激光作用下纳米限域介质材料中的电子加速过程

采用蒙特卡罗方法模拟了1064 nm,GW/cm²级脉冲激光辐照下,纳米尺度材料中电子迁移及加速过程.电子在激光场中迁移的过程涉及晶格散射、表面散射以及碰撞电离等作用.结果表明:材料的尺度小到一定程度后,表面散射作用主导电子散射过程,小尺寸限制效应表现明显,电子很难有效地吸收激光能量.研究结果对分析具有纳米尺度微结构材料的激光损伤行为提供了依据.同时,根据该小尺寸限制效应可以设计出具有新型纳米微结构的高激光损伤阈值薄膜. 关键词： 激光辐照 小尺度效应 电子加速 蒙特卡罗模拟     

光学薄膜激光诱导损伤机理研究

基于电子密度演化模型,借助数值方法,研究了飞秒激光作用下光学薄膜内的电子密度演化过程,讨论了初始电子密度Ni和激光脉冲宽度τ对光学薄膜激光损伤阈值Fth的影响,分析了激光诱导薄膜损伤过程中MPI和AI的性质和作用.研究结果表明,对应于一定的脉宽,存在一个临界初始电子密度,当Ni低于这一临界密度时,Fth不受Ni影响;当Ni高于临界密度时,Fth随Ni增加而降低.临界初始电子密度随着脉宽的减小而增加。对于FS和BBS介质薄膜,Fth随脉宽的增加而升高。初始电子密度Ni对BBS中的MPI和AI基本没有影响;同样Ni对FS中的AI基本不产生影响,但当Ni>1011 cm－3时,FS中MPI电子密度随Ni增加而降低.在所研究的脉宽范围τ∈［0.01,5］ps,AI是FS介质激光诱导损伤的主要机制.而对于BBS,当脉宽τ∈［0.03,5］ps,AI是激光诱导损伤的主要机制;当脉宽τ∈［0.01,0.03］ps,MPI在激光诱导损伤中占主导地位.     

激光预处理对光学元件膜层性能的影响

 激光预处理是使膜层提高损伤阈值的一种有效手段，现在流行的激光预处理机理模型之一是缺陷消除模型。实验从对元件膜层激光预处理前后各项参数的对比出发，分析了激光预处理对膜层的影响，说明了光学元件膜层激光预处理的过程，是对膜层去除缺陷、固化、洁净的过程。     

初始电子密度对光学薄膜激光损伤机制的影响

光学元件的激光损伤问题是激光器件向高功率密度方向发展中必须认识和克服的问题.基于Forkker-Planck方程,研究了激光与材料相互作用时的雪崩电离机制、多光子电离机制以及联合两种机制的情况.雪崩电离的产生需要一定密度的初始自由电子存在,该自由电子可以是材料中原本就存在的,也可能是光电离产生的.着重分析了材料中的初始自由电子对材料电离机制的影响.结果表明,雪崩过程在激光作用一段时间后会达到一个稳定的电离阶段(以自由电子平均能量不随时间变化为特征,且此时雪崩电离为材料电离的主导机制),该时间与光电离速率、材料中初始自由电子密度有关.材料中的初始自由电子可以在一定程度上掩盖光电离的作用效果.     

初始电子密度对光学薄膜激光损伤机制的影响

光学元件的激光损伤问题是激光器件向高功率密度方向发展中必须认识和克服的问题.基于Forkker-Planck方程,研究了激光与材料相互作用时的雪崩电离机制、多光子电离机制以及联合两种机制的情况.雪崩电离的产生需要一定密度的初始自由电子存在,该自由电子可以是材料中原本就存在的,也可能是光电离产生的.着重分析了材料中的初始自由电子对材料电离机制的影响.结果表明,雪崩过程在激光作用一段时间后会达到一个稳定的电离阶段（以自由电子平均能量不随时间变化为特征,且此时雪崩电离为材料电离的主导机制）,该时间与光电离速率、材料中初始自由电子密度有关.材料中的初始自由电子可以在一定程度上掩盖光电离的作用效果.
关键词:初始电子;激光损伤;光电离;雪崩电离     

用1064nm激光增强HfO2/SiO2薄膜的抗激光损伤能力的实验研究

 用1 064nm激光实验研究了HfO₂/SiO₂薄膜的激光损伤增强效应，实验以薄膜激光损伤阈值70%的激光能量开始，采用N-ON-1方式处理薄膜，激光脉冲的能量增量为5J/cm²。实验结果表明，激光处理薄膜表面能使激光损伤阈值平均提高到3倍左右，并且薄膜的损伤尺度也明显减小。对有缺陷的薄膜，其缺陷经低能量激光后熔和消除，其抗激光损伤能力得到增强，但增强得并不显著，而薄膜本身的激光预处理，可以使其激光损伤阈值大大提高。     

Statistical approach to bulk inclusion initialized damage in films

In experiments, we have found an abnormal relationship between probability of laser induced damage and number density of surface inclusion. From results of X-ray diffraction (XRD) and laser induced damage, we have drawn a conclusion that bulk inclusion plays a key role in damage process. Combining thermo-mechanical damage process and statistics of inclusion density distribution, we have deduced an equation which reflects the relationship between probability of laser induced damage, number density of inclusion, power density of laser pulse, and thickness of films. This model reveals that relationship between critical sizes of the dangerous inclusions (dangerous inclusions refer to the inclusions which can initialize film damage), embedded depth of inclusions, thermal diffusion length and tensile strength of films. This model develops the former work which is the statistics about surface inclusion.     

Varied laser induced damage phenomena of gold coated gratings for pulse compression

In this paper, gold-coated gratings for pulse compression have been prepared and their laser damage experiments have been performed. Varied laser damage morphologies have been observed: when a 60 fs-pulsed laser with energy density slightly higher than the damage threshold was used, damage morphology with a characteristic of discrete distribution of small pits was appeared. These damage pits are linearly distributed at the junction of ridges and grooves. If the laser energy density is much higher than the damage threshold, the gold films was overall ablated and the grating structure disappeared. Besides, if the gold film has poor adhesion, it was peeled off. When a 450 ps-pulsed laser with energy density slightly higher than the damage threshold was used, part of grating ridges will be ablated and an obvious line exists between the ablated area and the unchanged area. In theory, the laser induced temperature field and stress field in gold-coated gratings were calculated based on the electromagnetic field using the finite element method. It is demonstrated that the temperature and thermal stress distribution characteristics are affected by the laser heating rate and the heat diffusion time (the calculated diffusion time ranges from 6 fs to 450 ps), which determines the laser damage characteristics. The possible damage drivers have electron hydrodynamic pressure, thermal ablation and thermal stress.     

Speckle Effects on Statistical Performance of Optical Radar

The statistical performance of optical radar using energy detection techniques has been studied in this paper. The analytical expressions of the speckle number subtended by the receiving aperture are derived. The results show that the speckle number is only determined by the relative size of the speckle cell and the area of the entrance pupil. The receiving aperture will integrate a considerable number of speckle cells when the beam expander is not adopted in the transmitting optical system. Few speckle cells will be intercepted by the aperture when the beam expander is employed and the laser speckle is expected to be the dominant noise source. The detection performance of airborne and space-based optical radar has been analyzed based on two critical parameters--the speckle number and the average photoelectron counts. The probability density function of photoelectrons and the detection probability are derived for a number of occasions.     

激光脉冲诱导损伤点对激光传输的影响

高能重复激光脉冲对光学元件损伤点的产生和扩展与损伤点对后续激光脉冲光强的调制作用密切相关。观察激光诱导K9玻璃的损伤点,发现损伤点是从里到外呈现辐射状分布,内部损伤程度最大,可致充分断裂;向外损伤程度减小,呈现辐射的应力相变,引起折射率变化;对损伤点的透射光谱检测发现其透过率下降大于20%,但是下降的幅度与波长无关,说明充分断裂的材料会对激光进行充分吸收,类似黑体吸收,其对入射光的吸收只与损伤点的面积有关。CCD对激光通过损伤点后的光强分布探测发现： 在激光能量传输过程中,损伤点会导致光强分布的不均匀,存在明显的散射效应,这会引起激光光强分布的不均匀性,导致损伤区域的进一步扩散。     

Effect of the laser fluence on structural and optical characterization of thin CdS films synthesized by femtosecond pulsed laser deposition

CdS thin films have been grown on Si(1 1 1) and quartz substrates using femtosecond pulsed laser deposition. X-ray diffraction, atomic force microscopy, photoluminescence measurement, and optical transmission spectroscopy were used to characterize the structure and optical properties of the deposited CdS thin films. The influence of the laser fluence (laser incident energy in the range 0.5–1.5 mJ/pulse) on the structural and optical characterizations of CdS thin films has been studied. The results indicate that the structure and optical properties of the CdS thin films can be improved as increasing the per pulse output energy of the femtosecond laser to 1.2 mJ. But when the per pulse output energy of the femtosecond laser is further increased to 1.5 mJ, which leads to the degradation of the structure and optical properties of the CdS thin films.     

脉冲激光引起铜膜镜面的环形损伤波纹研究

 用波长1.06μm、半高宽10ns的脉冲Nd:YAG激光辐照铜膜镜面，在激光辐照区，用光学显微镜观察到有规律的环形波纹状损伤图案，波纹平均周期约几十μm。通过对光路系统分析，认为样品前的小孔光阑对激光产生了菲涅尔衍射，使得在样品表面光强分布变成周期性环状分布。在极短的相互作用时间内，热扩散很小，损伤图案依赖于光强分布。并依据实验参数，用柯林斯公式对样品表面的光强分布进行了计算，所得光强分布的周期与损伤波纹的周期基本一致。     

离子束技术对氧化铪薄膜性能的影响

 在基底清洗、薄膜沉积和薄膜后处理三个阶段均采用离子束技术,制备了氧化铪薄膜,并对薄膜的光学性能、表面特性和激光损伤阈值特性进行测试和研究。结果表明,利用离子束技术清洗基底可以增强表面吸附;离子束辅助沉积在合适离子束能量下可以得到高堆积密度、高损伤阈值的薄膜;离子束后处理氧化铪薄膜可以降低表面粗糙度,改善抗激光损伤阈值。说明在三个薄膜制备阶段同时采用合适的离子束参数可以制备出结构致密、阈值高、表面粗糙度好的氧化铪薄膜。     

VO2光学薄膜的脉冲激光损伤特性测试

为评价VO2光学薄膜在光电器件中的工作可靠性,搭建了可输出连续渐变激光能量密度的脉冲激光照射实验平台,运用1对1与s对12种激光损伤测试手段进行激光辐射照射实验,采用线性外推法和测量计算法2种方法对实验结果进行了处理并得出VO2薄膜在重复频率10 kHz、中心波长532 nm、脉冲宽度15 ps脉冲激光辐射下的损伤特性。结果表明:VO2薄膜损伤几率与脉冲激光的单脉冲能量密度呈线性关系,重复辐射的激光脉冲对VO2薄膜造成的损伤具有积累效应,且重复辐射的激光脉冲次数越多损伤积累效果越明显。     

Femtosecond pulsed laser ablation with spatial filtering

With the rise in demand for miniaturized features with better acute edge acuity and negligible thermal damage zone, one of the key vital areas lies in the refinement of the quality of the laser beam itself. Spatial filter is routinely used in optical micromachining systems to smoothen the Gaussian profile of the machining spot in order to obtain a feature of the desired quality. However, its profile smoothening effect has never been investigated for femtosecond pulsed laser micromachining process since the extremely high peak power of femtosecond pulses will cause damage on the filtering aperture of spatial filter. During the development of an acousto-optical micromachining system using femtosecond pulses, we found that if the damage of the filtering aperture can be circumvented, spatial filter can improve the machining quality of femtosecond pulse ablation, especially when ablation is conducted at low-fluency range (just above the ablation threshold fluency). In this paper, we investigate and demonstrate both the improvement and potential that beam refinement can bring about. In our experiment, a series of test patterns were ablated with a 400 nm second-harmonic Ti:Sapphire femtosecond laser of 150 fs duration at varying pulse energy ranging from 31 to 39 nJ. The specimen used in the experiment is a platinum- (Pt) sputtered coating of 100 nm thickness on a quartz substrate. The results show a significant improvement in the constancy of the shape as well as the size of ablated feature, revealing an improved beam profile and beam energy distribution due to spatial filtering.     

The morphology of pulsed laser-induced damage on the surface of a copper film mirror

A copper film mirror was irradiated using a pulsed Nd:YAG laser (1.06 μm,10 ns) through an aperture. After laser irradiation, the damaged spot was analyzed using an optical microscope and periodic damage rings were found at the laser irradiation spot, the average spacing of these rings being about 40–50 μm. The damage ring could be observed in the periphery of the laser spot under lower laser energy densities. As the laser fluence increased, the periodic damage rings grew to cover the whole laser spot. Under higher laser energy density, the whole film was damaged and the rings disappeared. A Fresnel diffraction model is used to explain the appearance of these rings. The laser beam is diffracted by the aperture in the optic path, the laser intensity distribution at the copper film mirror becomes periodic rings and damage ripple pattern forms instantly with the laser ablation. The laser intensity distribution at the mirror surface is calculated using Collins formula, with which the period of the damage rings and other phenomena can be explained.     

Effect of excimer laser annealing on the properties of ZnO thin film prepared by sol-gel method

Pristine ZnO thin films have been deposited with zinc acetate [Zn(CH₃COO)₂], mono-ethanolamine (stabilizer), and isopropanol solutions by sol-gel method. After deposition, pristine ZnO thin films have been irradiated by excimer laser (λ = 248, KrF) source with energy density of 50 mJ/cm² for 30 sec. The effect of excimer laser annealing on the optical and structural properties of ZnO thin films are investigated by photoluminescence and field emission scanning electron microscope. As-grown ZnO thin films show a huge peak of visible region and a wide full width at half maximum (FWHM) of UV region due to low quality with amorphous ZnO thin films. After KrF excimer laser annealing, ZnO thin films show intense near-band-edge (NBE) emission and weak deep-level emission. The optically improved pristine ZnO thin films have demonstrated that excimer laser annealing is novel treatment process at room temperature.     

激光等离子体效应对薄膜损伤特性的影响

高能激光的发展对光学元件的抗损伤能力要求越来越高,其中光学薄膜是最薄弱的环节之一。实验研究了激光的聚焦位置对石英基片上HfO2/SiO2减反射薄膜损伤形貌的影响,研究发现:激光等离子体的高压冲击波对薄膜产生强烈的冲击剥离效应,其压强随膨胀半径的增加而迅速减小。激光等离子体光谱的辐射波长小于入射激光波长,这会增强薄膜对辐射光能量的吸收;位于深紫外波段、能量大于HfO2薄膜带隙的光子能量,将被薄膜直接吸收,从而加剧薄膜的电离破坏。激光等离子体的辐射效应和冲击波效应的共同作用决定了薄膜的损伤形貌。当激光聚焦到薄膜表面时,冲击波压强极大会使薄膜发生大面积的电离去除,同时基底发生击穿;当两者距离大到一定距离时,冲击波只会使得中心处小面积薄膜发生剥离,基底未出现断裂。     

光斑尺寸对光学薄膜元件温升的影响

 实验测量了波长1 064 nm， 10 kHz高重复频率激光辐照下在白宝石、石英玻璃、K9基片上制备的Ta₂O₅/SiO₂高反膜的温度变化，有限元分析的结果与实验结果相一致。用ANSYS程序计算了不同光斑直径、相同功率激光和相同功率密度激光辐照下薄膜元件温升的变化。结果表明：相同功率激光辐照光学薄膜元件时，光斑大小只影响激光辐照点的温升，对基板温升没有影响。基板温升只与激光功率有关，激光功率越大，基板温升越大。相同功率密度激光辐照光学薄膜元件时，光斑越大，激光辐照点温度及基板温度均越高。从激光损伤的热效应考虑，小光斑激光辐照时，光学薄膜的激光损伤阈值较高。     

Crystallization of hydrogenated amorphous silicon carbon films with laser and thermal annealing

The crystallization of silicon rich hydrogenated amorphous silicon carbon films prepared by Plasma Enhanced Chemical Vapor Deposition technique has been induced by excimer laser annealing as well as thermal annealing. The excimer laser energy density (E_d) and the annealing temperature were varied from 123 to 242 mJ/cm² and from 250 to 1200 °C respectively. The effects of the two crystallization processes on the structural properties and bonding configurations of the films have been studied. The main results are that for the laser annealed samples, cubic SiC crystallites are formed for E_d ≥ 188 mJ/cm², while for the thermal annealed samples, micro-crystallites SiC and polycrystalline hexagonal SiC are observed for the annealing temperature of 800 and 1200 °C respectively. The crystallinity degree has been found to improve with the increase in the laser energy density as well as with the increase in the annealing temperature.