空间薄膜阵面结构褶皱的实验研究

阵面薄膜上的褶皱会显著影响航天器性能,褶皱控制也是薄膜航天器研发的难点。本文采用白光扫描技术,测试了一个正方形薄膜阵面结构在纯剪切作用下的褶皱特性。测试结果显示,随着剪切力的增大,结构膜面褶皱数增加,褶皱幅度增大,膜面平整度降低。随着膜面预应力的增大,膜面上的褶皱数略有增大,褶皱幅度有所减小,膜面平整度有所提高。测试结果还显示,膜面上粘结缝的存在、以及粘结缝与剪切力间的方位关系对膜面褶皱有复杂的影响。论文所得结论对薄膜阵面结构设计研发具有参考价值。     

曲面薄膜结构褶皱失稳力学

薄膜结构褶皱失稳在微观和宏观尺度会出现相似的形貌, 在过去二十年里引发了学者们极大的研究兴趣. 而几何曲率对薄膜结构的失稳临界、形貌选择和后屈曲演化起着至关重要的作用. 本文回顾近二十年来平面和曲面薄膜结构褶皱失稳力学研究进展, 聚焦曲率影响下的薄膜拉伸和膜基结构在各种激励下的稳定性问题. 有限应变板壳理论模型和数值计算方法的发展推动了对曲率影响下薄膜结构表面形貌多重分岔转变的定量理解、预测和追踪, 不仅推进了对薄膜结构失稳机理的深入理解, 也为抑制褶皱或利用失稳实现多功能表面制造提供了理论基础, 可促进拓扑形貌相关的功能性膜结构的设计及优化.      

边界膜剪切弹性模量对于微接触性能的影响

建立接触模型,理论分析了微接触中边界膜剪切弹性模量对于接触性能的影响. 接触区由两平行平面形成,属一维接触. 上接触表面为粗糙表面,具有矩形微凸体. 下接触表面为光滑平面. 两接触表面均处理成刚性表面. 微接触区中充满流体. 它分成两个子区,在微接触的出口区由于极小的接触间隙充满边界膜,在微接触的入口区由于接触间隙较大充满流体膜. 边界膜和流体膜行为决定整个微接触性能. 当膜厚较大时,这里边界膜可看成纳米级薄膜. 由于上接触表面处有限的剪应力承受能力,边界膜可于上接触表面滑移. 设下接触表面处剪应力承受能力很大而边界膜在下接触表面不滑移. 由于边界膜-接触表面间相互作用,边界膜黏度、密度和剪切弹性模量均沿膜厚变化,在理论分析中使用它们的等效值,这些值与边界膜厚度有关. 流体膜在两个接触表面均不发生滑移,分析中不考虑流体膜剪切弹性模量. 流体膜采用传统分析法. 给出了理论分析和若干变工况参数下的计算结果.      

空间薄膜结构的褶皱研究进展

大型柔性薄膜结构是目前国际上十分关注的可满足多项空间任务需要的新型空间结构. 由于薄膜材料柔性且抵抗压缩应力作用的能力十分有限, 因此这些空间结构在轨时多处于带有褶皱的工作状态. 褶皱的存在会改变结构的力学性能且会影响结构表面形状, 因此开展薄膜褶皱研究对柔性结构的设计和力学性能评价等具有重要意义. 本文综述了空间薄膜结构褶皱研究的发展和现状, 重点介绍了薄膜褶皱的理论研究概况, 并讨论了其中存在的问题.根据褶皱研究的最新进展对其未来的发展趋势进行了展望.      

空间薄膜结构褶皱的数值模拟最新研究进展

褶皱问题是高精度空间薄膜结构最关心的问题之一, 它是影响薄膜结构形面精度的关键因素. 由于薄膜结构褶皱机理的复杂性, 该问题一直没能得到很好的解决, 人们对褶皱的认识, 目前主要是通过试验观察和数值模拟等方法. 本文综述了空间薄膜结构褶皱数值研究的发展和现状, 并对其中重要的和被广泛采纳的方法进行了重点介绍和评述. 最后对褶皱数值分析方法所面临的问题及其发展趋势作了初步展望.      

空间充气薄膜结构的褶皱分析

引入一个表征褶皱在纹理方向收缩特性的参数``收缩系数'来替代泊松比参与计算褶皱形变,并联合褶皱产生时的应力条件和褶皱特性,实现了对空间充气薄膜结构的褶皱分析,得到了褶皱存在时的充气薄膜结构的应力场和变形. 分析中重点讨论了``收缩系数'与泊松比的关系,并讨论了引入``收缩系数'约束变形后的变形协调条件. 将两维的褶皱分析方法拓展应用到三维充气结构的褶皱分析中,分析了充气管的弯皱变形,得到了临界皱曲和极限弯矩随结构及力学参数的变化规律. 通过简单的褶皱试验,定性地分析了褶皱的形变特性并与分析结果进行了比较验证,结果一致.      

对角受拉方膜褶皱变形幅值的理论预测及实验验证

柔性薄膜结构广泛应用于航天飞行器的关键部件.形面平整度是影响薄膜结构性能的主要因素之一.褶皱幅值是评价薄膜反射面天线形面平整度的重要指标.褶皱幅值的大小与垂直于褶皱方向的横向应变密切相关.本文基于薄板稳定性理论,针对对角受拉方形薄膜建立了一个能够准确预测其褶皱变形幅值的理论模型.该模型考虑了横向拉伸力对薄膜变形的影响,将垂直于褶皱方向的位移分解为由泊松效应造成的横向收缩位移、由面外变形造成的褶皱位移以及由横向拉伸力造成的拉伸位移三个部分,重新推导了褶皱幅值的理论公式. 基于数字图像相关技术,对受拉方形薄膜进行了散斑实验测试. 利用双目视觉三维测量系统,测量了方形薄膜的三维位移场, 获得了薄膜的三维变形形貌和褶皱波形图,研究了褶皱幅值与拉伸载荷之间的非线性关系. 与已有理论模型相比,该模型进一步提高了褶皱幅值的计算精度, 与实验结果吻合良好.本文呈现的理论研究可为精确数值模型的建立及算法实现提供有意义的指导.      

空间薄膜结构的褶皱形变预测

空间充气结构技术是一项全新的空间结构构建技术,基于该技术的空间充气结构是未来空间任务的主要需求对象．该结构主要由薄膜构成,因此结构形面精度的保持是关键问题．褶皱是薄膜特有的现象,它的存在会严重影响结构形面精度,因此进行褶皱研究很有必要．根据屈曲理论联合薄膜褶皱的实际构型建立了薄膜结构褶皱的预测模型,分析了矩形平面薄膜受面内水平剪切情况下的褶皱,得到了褶皱幅度和褶皱波长以及薄膜结构产生褶皱时的临界压缩应力,通过与已有文献结果及本文实验结果的比较验证了该分析方法的有效性和结果的正确性．     

对角受拉方膜褶皱变形幅值的理论预测及实验验证

柔性薄膜结构广泛应用于航天飞行器的关键部件.形面平整度是影响薄膜结构性能的主要因素之一.褶皱幅值是评价薄膜反射面天线形面平整度的重要指标.褶皱幅值的大小与垂直于褶皱方向的横向应变密切相关.本文基于薄板稳定性理论,针对对角受拉方形薄膜建立了一个能够准确预测其褶皱变形幅值的理论模型.该模型考虑了横向拉伸力对薄膜变形的影响,将垂直于褶皱方向的位移分解为由泊松效应造成的横向收缩位移、由面外变形造成的褶皱位移以及由横向拉伸力造成的拉伸位移三个部分,重新推导了褶皱幅值的理论公式.基于数字图像相关技术,对受拉方形薄膜进行了散斑实验测试.利用双目视觉三维测量系统,测量了方形薄膜的三维位移场,获得了薄膜的三维变形形貌和褶皱波形图,研究了褶皱幅值与拉伸载荷之间的非线性关系.与已有理论模型相比,该模型进一步提高了褶皱幅值的计算精度,与实验结果吻合良好.本文呈现的理论研究可为精确数值模型的建立及算法实现提供有意义的指导.     

纳米薄膜润滑物理—数学模型及数值分析

基于润滑剂分子通常具有链状结构的事实，在分析润滑剂分子链长同膜厚关系的基础上，建立了纳米薄膜润滑物理模型，并利用含旋转量的流体力学运动方程得到了相应的Reynolds方程，同时对薄膜润滑Reynolds方程进行了数值计算，以考察特征长度对薄膜润滑状态参数的影响。结果表明，同相应的厚膜解相比，薄膜模型中润滑剂的粘度及承载能力均明显提高，且其提高幅度随着特征长度的增大而增大。根据润滑剂分子链长度确定的薄膜润滑区间以及膜厚－速度关系数值解同相应的试验结果一致。     

Kinetic wrinkling of an elastic film on a viscoelastic substrate

A compressed elastic film on a compliant substrate can form wrinkles. On an elastic substrate, equilibrium and energetics set the critical condition and select the wrinkle wavelength and amplitude. On a viscous substrate, wrinkle grows over time and the kinetics selects the fastest growing wavelength. More generally, on a viscoelastic substrate, both energetics and kinetics play important roles in determining the critical condition, the growth rate, and the wavelength. This paper studies the wrinkling process of an elastic film on a viscoelastic layer, which in turn lies on a rigid substrate. The film is elastic and modeled by the nonlinear von Karman plate theory. The substrate is linear viscoelastic with a relaxation modulus typical of a cross-linked polymer. Beyond a critical stress, the film wrinkles by the out-of-plane displacement but remains bonded to the substrate. This study considers plane strain wrinkling and neglects the in-plane displacement. A classification of the wrinkling behavior is made based on the critical conditions at the elastic limits, the glassy and rubbery states of the viscoelastic substrate. Linear perturbation analyses are conducted to reveal the kinetics of wrinkling in films subjected to intermediate and large compressive stresses. It is shown that, depending on the stress level, the growth of wrinkles at the initial stage can be exponential, accelerating, linear, or decelerating. In all cases, the wrinkle amplitude saturates at an equilibrium state after a long time. Subsequently, both amplitude and wavelength of the wrinkle evolve, but the process is kinetically constrained and slow compared to the initial growth.     

Controlled wrinkling analysis of thin films on gradient substrates

The paper investigates continuously changing wrinkle patterns of thin films bonded to a gradient substrate. Three types of gradient substrates including exponential,power-law, and symmetry models are considered. The Galerkin method is used to discretize the governing equation of film bonded to gradient substrates. The wavelength and the normalized amplitude of the wrinkles for substrates of various material gradients are obtained. The numerical simulation based on the finite element method(FEM) is used to evolve the wrinkle patterns. The result agrees well with that of the analytical model.It is concluded that localization of wrinkle patterns strongly depends on the material gradient. The critical membrane force depends on both the minimum value of wrinkle stiffness and the gradient of wrinkle stiffness when the wrinkle stiffness is at its minimum.This work provides a better understanding for local wrinkle formation caused by gradient substrates.     

Localized ridge wrinkling of stiff films on compliant substrates

Wrinkling of thin stiff films on thick compliant elastomeric substrates subject to plane strain compression is considered for cases in which the substrate is pre-stretched prior to film attachment. Advanced wrinkling modes are investigated that evolve as the systems are compressed beyond the onset of the primary sinusoidal wrinkling mode. If the substrate pre-stretch is greater than about 40%, an advanced mode in the form of a series of well-spaced ridges separated by relatively flat film is observed in the simulations. Our experiments reveal a localization mode in the form of alternating packets of large and small amplitude wrinkles, but not ridges, while ridge formation has been observed in other recent experiments. Measurements of undulation amplitudes have been made for wrinkle fields of stiff films formed by oxidation of the surface of pre-stretched PDMS substrates. Simulations have been performed with a finite element model and an analytical film/substrate model. The formation of the ridge mode is a consequence of the altered nonlinearity of the substrate produced by the pre-stretch. The role of the tangential substrate stiffness in suppressing localization at the ridges is also highlighted. If there is no substrate pre-stretch, or if the substrate is pre-compressed, the primary sinusoidal mode gives way to an entirely different sequence of advanced modes usually entailing period doubling followed by folding. The nature of substrate nonlinearity that leads to ridges or folds is discussed.     

Nonlinear analyses of wrinkles in a film bonded to a compliant substrate

Subject to a compressive membrane force, a film bonded to a compliant substrate often forms a pattern of wrinkles. This paper studies such wrinkles in a layered structure used in several recent experiments. The structure comprises a stiff film bonded to a compliant substrate, which in turn is bonded to a rigid support. Two types of analyses are performed. First, for sinusoidal wrinkles, by minimizing energy, we obtain the wavelength and the amplitude of the wrinkles for substrates of various moduli and thicknesses. Second, we develop a method to simultaneously evolve the two-dimensional pattern in the film and the three-dimensional elastic field in the substrate. The simulations show that the wrinkles can evolve into stripes, labyrinths, or herringbones, depending on the anisotropy of the membrane forces. Statistical averages of the amplitude and wavelength of wrinkles of various patterns correlate well with the analytical solution of the sinusoidal wrinkles.     

Wrinkling of a charged elastic film on a viscous layer

A thin metallic film deposited on a compliant polymeric substrate begins to wrinkle under compression induced in curing process and afterwards cooling of the system. The wrinkle mode depends upon the thin film elasticity, thickness, compressive strain, as well as mechanical properties of the compliant substrate. This paper presents a simple model to study the modulation of the wrinkle mode of thin metallic films bonded on viscous layers in external electric field. During the procedure, linear perturbation analysis was performed for determining the characteristic relation that governs the evolution of the plane-strain wrinkle of the thin films under varying conditions, i.e., the maximally unstable wrinkle mode as a function of the film surface charge, film elasticity and thickness, misfit strain, as well as thickness and viscosity of the viscous layer. It shows that, in proper electric field, thin film may wrinkle subjected to either compression or tension. Therefore, external electric field can be employed to modulate the wrinkle mode of thin films. The present results can be used as the theoretical basis for wrinkling analysis and mode modulation in surface metallic coatings, drying adhesives and paints, and microelectromechanical systems (MEMS), etc.     

基于辛本征值方法的受约束介电弹性体中褶皱不稳定性的分析

辛弹性力学已广泛应用于弹性学中各种边值问题的精确解、计算表面波模式以及预测多层超弹性薄膜中的表面褶皱。本文展示了辛分析框架还可应用于受约束介电弹性体中的表面褶皱。机械和电位移向量是两个基本变量来描述介电弹性体中机械变形与电场紧密耦合。褶皱的临界电压可以通过引入基本变量的对偶变量来从辛本征值问题中解决。本文采用扩展的W-W（Wittrick-Williams）算法和精确的积分方法,准确而高效地解决制定的辛本征值问题的本征值。通过将褶皱电压和波数与有无表面能的褶皱基准结果进行比较,验证了辛分析的有效性。辛分析框架简洁且适用于其他不稳定问题,如分层电介质弹性体、磁弹性不稳定性以及层压复合结构的微观和宏观不稳定性。     

基底上薄膜结构的非线性屈曲力学进展

基底上薄膜结构中的过大残余压应力常常通过屈曲不稳定性诱发薄膜结构和功能的失效。屈曲不稳定性、演化与斑图形成是近年来非线性力学研究的热点。此类屈曲不稳定性受薄膜-基底的力学性质以及界面相互作用影响,进而呈现出复杂的屈曲模式如褶皱、翘曲和折痕等。论文简要综述褶皱、翘曲和折痕等屈曲模式的形成机制、影响因素和后屈曲形貌相关方面的进展。褶皱部分,重点介绍了褶皱的形成、多级褶皱结构、局域化的褶皱、各向异性褶皱和曲面上的褶皱。翘曲部分,介绍了翘曲结构包括一维翘曲结构、“电话线”屈曲泡,网络状屈曲泡等的形成与生长过程,并讨论了曲面几何、界面滑移、开裂等因素的影响。折痕及其它复杂屈曲模式部分,介绍了折痕、叠痕及隆起失稳的形成机制与临界条件.     

Finite width effect of thin-films buckling on compliant substrate: Experimental and theoretical studies

Buckling of stiff thin films on compliant substrates has many important applications ranging from stretchable electronics to precision metrology and sensors. Mechanics plays an indispensable role in the fundamental understanding of such systems. Some existing mechanics models assume plane-strain deformation, which do not agree with experimental observations for narrow thin films. Systematic experimental and analytical studies are presented in this paper for finite-width stiff thin films buckling on compliant substrates. Both experiments and analytical solution show that the buckling amplitude and wavelength increase with the film width. The analytical solution agrees very well with experiments and therefore provides valuable guide to the precise design and control of the buckling profile in many applications. The effect of film spacing is studied via the analytical solutions for two thin films and for periodic thin films.     

基于张力场理论的薄膜褶皱研究评述

张力场理论是较早提出的研究薄膜褶皱的理论,该理论忽略了薄膜的弯曲刚度, 认为在褶皱 区薄膜处于单轴的应力状态,褶皱的方向为大主应力方向,垂直于褶皱方向的小主应力为零. 基于这种方法提出了很多褶皱的分析模型. 这些分析模型通过引入参数对薄膜的本构关系或 变形梯度进行修正,然后通过数值的方法进行求解,可以得到褶皱形成以后的应力分布,及 褶皱的方向. 其主要的缺点是不能得到褶皱的波长、幅度及数量等信息. 基于能量方法的褶 皱分析,首先要假定褶皱的变形模式,然后通过能量关系得到褶皱幅度和波长的表达式. 本 文对比分析薄膜褶皱的不同分析方法,并指出了薄膜褶皱研究的发展趋势.     

Mechanics of relaxing SiGe islands on a viscous glass

A process has been developed recently to fabricate a structure comprising, from top to bottom, a SiGe thin film, a glass layer, and a Si wafer. The SiGe film is a perfect crystal, and is under biaxial compression. The SiGe film is patterned into islands. On annealing, the glass flows and the islands relax. The resulting strain-free islands are used as substrates, to grow epitaxial optoelectronic devices. This article describes a series of studies on the annealing process, combining experiment and theory. A small island relaxes by expansion, starting at the edges and diffusing to the center. A large island wrinkles before the expansion reaches the center. After some time, the wrinkles either disappear, or cause the island to fracture. We model the island as an elastic plate, and the glass layer as a viscous liquid. The strains in the islands are measured by X-ray diffraction and Raman spectroscopy, and the wrinkle amplitudes by atomic force microscope. The data are compared with the theoretical predictions. We determine the conditions under which the islands relax by expansion without significant wrinking, and demonstrate that a cap layer suppresses wrinkles, relaxing a large island crack-free. The project supported by NSF (CMS-9820713), DARPA (N66001-00-1-8957), ARO (DAA655-98-1-0270), and New Jersey Science and Technology Commission