Laser-induced thermal desorption mass spectrometry of functionalized silicon surfaces

Functionalization of materials and laser patterning of chemisorbed layers play an increasing role in tailoring and structuring surface properties on the nanoscale. An attractive method of investigating organic functionalizations is laser-induced thermal desorption (LITD). The analysis of well-defined H- and D-terminated Si(1 1 1)-(1 × 1):H(D) surfaces was used to quantify the LITD technique. Moreover, oxidized silicon surfaces were functionalized with trimethylsilyl (TMS) and (3,3,3-trifluoropropyl)-dimethylsilyl (TFP) hydrophobic end groups. The samples were irradiated normal to the surface with focused XeCl laser pulses. The desorbed species were monitored at an oblique angle and their time-of-flight (TOF) distributions were measured with a quadrupole mass analyzer. The TOF temperatures of silicon were calibrated for different laser pulse energies by desorption of H₂ and D₂. In the LITD experiments, the desorption of trimethylsilanol groups was observed for TMS terminations, indicating that essentially the whole molecule desorbs from the surface. The TOF data could be fitted to Maxwellian distributions, providing the desorption yield of the emitted species, their mass, and temperature. On the other hand, several characteristic fragments were found for the TFP-terminated surface. The TOF distributions indicate that the fragments detected with the analyzer derived from different desorbed species.     

Stability and fragmentation of organic silicon functionalizations studied by laser desorption mass spectrometry

A method is introduced to investigate organic functionalizations on silicon by laser-induced thermal desorption (LITD), where well-ordered Si(1 1 1)-(1 × 1):H(D) surfaces are used to determine the desorption temperature as a function of laser fluence. To demonstrate the potential of this technique silicon surfaces with ultrathin oxide layers were functionalized with organic end groups. The species desorbed with focused XeCl laser pulses were monitored at an oblique angle and their time-of-flight (TOF) distributions were measured with a quadrupole mass analyzer after electron impact ionization. By assuming a negligible contribution of the oxide and organic layers to the heating effect, the TOF temperatures measured for Si(1 1 1)-(1 × 1):H(D) could be used to determine the mass of the desorbed species. Detailed results are presented for dimethylsilyl (DMS), bromomethyldimethylsilyl (BMDMS), and chloromethyldimethylsilyl (CMDMS) terminated surfaces which were prepared by silanization with suitable chloro and disilazane compounds. While for the DMS termination dimethylsilanol (76 u) is desorbed as a single species, clearly identifying the terminating group, in the case of BMDMS and CMDMS further fragmentation of the end group occurs at the surface.     

In situ reflectivity investigations of solid/liquid interface during laser backside etching

In situ reflectivity measurements of the solid/liquid interface with a pump-probe setup were performed during laser-induced backside wet etching (LIBWE) of fused silica with KrF excimer laser using toluene as absorbing liquid. The intensity, the temporal shape, and the duration of the reflected light measured in dependence on the laser fluence are discussed referring to the surface modification and the bubble formation.The vaporisation of the superheated liquid at the solid interface causes a considerable increase of the reflectivity and gives information about the bubble lifetime. The alterations of the reflectivity after bubbles collapse can be explained with the changed optical properties due to surface modifications of the solid surface. Comparative studies of the reflectivity at different times and the etch rate behaviour in dependence on the laser fluence show that the in situ measured surface modification begins just at the etch threshold fluence and correlates further with etch rate behaviour and the etched surface appearance. The already observed surface modification at LIBWE due to a carbon deposition and structural changes of the near surface region are approved by the changes of the interface reflectivity and emphasizes the importance of the modified surface region in the laser-induced backside wet etching process.     

Comparison of the interaction of Cl2 and Br2 with Cu(100)

The adsorption, reaction and etching of Cu(100) by Cl₂ was studied using temperature programmed desorption (TPD) and low energy electron diffraction (LEED), and the results were compared with recent results for Br₂. Although the general etching mechanism was the same for both gases (adsorption rate limited Cu halide formation followed by halide sublimation), significant differences between the behavior of Cl₂ and Br₂ were observed. The desorption of CuCl was characterized by a single zero order sublimation peak, independent of CuCl coverage, while limiting the CuBr coverage resulted in a desorption peak at temperatures lower than a prediction based on vapor pressure data of all known phases of CuBr. In addition, Cl₂ was found to be at least an order of magnitude less reactive than Br₂ towards halide formation. For both Cl₂ and Br₂, the halide formation rate reversibly decreased with increasing reaction temperature. However, for Br₂, but not Cl₂, annealing a chemisorbed halogen layer prior to further reaction irreversibly increased the halide formation rate. Structural differences between CuCl and CuBr on Cu(100) were also observed. For CuCl, LEED data suggested that highly faceted crystallites form at 325 K and remain stable until desorption, while LEED data for CuBr reveal a compressed epitaxial (111) layer that disorders below 400 K and then desorbs. The implications of these differences on etching and oxidation processes are discussed.     

Probing the mechanisms of ambient ionization by laser-induced fluorescence spectroscopy

The ionization mechanisms of several atmospheric pressure ion sources based on desorption and ionization of samples deposited on a surface were studied. Home-built desorption electrospray ionization (DESI), laserspray ionization (LSI), and atmospheric pressure matrix-assisted laser desorption/ionization (AP-MALDI) sources were characterized using low-molecular-weight compounds, in particular fluorescent dyes. Detection of the desorbed and ionized species was performed by laser-induced fluorescence and ion cyclotron resonance mass spectrometry. The dependences of the signal intensities on various experimental parameters were studied. The data obtained reveals common features, such as formation of solvated species and clusters in the ionization processes, in all of the techniques considered.     

Shallow surface etching of organic and inorganic compounds by electrospray droplet impact

The electrospray droplet impact (EDI) was applied to bradykinin, polyethylene terephthalate (PET), SiO₂/Si, and indium phosphide (InP). It was found that bradykinin deposited on the stainless steel substrate was ionized/desorbed without the accumulation of radiation products. The film thickness desorbed by a single collisional event was found to be less than 10 monolayers. In the EDI mass spectra for PET, several fragment ions were observed but the XPS spectra did not change with prolonged cluster irradiation. The etching rate for SiO₂ by EDI was measured to be ∼0.2 nm/min. The surface roughness of InP etched by EDI was found to be one order of magnitude smaller than that etched by 3 keV Ar⁺ for about the same etching depths. EDI is capable of shallow surface etching with little damage left on the etched surface.     

Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111)

The preparation of chlorine-, bromine-, and iodine-terminated silicon surfaces (Si(111):Cl, Br, and I) using atomically flat Si(111)-(1×1):H is described. The halogenated surfaces were obtained by photochemically induced radical substitution reactions with the corresponding dihalogen in a Schlenk tube by conventional inert gas chemistry. The nucleophilic substitution of the Si-Cl functionality with the Grignard reagent (CH₃MgCl) resulted in the unreconstructed methylated Si(111)-(1×1):CH₃ surface. The halogenated and methylated silicon surfaces were characterized by Fourier transform infrared (FTIR) spectroscopy and laser-induced desorption of monolayers (LIDOM). Calibration of the desorption temperature via analysis of time-of-flight (TOF) distributions as a function of laser fluence allowed the determination of the originally emitted neutral fragments by TOF mass spectrometry using electron-impact ionization. The halogens were desorbed atomically and as SiX _n (X = Cl, Br) clusters. The methyl groups mainly desorbed as methyl and ethyl fragments and a small amount of ⁺SiCH₃.     

A time-of-flight study on the nanosecond laser induced etching of Cu with Cl2 at 308 nm

Chemical etching of Cu is studied using Cl₂ and a ns pulsed UV laser at 308 nm. At Cl₂ pressures in the range of 10^–6–10^–4mbar and a laser fluence up to 0.82 J/cm² the velocity distributions of the ejected species are determined. CuCl and Cu₃Cl₃ are the main products. The time-of-flight spectra of these particles can be fitted with Maxwell-Boltzmann distributions at high temperatures viz. 1750<T<6000 K. Starting with a clean Cu sample the system evolves to a steady state situation in which a considerable amount of Cl has diffused into the bulk. The chlorinated Cu layer has a pronounced influence on the coupling of the laser beam into the substrate, thereby determining the amount of particles desorbed and their time-of-flight distributions. A model is presented to explain the results.     

Adsorption and decomposition of HNCO on Cu(111) surface studied by auger electron,electron energy loss and thermal desorption spectroscopy

No detectable adsorbed species were observed after exposure of HNCO to a clean Cu(111) surface at 300 K. The presence of adsorbed oxygen, however, exerted a dramatic influence on the adsorptive properties of this surface and caused the dissociative adsorption of HNCO with concomitant release of water. The adsorption of HNCO at 300 K produced two new strong losses at 10.4 and 13.5 eV in electron energy loss spectra, which were not observed during the adsorption of either CO or atomic N. These loses can be attributed to surface NCO on Cu(111). The surface isocyanate was stable up to 400 K. The decomposition in the adsorbed phase began with the evolution of CO₂. The desorption of nitrogen started at 700 K. Above 800 K, the formation of C₂N₂ was observed. The characteristics of the CO₂ formation and the ratios of the products sensitively depended on the amount of preadsorbed oxygen. No HNCO was desorbed as such, and neither NCO nor (NCO)₂ were detected during the desorption. From the comparison of adsorption and desorption behaviours of HNCO, N, CO and CO₂ on copper surfaces it was concluded that NCO exists as such on a Cu(111) surface at 300 K. The interaction of HNCO with oxygen covered Cu(111) surface and the reactions of surface NCO with adsorbed oxygen are discussed in detail.     

Vacancy dynamics and reorganization on bromine-etched Si(100)-(2 x 1) surfaces

Halogen etching of Si(100) surfaces has long been considered to involve the selective removal of atoms from an essentially static surface. Here we show that vacancy sites produced by etching are mobile at elevated temperature and rearrange to form features that were considered to be the direct products of etching. We demonstrate that the etch features observed at different temperatures are not due to different mechanisms. Rather, kinetic etch products formed at low temperatures are transformed into thermodynamically more stable features at higher temperatures.     

Influence of the photoionization process on the fragmentation of laser desorbed polycyclic aromatic hydrocarbons

Characterization of polycyclic aromatic hydrocarbons (PAHs) samples has been performed by laser desorption combined with multi-photon ionization technique using two different geometries of the ionization laser beam. This comparative study evidences the strong influence of ionization laser fluence on PAH fragmentation. Through a ∼10³ enlargement of the ionization probe volume and 10⁴ reduction of laser fluence over previous studies, fragment free mass spectra are obtained with higher sensitivity and selectivity. The ability to measure fragment free PAH mass spectra is a very important step in the end goal of measuring complex unknown mixtures of PAH desorbed from solid surface such as soot samples.     

Field ion and field desorption mass spectrometry of inorganic compounds

The review on recent developments in field ionization mass spectrometry of inorganic compounds concerns the different mechanisms of ion formation at surfaces and under the influence of extremely high electric fields, field dependent chemical reactivity at surfaces and ion desorption from surfaces for mass spectrometric analysis. Applications in various areas are discussed, where this method has been used to identify surface compounds or to study kinetic phenomena at interfaces.     

Structural and magnetic properties of the phase transition in absorbed and non-absorbed copper(II) trans-1,4-cyclohexanedicarboxylate

A large amount of toluene can be absorbed into the 1-dimensional tunnels in copper(II) trans-1,4-cyclohexane dicarboxylate (Cu(trans-1,4-OOCC₆H₁₀C)) at room temperature, and it can be desorbed by evacuation at elevated temperatures. The reversible absorption/desorption behavior of toluene was studied by magnetic susceptibility measurements using SQUID magnetometer and by powder X-ray diffractometry with high-energy synchrotron radiation at SPring-8, Japan. The first order phase transition was observed at 160 K in the magnetic susceptibility curve for the empty (non-absorbed or desorbed) sample, and the structural difference between the low and high temperature phases was detected in the powder X-ray diffraction patterns. On the other hand, no phase transition was observed in fully toluene-absorbed sample, and the structure was similar to that of the low temperature phase of the empty sample. The absorption/desorption behavior observed in the present study coincides with the results of heat capacity measurements by adiabatic calorimetry reported previously.     

UV desorption and photochemistry of dimethylgold hexafluoroacetylacetonate adsorbed on a quartz substrate

The photodesorption and photodecomposition pathways of dimethylgold hexafluoroacetylacetonate, DMG (hfac), adsorbed on a cooled quartz substrate is reported for 222-nm KrCl excimer laser radiation. The time-of-flight (TOF) of neutral photoproducts, desorbed from the surface of the gold film formed during the experiment, were analyzed under collisionless conditions by a differentially-pumped mass spectrometer. Extensive dissociation of adsorbed DMG (hfac) into DMG and the hfac ligand was observed. The ligand was found to recombine with a CH₃ radical on the surface. Translational energy distributions for the detected species were obtained by deconvoluting the TOF curves into a self-consistent set of Maxwell-Boltzmann distributions for the desorbed parent molecule, laser-induced decomposition products, and surface recombination reaction products. The implications of these results for the mechanistic details of the low-pressure, laser-assisted organometallic deposition of DMG(hfac) are discussed.ONT/NRL Research Associate (Nov. 1987-Oct. 1988)NRC/NRL Cooperative Research Associate     

Laser-induced fluorescence study of fast desorption of ground-state K atoms from potassium halides excited by synchrotron radiation

The nanosecond desorption of ground-state K atoms from potassium halides was investigated for the first time using a laser-induced fluorescence method with synchrotron radiation and laser pulses. It was found that the desorption consists of a nanosecond component and a slow one of > 180 ns response time. The fast desorption is several orders of magnitude faster than existing results for the time response of ground-state alkali desorption. Therefore, the fast desorption of ground-state alkali atoms cannot be interpreted in terms of the existing mechanisms based on thermal processes and requires a new desorption model. We suggest that the lattice instability due to electronic excitation in the surface layer may play an important role in the fast desorption of ground-state alkali atoms.     

Translational heating of D(2) molecules thermally desorbed from Si(100) and Ge(100) surfaces

The translational energies of D(2) molecules thermally desorbed from the Si(100) and Ge(100) surfaces under a heating rate of 6 K/s have been measured. In contrast to the previous laser desorption study, results show a considerable translational heating; the observed translational temperature is about 3 times higher than the desorption temperature for both surfaces. This fact indicates that energy barriers for adsorption are present even in the desorption pathway. Detailed balance is applicable to the adsorption and desorption dynamics of hydrogen on the Si(100) surface.     

Theoretical study of the influence of laser-induced defects on the adsorption of gases on solid surfaces

Laser treatment of a solid surface was modeled by applying an analytical theory as well as by using Monte Carlo simulations. The crystalline surface was assumed to be initially smooth and chemically uniform, that is free of impurities built into the structure. Creation of surface defects by a laser beam was assumed to have entirely random nature. In particular, the surface was assumed to have been scanned by the beam focused successively on randomly chosen points. In the course of the ablation process, the beam produces a pyramidal crater whose dimensions are proportional to the applied laser power. According to the assumed nature of the scanning procedure, the craters formed by the beam are allowed to overlap. The influence of the number of laser pulses and the crater dimensions on the structural and adsorptive properties of the surface were examined by analysis of the variation of the mean surface depth and the surface width. Changes in the adsorptive properties were also estimated by the calculation of the thermally programmed desorption (TPD) spectra of monomolecular adsorbates desorbed from laser-treated surfaces. Additionally, equilibrium adsorption isotherms were calculated for the obtained surfaces.     

Surface electronic state on stepped Cu(755) studied by angle-resolved ultraviolet photoelectron spectroscopy using synchrotron radiation

The surface electronic state on the stepped surface of Cu(755) has been investigated by means of angle-resolved ultraviolet photoelectron spectroscopy using synchrotron radiation(SR-ARUPS). We have observed a free-electron-like surface state below the Fermi level. In spite of the anisotropy of the atomic arrangement due to steps, the surface state is shown to be isotropic since the dispersion profile and the peak shape are almost identical in the directions parallel and perpendicular to the steps. This result makes a clear contrast with the previous SR-ARUPS results on Ni(755) surfaces which have the surface structure similar to Cu(755). Those experimental evidences are discussed based upon the electron configurations of both metal substrates.     

Thermal etching of sodium chloride III. Etching of non-cubic surface

Previous work on the thermal etching of (100) surfaces of NaCl single crystals is extended to the other surface orientations by using polycrystalline samples. The results obtained with (110), (111), (520) and (144) surfaces are used to corroborate the correctness of the mechanisms proposed in a previous paper to explain the thermal etching in air of (100) surfaces; it is also shown that these mechanisms are only dependent on crystal structure and not on the surface orientation.When such surfaces were treated with wet silk, concentrated HC1, and Moran's reagent, a very different behaviour was observed for each orientation. The reactivity is very sensitive to crystallographic orientation, being very low in the case of the (144) surface.     

Interaction of atomic hydrogen with the graphite single-crystal surface

The reaction of atomic hydrogen (or atomic deuterium) with highly orientated pyrolytic graphite surfaces has been studied by means of thermal desorption spectroscopy. In some cases atomic deuterium instead of atomic hydrogen, was used solely to assign the desorbed masses unambiguously to the different hydrocarbons. The desorption of D₂ and fourteen hydrocarbons was observed. D₂ desorbed at higher temperatures than the CH-(CD) compounds, the desorption spectra of the hydrocarbons contained two peaks. The dependence of the desorption spectra of several hydrocarbons on the heating rate, the atomic hydrogen exposure and the composition of the desorption products was investigated in detail. The kinetic parameters of the desorption process were determined for CH, C₂H₂, and CD₄. The spectra showed that there must be a first order desorption process for all the hydrocarbons, the values for the activation energy and the frequency factor were the same within experimental errors. The results were discussed by means of a simple model.