eV PL band shifts with the change of Si quantum dot sizes and it is attributed to exciton recombination inside of Si quantum dots. The nature of four other PL bands is discussed as well.     

Influence of Si doping on the optical and structural properties of InGaN films

Influence of Si doping on the optical and structural properties of InGaN epilayers with different Si concentrations was investigated in detail by means of high-resolution X-ray diffraction (HRXRD), scanning electron microscope (SEM), Cathodoluminescence (CL) and photoluminescence (PL). It was found that a small amount of Si doping in InGaN could enhance luminescence intensity, improve the crystal quality of InGaN and suppress the formation of V-defects in InGaN. Further investigation by CL showed that V-defects act as nonradiative center, which lower the luminescence efficiency of InGaN. Based on above-mentioned results, one possible mechanism of influence of Si doping on the formation of V-defects in InGaN was also proposed in this paper.     

Cu掺杂对ZnO基薄膜光学及磁学性能影响

本文采用脉冲激光沉积(PLD)方法在单晶Si(100)衬底上沿c轴方向生长出单晶ZnCoAlO薄膜,并通过加镀Cu层调节薄膜的光学和磁学特性.采用X射线衍射仪(XRD),光致发光光谱仪,振动样品磁强计(VSM)和霍尔效应仪对薄膜的结构、光学和磁学性能进行了研究.实验表明,样品均具有纤锌矿结构并沿(002)面择优生长.加镀Cu层之后,薄膜紫外发光得到增强,掺杂导致薄膜ZnO晶格能带间隙变宽,并使得近带边激子发光增强.同时发现,在室温下Cu离子对薄膜磁性和电子浓度产生影响,Cu掺杂可以改变薄膜中载流子浓度,并影响原有磁性的双交换机理.     

Properties of self-assembled InAs quantum dots grown by various growth techniques

The properties of self-assembled InAs quantum dots (QDs) grown by molecular beam epitaxy on GaAs substrates were investigated. The surface properties of samples were monitored by reflection high-energy electron diffraction to determine growth. Photoluminescence (PL) and transmission electron microscope (TEM) were then used to observe optical properties and the shapes of the InAs-QDs. Attempts were made to grow InAs-QDs using a variety of growth techniques, including insertion of the InGaAs strained-reducing layer (SRL) and the interruption of In flux during QD growth. The emission wavelength of InAs-QDs embedded in a pure GaAs matrix without interruption of In flux was about 1.21 μm and the aspect ratio was about 0.21. By the insertion InGaAs SRL and interruption of In flux, the emission wavelength of InAs-QDs was red shifted to 1.37 μm and the aspect ratio was 0.37. From the PL and TEM analysis, the properties of QDs were improved, particularly when interruption techniques were used.     

Characterization of InAs quantum dots on lattice-matched InAlGaAs/InP superlattice structures

Self-assembled InAs quantum dots (QDs) in an InAlGaAs matrix, lattice-matched to InP substrate, have been grown by molecular beam epitaxy (MBE). Transmission electron microscopy (TEM), double-crystal X-ray diffraction (DCXRD) and photoluminescence (PL) are used to study their structural and optical properties. In InAs/InAlGaAs/InP system, we propose that when the thickness of InAs layer deposited is small, the random strain distribution of the matrix layer results in the formation of tadpole-shaped QDs with tails towards random directions, while the QDs begin to turn into dome-shaped and then coalesce to form islands with larger size and lower density to release the increasing misfit strain with the continuous deposition of InAs. XRD rocking curves showing the reduced strain with increasing thickness of InAs layer may also support our notion. The results of PL measurements are in well agreement with that of TEM images.     

Comparative study of electroluminescence from annealed amorphous SiC single layer and amorphous Si/SiC multilayers

Si quantum dots (Si QDs) films were prepared by annealing amorphous SiC single layer and amorphous Si/SiC multilayers fabricated in plasma enhanced chemical vapor deposition system. The microstructures were characterized by Raman spectroscopy as well as Fourier transforms infrared spectroscopy for both samples. It was found that Si QDs with average size of 2.7 nm were formed after annealing and the electroluminescence (EL) band centered at 650 nm can be observed at room temperature. The EL intensity from the Si/SiC multilayers was obviously improved by one order of magnitude and the corresponding EL band width was reduced compared with that from SiC single layer film. The improved electroluminescence behavior can be attributed to the formation of the denser Si QDs, good size distribution and the strong confinement effect of carriers in multilayerd structures.     

Characterization of thin‐film a‐Si:H/µc‐Si:H tandem solar cells on glass substrates

Techniques, such as photoluminescence (PL) and electron‐beam‐induced current (EBIC), have already proven their effectiveness and applicability for solar materials. Although, the methods are standard techniques for multicrystalline Si PV, their application to thin films is challenging and requires special adjustment and a careful selection of the measuring parameters. Here we report on the investigation of thin‐film tandem solar cells consisting of hydrogenated amorphous (a‐Si:H) and microcrystalline silicon (µc‐Si:H) on glass substrates. We observe a homogeneous spatial distribution of the PL signals caused by the dominance of the surface recombination. A typical PL spectrum exhibits sub‐band gap features of a‐Si:H. We relate the sub‐band‐gap spectral features mainly to transitions of carriers trapped in deep states. Observations on partially processed stacks support this supposition. PL is only detectable on the a‐Si:H layer, while EBIC signal is generated mainly in the µc‐Si:H layer. It is found out that the luminescence features of the thin a‐Si:H layer resemble those on bulk a‐Si:H.     

Strong and stable red photoluminescence from porous silicon prepared by Fe-contaminated silicon

Strong red photoluminescence (PL) spectra appeared at porous silicon (PS) samples prepared by a chemical anodization of Fe-contaminated Si substrates. The Fe1000 sample with Fe contamination of 1000 ppb showed a ten times stronger red PL than that of the reference PS sample without any Fe contamination, and this sample also showed the higher thermal stability for PL spectra as compared with the reference PS sample. Furthermore, the PL intensity from the PS with Fe contamination is linearly proportional to the Fe-related trap concentrations of Si substrates obtained from DLTS. Especially, all the PS samples exhibit the same PL peak position regardless of Fe contamination concentrations, as compared with that of the reference PS. This means that there is no significant effect such as the variation of size distribution of nanocrystalline Si in PS layer formed on Fe-contaminated Si substrate. Based on the results of PL and DLTS, we found that the PL efficiency depends strongly on the Fe-related trap concentration in Si substrates.     

p-ZnO薄膜及其异质结的光电性质

采用射频磁控溅射法,在不同的Ar∶O2条件下,以高掺磷n型Si衬底为磷掺杂源制备了p型ZnO薄膜和p-ZnO/n-Si异质结.对ZnO∶P薄膜进行了光致发光谱(PL)、霍尔参数、Ⅰ-Ⅴ特性、扫描电镜(SEM)和X射线衍射谱(XRD)等测试.结果表明,获得的ZnO∶P薄膜沿(0002)晶面高取向生长,以3.33 eV近带边紫外发光为主,伴有2.69 eV附近的深能级绿色发光峰,空穴浓度为8.982 × 1017/cm3,空穴迁移率为9.595 cm2/V·s,p-ZnO/n-Si异质结I-V整流特性明显,表明ZnO∶P薄膜具有p型导电特性.     

Photoluminescence characteristics of Mg- and Si-doped GaN thin films grown by MOCVD technique

We have studied the optical, structural and surface morphology of doped and undoped GaN thin films. The p- and n-type thin films have been successfully prepared by low-pressure MOCVD technique by doping with Mg and Si, respectively. The different carrier concentrations were obtained in the GaN thin films by varying dopant concentrations. Photoluminescence (PL) studies were carried to find the defect levels in the doped and undoped GaN thin films at low temperature. In the undoped GaN thin films, a low intensity and broad yellow band peak was observed. The donor–acceptor pair (DAP) emission and its phonon replicas were observed in both the Si or Mg lightly doped GaN thin films. The dominance of the blue and the yellow emissions increased in the PL spectra, as the carrier concentration was increased. The XRD and SEM analyses were employed to study the structural and surface morphology of the films, respectively. Both the doped and the undoped films exhibited hexagonal structure and polycrystalline nature. Mg-doped GaN thin films showed columnar structure whereas Si-doped films exhibited spherical shape grains.     

Mn掺杂半金属铁磁体Fe2Si电磁特性的第一性原理计算

采用基于密度泛函理论第一性原理的贋势平面波方法,计算了不同比例Mn掺杂Fe2-xMnxSi体系的电子结构和磁学特性,分析了不同比例Mn掺杂对Fe2-xMnxSi体系电磁特性的影响.计算结果表明:不同比例Mn掺杂Fe2-xMnxSi体系是铁磁体,自旋向上的能带结构穿过费米面表现金属特性,未掺杂Fe2Si的半金属隙为0.164eV;掺杂比例为8.3;时,自旋向下部分转变为L间的直接带隙半导体,Fe2-xMnxSi(x=0.17)体系呈现半金属特性;掺杂比例为12.5;时,自旋向下部分转变为A间的直接带隙半导体,Fe2-xMnxSi(x=0.25)体系呈现半金属特性;掺杂比例为25;时,自旋向下部分的带隙值接近于0,Fe2-xMnxSi(x=0.5)体系呈现金属特性.Mn掺杂使Fe2-xMnxSi体系的能带结构和电子态密度向低能方向移动,费米能级落入自旋向下的禁带之中,使得自旋极化率达到100;.Fe2-xMnxSi体系的半金属性和磁性主要来源于Fe-3d电子与Mn-3d电子之间的d-d交换,Si-3p电子与Fe-3d电子之间的p-d杂化.这些结果为半金属铁磁体Fe2Si的电磁调控提供了有效的理论指导.     

Properties of Co‐doped ZnO films prepared by electrochemical deposition

We prepared Co‐doped ZnO films by the electrochemical deposition. X‐ray diffraction (XRD), high resolution transmission microscopy (HRTEM), x‐ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), x‐ray absorption near‐edge structure (XANES), vibrating sample magnetometer (VSM), optical absorption, and photoluminescence (PL) measurements were carried out on the samples. The results showed Co atoms substituted Zn atoms in the ZnO lattice without the formation of the impurity phase. VSM measurements showed the ferromagnetic properties for the Co‐doped ZnO samples. When the Co doping concentration increased, the band gaps were widened and the PL peak positions shifted towards the short wavelength direction. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Structural and photoluminescence characteristics of molecular beam epitaxy-grown vertically aligned In0.33Ga0.67As/GaAs quantum dots

In this paper, we present the results of structural and photoluminescence (PL) studies on vertically aligned, 20-period In_0.33Ga_0.67As/GaAs quantum dot stacks, grown by molecular beam epitaxy (MBE). Two different In_0.33Ga_0.67As/GaAs quantum dot stacks were compared. In one case, the In_0.33Ga_0.67As layer thickness was chosen to be just above its transition thickness, and in the other case, the In_0.33Ga_0.67As layer thickness was chosen to be 30% larger than its transition thickness. The 2D–3D growth mode transition time was determined using reflection high-energy electron diffraction (RHEED). Structural studies were done on these samples using high-resolution X-ray diffraction (HRXRD) and cross-sectional transmission electron microscopy (XTEM). A careful analysis showed that the satellite peaks recorded in X-ray rocking curve show two types of periodicities in one sample. We attribute this additional periodicity to the presence of an aligned vertical stack of quantum dots. We also show that the additional periodicity is not significant in a sample in which the quantum dots are not prominently formed. By analyzing the X-ray rocking curve in conjunction with RHEED and PL, we have estimated the structural parameters of the quantum dot stack. These parameters agree well with those obtained from XTEM measurements.     

High-density carrier dynamics in Ge/Si quantum dots studied by time-resolved photoluminescence spectroscopy

We studied the temperature dependence of high-density carrier dynamics in as-grown and thermally annealed Ge quantum dots (QDs) in silicon crystals. In as-grown and thermally annealed samples, photoluminescence (PL) intensity exhibited a power-law dependence on the excitation intensity and its power-law index was ~ 0.7 at low temperatures. With increasing measurement temperature, PL intensity decreased and the index of the power-law function increased up to ~ 1.5, in which carrier recombination dynamics is dominated by a single carrier trapping. Moreover, in thermally annealed QDs, the index of the power law increased more rapidly than as-grown QDs, suggesting that the carrier recombination dynamics drastically changed in thermally annealed QDs. Effects of Ge/Si interface on high-density carrier recombination process are discussed.     

Transient photoconductivity studies of band tails states in compensated a-Si:H

The density of conduction band tail states has been determined for a series of compensated a-Si:H films using transient photoconductivity measurements. Relative to undoped material, the energy width of shallow tail states lying within 0.45 eV of the conduction band edge are found to be insensitive to the level of compensated doping for doping levels up to 1000 vppm. An observed reduction in photocurrent magnitude as the doping is increased is consistent with a corresponding reduction in the electron extended state mobility. The magnitude of the mobility reduction is found to be quantitatively consistent with potential fluctuations which arise from ionized dopants for compensated doping levels up to about 100 vppm.     

不同形貌氮化硅纳米结构的制备与表征

分别通过VLS和VS生长机制得到了Si3N4纳米线和纳米带.产物经X射线衍射(XRD)、扫描电镜(SEM)、透射电镜(TEM)等表征手段进行了分析.FTIR图谱表明它们在800～1100cm-1的波数范围内有一个宽的吸收带,这是Si-N键伸缩振动模式的典型吸收带.它们的室温光致发光图谱显示,在420nm左右都有一很强的发射带,表明其将在纳米光电器件中有潜在应用.另外,Si3N4纳米线发光峰与纳米带的发光相比有少许蓝移(蓝移约4nm),这可能和晶须尺寸的少许差别有关.至于纳米带的发光强度大于纳米线的原因,可能是纳米带的比表面积相对较大,有利于悬键的形成,从而导致材料结构内缺陷的浓度较大.     

Atomic-scale controlled incorporation of ultrahigh-density Si doping sheets in GaAs

Delta-doped GaAs:Si with doping densities up to 4×10¹⁴ cm⁻² has been grown by molecular beam epitaxy (MBE) at a substrate temperature of 590°C. To promote an ordered incorporation and thus avoid clustering of Si atoms, vicinal GaAs(001) surfaces 2° misoriented towards (111)Ga were used and Si was supplied in pulses. As evidenced by real-time reflection high-energy electron diffraction (RHEED) measurements an ordered incorporation of Si atoms on Ga sites along the step edges takes place. Although the ordered (3×2) structure degrades at high coverages, unusual high sheet carrier concentrations are obtained by pulsed delta-doping for doping concentrations >10¹³ cm⁻², as revealed by Hall measurements. The surface conditions during GaAs overgrowth have a strong influence on the free electron concentration, too. Raman scattering by local vibration modes and secondary ion mass spectrometry (SIMS) measurements are used to show that this is related to segregation effects as well as to a modification of the site occupancy.     

Photoluminescence of Si or Ge nanocrystallites embedded in silicon oxide

This paper presents the results of photoluminescence, its temperature dependence and Raman scattering investigations on magnetron co-sputtered silicon oxide films with (or without) embedded Si (or Ge) nanocrystallites. It is shown the oxide related defect origin of the visible PL centers peaked at 1.7, 2.06 and 2.30 eV. The infrared PL band centered at 1.44–1.58 eV in Si–SiO_x, system has been analyzed within a quantum confinement PL model. Comparative PL investigation of Ge–SiO_x system has confirmed that high energy visible PL bands (1.60–1.70 and 2.30 eV) are connected with oxide related defects in SiO_x. The PL band in the spectral range of 0.75–0.85 eV in Ge–SiO_x system is attributed to exciton recombination inside of Ge NCs.     

Photoluminescence in silicon/silicon oxide films produced by the Pulsed Electron Beam Ablation technique

In this work we report studies of the photoluminescence emission in samples based on Si/SiO_x films deposited by the Pulsed Electron Beam Ablation (PEBA) technique. The samples were prepared at room temperature using targets with different Si/SiO₂ concentrations. The samples were characterized using X-ray Absorption Edge Spectroscopy (XANES) at the Si―K edge, Raman spectroscopy, Photoluminescence (PL) and X-ray Photoelectron Spectroscopy (XPS). The concentration of a-Si and nc-Si in the film was dependent on the silicon concentration in the target. It was also observed that the PL is strongly dependent on the structural amorphous/crystalline arrangement.